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题名:
Nanolithography in the evanescent near-field by using gain-assisted meta-materials system
作者: Yong Yang; Wei Yan; Jian Wang; Yanli Li; Lixin Zhao; Song Hu; Zhan Li
出版日期: 2010
会议名称: Proceedings of the SPIE - The International Society for Optical Engineering
会议日期: 2010
通讯作者: Yong Yang
中文摘要: Surface Plasmon polaritons are electromagnetic waves that propagate along the surface of a conductor, usually a metal. It is shown that the gain-assisted metamaterial can compensate for the intrinsic absorption loss in metal. In this paper, the propagation of surface plasmon polaritons on gain-assist metamaterial system is investigated. As an example, nanolithography has been considered by using optical proximity exposure in the evanescent near field of gain-assisted metamaterial layer. The evanescent waves carried the detailed information of the object which was defined by the high space frequency of the mask. With the enhancement of surface plasmon polaritons and gain-assisted metamaterials system, the evanescent waves can be propagated to a relatively far distance. Numerical computations by finite element analysis shows that better optimization of the gain-assisted metamaterials system can further improve the resolution. Experiments will be developed to prove the simulation by using a modified i-line aligner. The computation result shows it will be an alternative nanolithography technique for the next generation lithography.
英文摘要: Surface Plasmon polaritons are electromagnetic waves that propagate along the surface of a conductor, usually a metal. It is shown that the gain-assisted metamaterial can compensate for the intrinsic absorption loss in metal. In this paper, the propagation of surface plasmon polaritons on gain-assist metamaterial system is investigated. As an example, nanolithography has been considered by using optical proximity exposure in the evanescent near field of gain-assisted metamaterial layer. The evanescent waves carried the detailed information of the object which was defined by the high space frequency of the mask. With the enhancement of surface plasmon polaritons and gain-assisted metamaterials system, the evanescent waves can be propagated to a relatively far distance. Numerical computations by finite element analysis shows that better optimization of the gain-assisted metamaterials system can further improve the resolution. Experiments will be developed to prove the simulation by using a modified i-line aligner. The computation result shows it will be an alternative nanolithography technique for the next generation lithography.
收录类别: Ei ; ISTP
语种: 英语
卷号: 7657
文章类型: 会议论文
页码: 76571C (6 pp.)
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7639
Appears in Collections:微电子装备总体研究室(四室)_会议论文

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作者单位: 中国科学院光电技术研究所

Recommended Citation:
Yong Yang,Wei Yan,Jian Wang,et al. Nanolithography in the evanescent near-field by using gain-assisted meta-materials system[C]. 见:Proceedings of the SPIE - The International Society for Optical Engineering. 2010.
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