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Study on laser direct writing system for 32nm node
Jiang Wenbo; Hu Song; Yang Yong; Zhao Lixin; Yan WEi; Zhou Shaolin; Chen Wangfu
Volume7284
2009
Language英语
Indexed ByEi
Subtype会议论文
AbstractIn this paper, we present a novel laser direct writing system. Compared with conventional laser direct writing system, there are four key techniques in this system. They are illuminating system, leveling and focusing system, precise position work-stage system and diffractive focusing system. We introduce and analyze the four systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of higher resolution and lower cost optical lithographic technology. By proper design the structure of the whole system and the parameters of photon sieve, better resolution can be realized.; In this paper, we present a novel laser direct writing system. Compared with conventional laser direct writing system, there are four key techniques in this system. They are illuminating system, leveling and focusing system, precise position work-stage system and diffractive focusing system. We introduce and analyze the four systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of higher resolution and lower cost optical lithographic technology. By proper design the structure of the whole system and the parameters of photon sieve, better resolution can be realized.
Conference NameProceedings of SPIE
Conference Date2009
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7633
Collection微电子装备总体研究室(四室)
Corresponding AuthorJiang Wenbo
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Jiang Wenbo,Hu Song,Yang Yong,et al. Study on laser direct writing system for 32nm node[C],2009.
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