| A path planning method used in fluid jet polishing eliminating lightweight mirror imprinting effect | |
| Li Wenzong; Bin, Fan; Shi Chunyan; Jia, Wang; Bin, Zhuo; Li, WZ (reprint author), Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China. | |
| Volume | 9281 |
| Pages | 92811H |
| 2014 | |
| Language | 英语 |
| ISSN | 0277-786X |
| DOI | 10.1117/12.2070967 |
| Subtype | 会议论文 |
| Abstract | With the development of space technology, the design of optical system tends to large aperture lightweight mirror with high dimension-thickness ratio. However, when the lightweight mirror PV value is less than lambda/10, the surface will show wavy imprinting effect obviously. Imprinting effect introduced by head-tool pressure has become a technological barrier in high-precision lightweight mirror manufacturing. Fluid jet polishing can exclude outside pressure. Presently, machining tracks often used are grating type path, screw type path and pseudo-random path. On the edge of imprinting error, the speed of adjacent path points changes too fast, which causes the machine hard to reflect quickly, brings about new path error, and increases the polishing time due to superfluous path. This paper presents a new planning path method to eliminate imprinting effect. Simulation results show that the path of the improved grating path can better eliminate imprinting effect compared to the general path.; With the development of space technology, the design of optical system tends to large aperture lightweight mirror with high dimension-thickness ratio. However, when the lightweight mirror PV value is less than lambda/10, the surface will show wavy imprinting effect obviously. Imprinting effect introduced by head-tool pressure has become a technological barrier in high-precision lightweight mirror manufacturing. Fluid jet polishing can exclude outside pressure. Presently, machining tracks often used are grating type path, screw type path and pseudo-random path. On the edge of imprinting error, the speed of adjacent path points changes too fast, which causes the machine hard to reflect quickly, brings about new path error, and increases the polishing time due to superfluous path. This paper presents a new planning path method to eliminate imprinting effect. Simulation results show that the path of the improved grating path can better eliminate imprinting effect compared to the general path. |
| Conference Name | Proceedings of SPIE: 7TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: ADVANCED OPTICAL MANUFACTURING TECHNOLOGIES |
| Conference Date | 2014 |
| Citation statistics | |
| Document Type | 会议论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7605 |
| Collection | 先光中心 |
| Corresponding Author | Li, WZ (reprint author), Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China. |
| Affiliation | 1.[Li Wenzong 2.Bin, Fan 3.Shi Chunyan 4.Jia, Wang 5.Bin, Zhuo] Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China |
| Recommended Citation GB/T 7714 | Li Wenzong,Bin, Fan,Shi Chunyan,et al. A path planning method used in fluid jet polishing eliminating lightweight mirror imprinting effect[C],2014:92811H. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2014-2093.pdf（963KB） | 会议论文 | 开放获取 | CC BY-NC-SA | Application Full Text | ||
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment