IOE OpenIR  > 应用光学研究室(二室)
Dynamic compensation for the lithographic object lens
Zhu, Hongwei1; Xing, Tingwen1; Chen, Zexiang2
Volume9195
Pages91950P
2014
Language英语
ISSN0277786X
DOI10.1117/12.2060302
Indexed ByEi
Subtype会议论文
AbstractThe nominal design residual aberrations are very small for the lithographic object lens. The RMS wavefront error is in a few milliwaves, and the distortion is in a few nanometers. However, The manufacturing-induced aberrations are inevitable and usually many times larger than the design residual level. One method to reduce the manufacturing-induced aberrations is making a few lens adjustable after the object lens is assembled. Dynamic compensation can correct element metrology and assembly errors effectively, especially for the low order Zernike aberrations. We introduce a dynamic compensation method in this paper. This technique is based on the simulated imaging performance using Zernike sensitivity, which is the simulated results of wavefront aberration change by lens element position change. We can select the potential moving lens by this technique. This method can find the optimum combination of moving lens position where the lithographic object lens imaging performance is improved remarkably. © 2014 SPIE.; The nominal design residual aberrations are very small for the lithographic object lens. The RMS wavefront error is in a few milliwaves, and the distortion is in a few nanometers. However, The manufacturing-induced aberrations are inevitable and usually many times larger than the design residual level. One method to reduce the manufacturing-induced aberrations is making a few lens adjustable after the object lens is assembled. Dynamic compensation can correct element metrology and assembly errors effectively, especially for the low order Zernike aberrations. We introduce a dynamic compensation method in this paper. This technique is based on the simulated imaging performance using Zernike sensitivity, which is the simulated results of wavefront aberration change by lens element position change. We can select the potential moving lens by this technique. This method can find the optimum combination of moving lens position where the lithographic object lens imaging performance is improved remarkably. © 2014 SPIE.
Conference NameProceedings of SPIE: Optical System Alignment, Tolerancing, and Verification VIII
Conference Date2014
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7499
Collection应用光学研究室(二室)
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
2. University of Electronic Science and Technology of China, China
Recommended Citation
GB/T 7714
Zhu, Hongwei,Xing, Tingwen,Chen, Zexiang. Dynamic compensation for the lithographic object lens[C],2014:91950P.
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