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题名:
Design of nano-lithographic system based on phase photon sieve
作者: Jiang Wenbo; Hu Song
出版日期: 2009
会议名称: Proceedings of SPIE
会议日期: 2009
通讯作者: Jiang Wenbo
中文摘要: A nano-lithographic system based on phase photon sieve is proposed in this paper to overcome the disadvantages of zone plate array lithographic system and amplitude photon sieve lithographic system. As an important part of the system perfonnance, the resolution of this system is mainly decided by the diffractive element. The phase photon sieve was used as the diffractive element in the proposed system. The structure and performance of the phase photon sieve is therefore very important to the resolution of this system. So, two methods are proposed for the designs and fabrication of the lithographic system based on phase photon sieve. The feasibility of using this system to realize nano-lithography with a resolution is of less than 100nm was then discussed. It is shown through analysis that the system not only has higher resolution and image contrast than the zone plate array lithographic system but also has higher diffractive efficiency than the amplitude photon sieve lithographic system. As a novel lithographic technique, the phase photon sieve lithographic system also offers new opportunities for high resolution X-ray microscopy and spectroscopy in physical and life sciences.
英文摘要: A nano-lithographic system based on phase photon sieve is proposed in this paper to overcome the disadvantages of zone plate array lithographic system and amplitude photon sieve lithographic system. As an important part of the system perfonnance, the resolution of this system is mainly decided by the diffractive element. The phase photon sieve was used as the diffractive element in the proposed system. The structure and performance of the phase photon sieve is therefore very important to the resolution of this system. So, two methods are proposed for the designs and fabrication of the lithographic system based on phase photon sieve. The feasibility of using this system to realize nano-lithography with a resolution is of less than 100nm was then discussed. It is shown through analysis that the system not only has higher resolution and image contrast than the zone plate array lithographic system but also has higher diffractive efficiency than the amplitude photon sieve lithographic system. As a novel lithographic technique, the phase photon sieve lithographic system also offers new opportunities for high resolution X-ray microscopy and spectroscopy in physical and life sciences.
收录类别: Ei
语种: 英语
卷号: 7133
文章类型: 会议论文
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7632
Appears in Collections:微电子装备总体研究室(四室)_会议论文

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作者单位: 中国科学院光电技术研究所

Recommended Citation:
Jiang Wenbo,Hu Song. Design of nano-lithographic system based on phase photon sieve[C]. 见:Proceedings of SPIE. 2009.
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