中国科学院光电技术研究所机构知识库
Advanced  
IOE OpenIR  > 微电子装备总体研究室(四室)  > 会议论文
题名:
Positioning scheme based on grating modulation and phase imaging in lithography
作者: Shaolin Zhou; Feng Xu; Song Hu; Xiaoping Tang
出版日期: 2010
会议名称: Proceedings of the SPIE - The International Society for Optical Engineering
会议日期: 2010
通讯作者: Shaolin Zhou
中文摘要: As the critical techniques of lithographic system, the nano-positioning techniques, including the wafer-mask alignment, gapping between wafer and mask and wafer focusing, are of great significance to the improvement of resolution of the projection lithography and the proximity nanolithography, such as X-ray lithography, nanoimprint, and zone-plate-array lithography etc. This paper presents a scheme based on grating modulation and spatial phase imaging. The relative move and gap variation between mask and wafer can be associated with the shift or phase variation of fringe pattern and obtained simultaneously. Two gratings with slightly different periods are adopted as alignment marks and gapping marks on wafer and mask. Fringes with period that is inversely proportional to the difference of periods of two gratings occur in the superposition of two grating marks. First, the theoretical background is introduced and the mechanism of alignment gapping is detailed. Next, the scheme and framework of alignment and gapping method is constructed. Finally, numeric computational and experimental results indicate that the displacement detectivity at nanometer or even sub-nanometer level can be realized in this scheme.
英文摘要: As the critical techniques of lithographic system, the nano-positioning techniques, including the wafer-mask alignment, gapping between wafer and mask and wafer focusing, are of great significance to the improvement of resolution of the projection lithography and the proximity nanolithography, such as X-ray lithography, nanoimprint, and zone-plate-array lithography etc. This paper presents a scheme based on grating modulation and spatial phase imaging. The relative move and gap variation between mask and wafer can be associated with the shift or phase variation of fringe pattern and obtained simultaneously. Two gratings with slightly different periods are adopted as alignment marks and gapping marks on wafer and mask. Fringes with period that is inversely proportional to the difference of periods of two gratings occur in the superposition of two grating marks. First, the theoretical background is introduced and the mechanism of alignment gapping is detailed. Next, the scheme and framework of alignment and gapping method is constructed. Finally, numeric computational and experimental results indicate that the displacement detectivity at nanometer or even sub-nanometer level can be realized in this scheme.
收录类别: Ei ; ISTP
语种: 英语
卷号: 7657
文章类型: 会议论文
页码: 76571G (6 pp.)
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7641
Appears in Collections:微电子装备总体研究室(四室)_会议论文

Files in This Item:
File Name/ File Size Content Type Version Access License
2010-224.pdf(325KB)会议论文--限制开放View 联系获取全文

作者单位: 中国科学院光电技术研究所

Recommended Citation:
Shaolin Zhou,Feng Xu,Song Hu,et al. Positioning scheme based on grating modulation and phase imaging in lithography[C]. 见:Proceedings of the SPIE - The International Society for Optical Engineering. 2010.
Service
Recommend this item
Sava as my favorate item
Show this item's statistics
Export Endnote File
Google Scholar
Similar articles in Google Scholar
[Shaolin Zhou]'s Articles
[Feng Xu]'s Articles
[Song Hu]'s Articles
CSDL cross search
Similar articles in CSDL Cross Search
[Shaolin Zhou]‘s Articles
[Feng Xu]‘s Articles
[Song Hu]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
Add to CiteULike Add to Connotea Add to Del.icio.us Add to Digg Add to Reddit
文件名: 2010-224.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Copyright © 2007-2016  中国科学院光电技术研究所 - Feedback
Powered by CSpace