| 题名: | A path planning method used in fluid jet polishing eliminating lightweight mirror imprinting effect |
| 作者: | Li Wenzong; Bin, Fan; Shi Chunyan; Jia, Wang; Bin, Zhuo
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| 出版日期: | 2014
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| 会议名称: | Proceedings of SPIE: 7TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: ADVANCED OPTICAL MANUFACTURING TECHNOLOGIES
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| 会议日期: | 2014
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| 学科分类: | optical processing; fluid jet polishing; imprinting effect; the improved grating path
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| DOI: | 10.1117/12.2070967
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| 通讯作者: | Li, WZ (reprint author), Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China.
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| 中文摘要: | With the development of space technology, the design of optical system tends to large aperture lightweight mirror with high dimension-thickness ratio. However, when the lightweight mirror PV value is less than lambda/10, the surface will show wavy imprinting effect obviously. Imprinting effect introduced by head-tool pressure has become a technological barrier in high-precision lightweight mirror manufacturing. Fluid jet polishing can exclude outside pressure. Presently, machining tracks often used are grating type path, screw type path and pseudo-random path. On the edge of imprinting error, the speed of adjacent path points changes too fast, which causes the machine hard to reflect quickly, brings about new path error, and increases the polishing time due to superfluous path. This paper presents a new planning path method to eliminate imprinting effect. Simulation results show that the path of the improved grating path can better eliminate imprinting effect compared to the general path. |
| 英文摘要: | With the development of space technology, the design of optical system tends to large aperture lightweight mirror with high dimension-thickness ratio. However, when the lightweight mirror PV value is less than lambda/10, the surface will show wavy imprinting effect obviously. Imprinting effect introduced by head-tool pressure has become a technological barrier in high-precision lightweight mirror manufacturing. Fluid jet polishing can exclude outside pressure. Presently, machining tracks often used are grating type path, screw type path and pseudo-random path. On the edge of imprinting error, the speed of adjacent path points changes too fast, which causes the machine hard to reflect quickly, brings about new path error, and increases the polishing time due to superfluous path. This paper presents a new planning path method to eliminate imprinting effect. Simulation results show that the path of the improved grating path can better eliminate imprinting effect compared to the general path. |
| 语种: | 英语
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| 卷号: | 9281
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| ISSN号: | 0277-786X
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| 文章类型: | 会议论文
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| 页码: | 92811H
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| Citation statistics: |
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| 内容类型: | 会议论文
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| URI标识: | http://ir.ioe.ac.cn/handle/181551/7605
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| Appears in Collections: | 先光中心_会议论文
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| 2014-2093.pdf（963KB） | 会议论文 | -- | 限制开放 | | View
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作者单位: | 1.[Li Wenzong
2.Bin, Fan
3.Shi Chunyan
4.Jia, Wang
5.Bin, Zhuo] Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China
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| Recommended Citation: | |
Li Wenzong,Bin, Fan,Shi Chunyan,et al. A path planning method used in fluid jet polishing eliminating lightweight mirror imprinting effect[C]. 见:Proceedings of SPIE: 7TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: ADVANCED OPTICAL MANUFACTURING TECHNOLOGIES. 2014.
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