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题名:
Two-dimension lateral shearing interferometry for microscope objective wavefront metrology
作者: Liu, Zhixiang1,2,3; Xing, Tingwen1; Jiang, Yadong2; Lv, Baobin1,2,3; Xu, Fuchao1
出版日期: 2014
会议名称: Proceedings of SPIE: Optical Design and Testing VI
会议日期: 2014
学科分类: Aberrations - Interferometers - Interferometry - Microscopes - Optical design - Photonic crystals - Units of measurement - Wavefronts
DOI: 10.1117/12.2071500
通讯作者: Liu, Zhixiang
中文摘要: Lateral shearing interferometry was an attractive technique to measure the wavefront aberration of high numerical aperture microscope objective lens. A two-dimension lateral shearing interferometer based on chessboard grating was designed for microscope objective wavefront metrology. By positioning the chessboard grating at the Talbot distance of the objective focal plane, the wavefront was divided and sheared in two-dimension. By applying two-dimensional Fourier transform method and differential Zernike polynomial fitting, Zernike coefficients of the wavefront were obtained. A 10x, NA0.25 microscope objective was measured at 632.8nm wavelength, the results showed that the wavefront of the objective was 0.755λ PV, 0.172λ RMS, the repeatability(3σ) of RMS at random grating position was 2.3mλ, the repeatability(3if) of Z5 to Z36 at random grating position were better than 17mλ. © 2014 SPIE.
英文摘要: Lateral shearing interferometry was an attractive technique to measure the wavefront aberration of high numerical aperture microscope objective lens. A two-dimension lateral shearing interferometer based on chessboard grating was designed for microscope objective wavefront metrology. By positioning the chessboard grating at the Talbot distance of the objective focal plane, the wavefront was divided and sheared in two-dimension. By applying two-dimensional Fourier transform method and differential Zernike polynomial fitting, Zernike coefficients of the wavefront were obtained. A 10x, NA0.25 microscope objective was measured at 632.8nm wavelength, the results showed that the wavefront of the objective was 0.755λ PV, 0.172λ RMS, the repeatability(3σ) of RMS at random grating position was 2.3mλ, the repeatability(3if) of Z5 to Z36 at random grating position were better than 17mλ. © 2014 SPIE.
收录类别: Ei
语种: 英语
卷号: 9272
ISSN号: 0277786X
文章类型: 会议论文
页码: 92721B
Citation statistics:
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7498
Appears in Collections:应用光学研究室(二室)_会议论文

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作者单位: 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
2. University of Electronic Science and Technology of China, Chengdu, China
3. University of Chinese Academy of Sciences, Beijing, China

Recommended Citation:
Liu, Zhixiang,Xing, Tingwen,Jiang, Yadong,et al. Two-dimension lateral shearing interferometry for microscope objective wavefront metrology[C]. 见:Proceedings of SPIE: Optical Design and Testing VI. 2014.
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