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An optical modulation based focus method for optical projection lithography
Wangfu Chen; Song Hu
Volume7657
Pages76571J (6 pp.)
2010
Language英语
Indexed ByEi ; ISTP
Subtype会议论文
AbstractAn optical modulation method based focus and level scheme is presented for optical projection lithography. The main parts of the focus system are analyzed respectively. Several kinds of modulation methods are adopted to realize nanometer resolution, including grating modulation, polarization modulation and optic-elastic modulation. The grating modulation is realized by imaging objective grating to the surface of modulation grating and then the modulation light is sent to polarization part. The polarization modulation is based on birefringence which can divide optical signal into two parts and each part represents the position and focus error of silicon wafer. Two or more equipments can implement wafer leveling. By introducing optic-elastic modulation, high signal-to-noise is obtained. Analytical result indicates that focusing resolution at nanometer level can be realized.; An optical modulation method based focus and level scheme is presented for optical projection lithography. The main parts of the focus system are analyzed respectively. Several kinds of modulation methods are adopted to realize nanometer resolution, including grating modulation, polarization modulation and optic-elastic modulation. The grating modulation is realized by imaging objective grating to the surface of modulation grating and then the modulation light is sent to polarization part. The polarization modulation is based on birefringence which can divide optical signal into two parts and each part represents the position and focus error of silicon wafer. Two or more equipments can implement wafer leveling. By introducing optic-elastic modulation, high signal-to-noise is obtained. Analytical result indicates that focusing resolution at nanometer level can be realized.
Conference NameProceedings of the SPIE - The International Society for Optical Engineering
Conference Date2010
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7636
Collection微电子装备总体研究室(四室)
Corresponding AuthorWangfu Chen
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Wangfu Chen,Song Hu. An optical modulation based focus method for optical projection lithography[C],2010:76571J (6 pp.).
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