| Two-dimension lateral shearing interferometry for microscope objective wavefront metrology | |
| Liu, Zhixiang1,2,3; Xing, Tingwen1; Jiang, Yadong2; Lv, Baobin1,2,3; Xu, Fuchao1 | |
| Volume | 9272 |
| Pages | 92721B |
| 2014 | |
| Language | 英语 |
| ISSN | 0277786X |
| DOI | 10.1117/12.2071500 |
| Indexed By | Ei |
| Subtype | 会议论文 |
| Abstract | Lateral shearing interferometry was an attractive technique to measure the wavefront aberration of high numerical aperture microscope objective lens. A two-dimension lateral shearing interferometer based on chessboard grating was designed for microscope objective wavefront metrology. By positioning the chessboard grating at the Talbot distance of the objective focal plane, the wavefront was divided and sheared in two-dimension. By applying two-dimensional Fourier transform method and differential Zernike polynomial fitting, Zernike coefficients of the wavefront were obtained. A 10x, NA0.25 microscope objective was measured at 632.8nm wavelength, the results showed that the wavefront of the objective was 0.755λ PV, 0.172λ RMS, the repeatability(3σ) of RMS at random grating position was 2.3mλ, the repeatability(3if) of Z5 to Z36 at random grating position were better than 17mλ. © 2014 SPIE.; Lateral shearing interferometry was an attractive technique to measure the wavefront aberration of high numerical aperture microscope objective lens. A two-dimension lateral shearing interferometer based on chessboard grating was designed for microscope objective wavefront metrology. By positioning the chessboard grating at the Talbot distance of the objective focal plane, the wavefront was divided and sheared in two-dimension. By applying two-dimensional Fourier transform method and differential Zernike polynomial fitting, Zernike coefficients of the wavefront were obtained. A 10x, NA0.25 microscope objective was measured at 632.8nm wavelength, the results showed that the wavefront of the objective was 0.755λ PV, 0.172λ RMS, the repeatability(3σ) of RMS at random grating position was 2.3mλ, the repeatability(3if) of Z5 to Z36 at random grating position were better than 17mλ. © 2014 SPIE. |
| Conference Name | Proceedings of SPIE: Optical Design and Testing VI |
| Conference Date | 2014 |
| Citation statistics | |
| Document Type | 会议论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7498 |
| Collection | 应用光学研究室（二室） |
| Corresponding Author | Liu, Zhixiang |
| Affiliation | 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China 2. University of Electronic Science and Technology of China, Chengdu, China 3. University of Chinese Academy of Sciences, Beijing, China |
| Recommended Citation GB/T 7714 | Liu, Zhixiang,Xing, Tingwen,Jiang, Yadong,et al. Two-dimension lateral shearing interferometry for microscope objective wavefront metrology[C],2014:92721B. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2014-2168.pdf（439KB） | 会议论文 | 开放获取 | CC BY-NC-SA | Application Full Text | ||
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