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A path planning method used in fluid jet polishing eliminating lightweight mirror imprinting effect
Li Wenzong; Bin, Fan; Shi Chunyan; Jia, Wang; Bin, Zhuo; Li, WZ (reprint author), Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China.
Volume9281
Pages92811H
2014
Language英语
ISSN0277-786X
DOI10.1117/12.2070967
Subtype会议论文
AbstractWith the development of space technology, the design of optical system tends to large aperture lightweight mirror with high dimension-thickness ratio. However, when the lightweight mirror PV value is less than lambda/10, the surface will show wavy imprinting effect obviously. Imprinting effect introduced by head-tool pressure has become a technological barrier in high-precision lightweight mirror manufacturing. Fluid jet polishing can exclude outside pressure. Presently, machining tracks often used are grating type path, screw type path and pseudo-random path. On the edge of imprinting error, the speed of adjacent path points changes too fast, which causes the machine hard to reflect quickly, brings about new path error, and increases the polishing time due to superfluous path. This paper presents a new planning path method to eliminate imprinting effect. Simulation results show that the path of the improved grating path can better eliminate imprinting effect compared to the general path.; With the development of space technology, the design of optical system tends to large aperture lightweight mirror with high dimension-thickness ratio. However, when the lightweight mirror PV value is less than lambda/10, the surface will show wavy imprinting effect obviously. Imprinting effect introduced by head-tool pressure has become a technological barrier in high-precision lightweight mirror manufacturing. Fluid jet polishing can exclude outside pressure. Presently, machining tracks often used are grating type path, screw type path and pseudo-random path. On the edge of imprinting error, the speed of adjacent path points changes too fast, which causes the machine hard to reflect quickly, brings about new path error, and increases the polishing time due to superfluous path. This paper presents a new planning path method to eliminate imprinting effect. Simulation results show that the path of the improved grating path can better eliminate imprinting effect compared to the general path.
Conference NameProceedings of SPIE: 7TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: ADVANCED OPTICAL MANUFACTURING TECHNOLOGIES
Conference Date2014
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7605
Collection先光中心
Corresponding AuthorLi, WZ (reprint author), Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China.
Affiliation1.[Li Wenzong
2.Bin, Fan
3.Shi Chunyan
4.Jia, Wang
5.Bin, Zhuo] Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China
Recommended Citation
GB/T 7714
Li Wenzong,Bin, Fan,Shi Chunyan,et al. A path planning method used in fluid jet polishing eliminating lightweight mirror imprinting effect[C],2014:92811H.
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