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Methods of eliminating the grid effect based on DMD technique of maskless lithography
Yanli Li; Wei Yan; Jian Wang; Yong Yang; Lixin Zhao
Volume7657
Pages765716 (7 pp.)
2010
Language英语
Indexed ByEi ; ISTP
Subtype会议论文
AbstractThe three novel methods of eliminating the grid effect caused by space duty cycle of Digital Micromirror Device (DMD) based on the DMD technique of maskless lithography are proposed, which are limiting the numerical aperture of projection objective, utilizing diffractive optical element arrays and using phase controlled beam shaping elements arrays. The physical mechanism of the grid effect is studied. The principles of three methods are analyzed and the experimental project about limiting the numerical aperture of projection objective, diffractive optical element arrays and phase controlled beam shaping elements arrays are proposed. The experimental results are given and the similarities and differences of the three methods are compared and analyzed. The experimental results indicate that these three methods can clear up the grid effect caused by space duty cycle of DMD. The research results will provide the references for improving the quality of maskless lithography device.; The three novel methods of eliminating the grid effect caused by space duty cycle of Digital Micromirror Device (DMD) based on the DMD technique of maskless lithography are proposed, which are limiting the numerical aperture of projection objective, utilizing diffractive optical element arrays and using phase controlled beam shaping elements arrays. The physical mechanism of the grid effect is studied. The principles of three methods are analyzed and the experimental project about limiting the numerical aperture of projection objective, diffractive optical element arrays and phase controlled beam shaping elements arrays are proposed. The experimental results are given and the similarities and differences of the three methods are compared and analyzed. The experimental results indicate that these three methods can clear up the grid effect caused by space duty cycle of DMD. The research results will provide the references for improving the quality of maskless lithography device.
Conference NameProceedings of the SPIE - The International Society for Optical Engineering
Conference Date2010
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7638
Collection微电子装备总体研究室(四室)
Corresponding AuthorYanli Li
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Yanli Li,Wei Yan,Jian Wang,et al. Methods of eliminating the grid effect based on DMD technique of maskless lithography[C],2010:765716 (7 pp.).
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