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题名:
Research on effect of Kell coefficient on the quality of aerial photography
作者: Yue Fan; Wenli Ma
出版日期: 2010
会议名称: Proceedings of the SPIE - The International Society for Optical Engineering
会议日期: 2010
通讯作者: Yue Fan
中文摘要: The method of Spatial convolution is applied to analyze the imaging process of the CCD imaging system, which involves optical imaging process and CCD integral sampling process, and the ratio between GRD and GSD that is called Kell coefficient is introduced, based on which, analysis of effect of Kell coefficient on the quality of aerial photography is educed. Imaging process of the target is simulated with different Kell coefficient values by Matlab. The method of the gray difference between the target and the image on CCD which is regarded as the evaluation criteria is proposed to evaluate the image quality. The simulation results show that when Kell coefficient equals 2.8, the target characteristics can be distinguished.
英文摘要: The method of Spatial convolution is applied to analyze the imaging process of the CCD imaging system, which involves optical imaging process and CCD integral sampling process, and the ratio between GRD and GSD that is called Kell coefficient is introduced, based on which, analysis of effect of Kell coefficient on the quality of aerial photography is educed. Imaging process of the target is simulated with different Kell coefficient values by Matlab. The method of the gray difference between the target and the image on CCD which is regarded as the evaluation criteria is proposed to evaluate the image quality. The simulation results show that when Kell coefficient equals 2.8, the target characteristics can be distinguished.
收录类别: Ei ; ISTP
语种: 英语
卷号: 7658
文章类型: 会议论文
页码: 76581I (6 pp.)
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7532
Appears in Collections:光电探测技术研究室(三室)_会议论文

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作者单位: 中国科学院光电技术研究所

Recommended Citation:
Yue Fan,Wenli Ma. Research on effect of Kell coefficient on the quality of aerial photography[C]. 见:Proceedings of the SPIE - The International Society for Optical Engineering. 2010.
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