| An optical modulation based focus method for optical projection lithography | |
| Wangfu Chen; Song Hu | |
| Volume | 7657 |
| Pages | 76571J (6 pp.) |
| 2010 | |
| Language | 英语 |
| Indexed By | Ei ; ISTP |
| Subtype | 会议论文 |
| Abstract | An optical modulation method based focus and level scheme is presented for optical projection lithography. The main parts of the focus system are analyzed respectively. Several kinds of modulation methods are adopted to realize nanometer resolution, including grating modulation, polarization modulation and optic-elastic modulation. The grating modulation is realized by imaging objective grating to the surface of modulation grating and then the modulation light is sent to polarization part. The polarization modulation is based on birefringence which can divide optical signal into two parts and each part represents the position and focus error of silicon wafer. Two or more equipments can implement wafer leveling. By introducing optic-elastic modulation, high signal-to-noise is obtained. Analytical result indicates that focusing resolution at nanometer level can be realized.; An optical modulation method based focus and level scheme is presented for optical projection lithography. The main parts of the focus system are analyzed respectively. Several kinds of modulation methods are adopted to realize nanometer resolution, including grating modulation, polarization modulation and optic-elastic modulation. The grating modulation is realized by imaging objective grating to the surface of modulation grating and then the modulation light is sent to polarization part. The polarization modulation is based on birefringence which can divide optical signal into two parts and each part represents the position and focus error of silicon wafer. Two or more equipments can implement wafer leveling. By introducing optic-elastic modulation, high signal-to-noise is obtained. Analytical result indicates that focusing resolution at nanometer level can be realized. |
| Conference Name | Proceedings of the SPIE - The International Society for Optical Engineering |
| Conference Date | 2010 |
| Document Type | 会议论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7636 |
| Collection | 微电子装备总体研究室（四室） |
| Corresponding Author | Wangfu Chen |
| Affiliation | 中国科学院光电技术研究所 |
| Recommended Citation GB/T 7714 | Wangfu Chen,Song Hu. An optical modulation based focus method for optical projection lithography[C],2010:76571J (6 pp.). |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2010-226.pdf（277KB） | 会议论文 | 开放获取 | CC BY-NC-SA | Application Full Text | ||
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