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Maskless lithography alignment method based on phase-shifting Moiré fringes technique
Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Tang, Yan1; Hu, S. (zsyioe@163.com)
Volume8418
Pages84180L
2012
Language英语
ISSN0277786X
DOI10.1117/12.971463
Indexed ByEi
Subtype会议论文
AbstractThe relative position of wafer and mask can be calculated by information of Moire´ fringe during alignment, a maskless lithography alignment method based on circular gratings Moire´ fringes phase-shifting technique is proposed in this paper. Circular grating Moire´ fringes have characteristics of measuring simultaneously angular displacement and line displacement. Location information of wafer in alignment can be real-time reflected in spatial phase of Moire´ fringes. A digital micromirror device controlled by a computer is used to generate phase-shifting grating labels, and phase-shifting Moire´ fringes will be formed by superposition of phase-shifting grating labels with grating label on the wafer. The position information of wafer can be abstained by phase analysis using Fourier transform method combined with phase-shifting technique, and gives feedback to the displacement stage to realize alignment. The theory basis of this method is emphatically introduced. Also, application of this method in maskless lithography alignment is analyzed in detail. Simulation results show that this method is high in accuracy, simple in operation and simple in algorithm. It provides a feasible method for lithography alignment technique. © 2012 SPIE.; The relative position of wafer and mask can be calculated by information of Moire´ fringe during alignment, a maskless lithography alignment method based on circular gratings Moire´ fringes phase-shifting technique is proposed in this paper. Circular grating Moire´ fringes have characteristics of measuring simultaneously angular displacement and line displacement. Location information of wafer in alignment can be real-time reflected in spatial phase of Moire´ fringes. A digital micromirror device controlled by a computer is used to generate phase-shifting grating labels, and phase-shifting Moire´ fringes will be formed by superposition of phase-shifting grating labels with grating label on the wafer. The position information of wafer can be abstained by phase analysis using Fourier transform method combined with phase-shifting technique, and gives feedback to the displacement stage to realize alignment. The theory basis of this method is emphatically introduced. Also, application of this method in maskless lithography alignment is analyzed in detail. Simulation results show that this method is high in accuracy, simple in operation and simple in algorithm. It provides a feasible method for lithography alignment technique. © 2012 SPIE.
Conference NameProceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems
Conference Date2012
Citation statistics
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7645
Collection微电子装备总体研究室(四室)
Corresponding AuthorHu, S. (zsyioe@163.com)
Affiliation1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan, 610209, China
2. University of Electronic Science and Technology of China, Chengdu, Sichuan, 610054, China
3. Graduate University of Chinese Academy of Sciences, Beijing 100039, China
Recommended Citation
GB/T 7714
Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Maskless lithography alignment method based on phase-shifting Moiré fringes technique[C],2012:84180L.
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