| 题名: | Alignment for double-side deep-exposure lithography tool |
| 作者: | Ma Ping; Fu Xiaofang; Yang Chunli; Hu Song; Tang Xiaoping
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| 出版日期: | 2010
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| 会议名称: | Proceedings of the SPIE - The International Society for Optical Engineering
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| 会议日期: | 2010
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| 通讯作者: | Ma Ping
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| 中文摘要: | The paper presents and discusses several prevalent methods for lithography alignment, and then describes and emphasizes the principle, mechanical structure and alignment procedure of the bottom-side alignment (BSA) system for deep-exposure lithography tool. Also, the error source degrading the precision of the alignment system is analyzed. Other related techniques and methods are provided. In the end, the aligned reticle image shows that the system is proved to be stable, reliable and capable of meeting the required precision when it is applied to DUV double-side deep-exposure mask aligner. |
| 英文摘要: | The paper presents and discusses several prevalent methods for lithography alignment, and then describes and emphasizes the principle, mechanical structure and alignment procedure of the bottom-side alignment (BSA) system for deep-exposure lithography tool. Also, the error source degrading the precision of the alignment system is analyzed. Other related techniques and methods are provided. In the end, the aligned reticle image shows that the system is proved to be stable, reliable and capable of meeting the required precision when it is applied to DUV double-side deep-exposure mask aligner. |
| 收录类别: | Ei
; ISTP
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| 语种: | 英语
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| 卷号: | 7657
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| 文章类型: | 会议论文
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| 页码: | 76571W (6 pp.)
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| 内容类型: | 会议论文
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| URI标识: | http://ir.ioe.ac.cn/handle/181551/7635
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| Appears in Collections: | 微电子装备总体研究室（四室）_会议论文
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| 2010-223.pdf（608KB） | 会议论文 | -- | 限制开放 | | View
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| Recommended Citation: | |
Ma Ping,Fu Xiaofang,Yang Chunli,et al. Alignment for double-side deep-exposure lithography tool[C]. 见:Proceedings of the SPIE - The International Society for Optical Engineering. 2010.
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