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Design and analysis of hologram alignment mark
Li, Shijie1,2; Wu, Fan1; Chen, Qianga1; Li, S.
Volume8417
Pages84172G
2012
Language英语
ISSN0277786X
DOI10.1117/12.971196
Indexed ByEi
Subtype会议论文
AbstractWhen testing an off-axis aspheric surface using Computer Generated Hologram (CGH), multiple combined CGH can not only test the off-axis aspheric surface but also align every element in test system. The alignment transmission CGH with a rectangle aperture, which produces an alignment mark at the designated point, can be used to align the off-axis aspheric surface and CGH. Hologram alignment mark is introduced firstly, then the design of hologram alignment mark is deduced in detail and a formula of calculating the position coordinate of every point on fringes is got. After that its diffraction characteristics are analyzed based on Fresnel diffraction theory, which is in line with Fraunhofer diffraction, and the effects of different length-width ratio of rectangle aperture are simulated. Finally an example of hologram alignment mark and its corresponding actual mark picture are given. © 2012 SPIE.; When testing an off-axis aspheric surface using Computer Generated Hologram (CGH), multiple combined CGH can not only test the off-axis aspheric surface but also align every element in test system. The alignment transmission CGH with a rectangle aperture, which produces an alignment mark at the designated point, can be used to align the off-axis aspheric surface and CGH. Hologram alignment mark is introduced firstly, then the design of hologram alignment mark is deduced in detail and a formula of calculating the position coordinate of every point on fringes is got. After that its diffraction characteristics are analyzed based on Fresnel diffraction theory, which is in line with Fraunhofer diffraction, and the effects of different length-width ratio of rectangle aperture are simulated. Finally an example of hologram alignment mark and its corresponding actual mark picture are given. © 2012 SPIE.
Conference NameProceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Conference Date2012
Citation statistics
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7592
Collection先光中心
Corresponding AuthorLi, S.
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. Graduate School, Chinese Academy of Sciences, Beijing 100039, China
Recommended Citation
GB/T 7714
Li, Shijie,Wu, Fan,Chen, Qianga,et al. Design and analysis of hologram alignment mark[C],2012:84172G.
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