| Design of nano-lithographic system based on phase photon sieve | |
| Jiang Wenbo; Hu Song | |
| Volume | 7133 |
| 2009 | |
| Language | 英语 |
| Indexed By | Ei |
| Subtype | 会议论文 |
| Abstract | A nano-lithographic system based on phase photon sieve is proposed in this paper to overcome the disadvantages of zone plate array lithographic system and amplitude photon sieve lithographic system. As an important part of the system perfonnance, the resolution of this system is mainly decided by the diffractive element. The phase photon sieve was used as the diffractive element in the proposed system. The structure and performance of the phase photon sieve is therefore very important to the resolution of this system. So, two methods are proposed for the designs and fabrication of the lithographic system based on phase photon sieve. The feasibility of using this system to realize nano-lithography with a resolution is of less than 100nm was then discussed. It is shown through analysis that the system not only has higher resolution and image contrast than the zone plate array lithographic system but also has higher diffractive efficiency than the amplitude photon sieve lithographic system. As a novel lithographic technique, the phase photon sieve lithographic system also offers new opportunities for high resolution X-ray microscopy and spectroscopy in physical and life sciences.; A nano-lithographic system based on phase photon sieve is proposed in this paper to overcome the disadvantages of zone plate array lithographic system and amplitude photon sieve lithographic system. As an important part of the system perfonnance, the resolution of this system is mainly decided by the diffractive element. The phase photon sieve was used as the diffractive element in the proposed system. The structure and performance of the phase photon sieve is therefore very important to the resolution of this system. So, two methods are proposed for the designs and fabrication of the lithographic system based on phase photon sieve. The feasibility of using this system to realize nano-lithography with a resolution is of less than 100nm was then discussed. It is shown through analysis that the system not only has higher resolution and image contrast than the zone plate array lithographic system but also has higher diffractive efficiency than the amplitude photon sieve lithographic system. As a novel lithographic technique, the phase photon sieve lithographic system also offers new opportunities for high resolution X-ray microscopy and spectroscopy in physical and life sciences. |
| Conference Name | Proceedings of SPIE |
| Conference Date | 2009 |
| Document Type | 会议论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7632 |
| Collection | 微电子装备总体研究室（四室） |
| Corresponding Author | Jiang Wenbo |
| Affiliation | 中国科学院光电技术研究所 |
| Recommended Citation GB/T 7714 | Jiang Wenbo,Hu Song. Design of nano-lithographic system based on phase photon sieve[C],2009. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2009-222.pdf（275KB） | 会议论文 | 开放获取 | CC BY-NC-SA | Application Full Text | ||
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