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题名:
Design and analysis of hologram alignment mark
作者: Li, Shijie1,2; Wu, Fan1; Chen, Qianga1
出版日期: 2012
会议名称: Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
会议日期: 2012
DOI: 10.1117/12.971196
通讯作者: Li, S.
中文摘要: When testing an off-axis aspheric surface using Computer Generated Hologram (CGH), multiple combined CGH can not only test the off-axis aspheric surface but also align every element in test system. The alignment transmission CGH with a rectangle aperture, which produces an alignment mark at the designated point, can be used to align the off-axis aspheric surface and CGH. Hologram alignment mark is introduced firstly, then the design of hologram alignment mark is deduced in detail and a formula of calculating the position coordinate of every point on fringes is got. After that its diffraction characteristics are analyzed based on Fresnel diffraction theory, which is in line with Fraunhofer diffraction, and the effects of different length-width ratio of rectangle aperture are simulated. Finally an example of hologram alignment mark and its corresponding actual mark picture are given. © 2012 SPIE.
英文摘要: When testing an off-axis aspheric surface using Computer Generated Hologram (CGH), multiple combined CGH can not only test the off-axis aspheric surface but also align every element in test system. The alignment transmission CGH with a rectangle aperture, which produces an alignment mark at the designated point, can be used to align the off-axis aspheric surface and CGH. Hologram alignment mark is introduced firstly, then the design of hologram alignment mark is deduced in detail and a formula of calculating the position coordinate of every point on fringes is got. After that its diffraction characteristics are analyzed based on Fresnel diffraction theory, which is in line with Fraunhofer diffraction, and the effects of different length-width ratio of rectangle aperture are simulated. Finally an example of hologram alignment mark and its corresponding actual mark picture are given. © 2012 SPIE.
收录类别: Ei
语种: 英语
卷号: 8417
ISSN号: 0277786X
文章类型: 会议论文
页码: 84172G
Citation statistics:
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7592
Appears in Collections:先光中心_会议论文

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作者单位: 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. Graduate School, Chinese Academy of Sciences, Beijing 100039, China

Recommended Citation:
Li, Shijie,Wu, Fan,Chen, Qianga. Design and analysis of hologram alignment mark[C]. 见:Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment. 2012.
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