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Two-dimension lateral shearing interferometry for microscope objective wavefront metrology
Liu, Zhixiang1,2,3; Xing, Tingwen1; Jiang, Yadong2; Lv, Baobin1,2,3; Xu, Fuchao1
Volume9272
Pages92721B
2014
Language英语
ISSN0277786X
DOI10.1117/12.2071500
Indexed ByEi
Subtype会议论文
AbstractLateral shearing interferometry was an attractive technique to measure the wavefront aberration of high numerical aperture microscope objective lens. A two-dimension lateral shearing interferometer based on chessboard grating was designed for microscope objective wavefront metrology. By positioning the chessboard grating at the Talbot distance of the objective focal plane, the wavefront was divided and sheared in two-dimension. By applying two-dimensional Fourier transform method and differential Zernike polynomial fitting, Zernike coefficients of the wavefront were obtained. A 10x, NA0.25 microscope objective was measured at 632.8nm wavelength, the results showed that the wavefront of the objective was 0.755λ PV, 0.172λ RMS, the repeatability(3σ) of RMS at random grating position was 2.3mλ, the repeatability(3if) of Z5 to Z36 at random grating position were better than 17mλ. © 2014 SPIE.; Lateral shearing interferometry was an attractive technique to measure the wavefront aberration of high numerical aperture microscope objective lens. A two-dimension lateral shearing interferometer based on chessboard grating was designed for microscope objective wavefront metrology. By positioning the chessboard grating at the Talbot distance of the objective focal plane, the wavefront was divided and sheared in two-dimension. By applying two-dimensional Fourier transform method and differential Zernike polynomial fitting, Zernike coefficients of the wavefront were obtained. A 10x, NA0.25 microscope objective was measured at 632.8nm wavelength, the results showed that the wavefront of the objective was 0.755λ PV, 0.172λ RMS, the repeatability(3σ) of RMS at random grating position was 2.3mλ, the repeatability(3if) of Z5 to Z36 at random grating position were better than 17mλ. © 2014 SPIE.
Conference NameProceedings of SPIE: Optical Design and Testing VI
Conference Date2014
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7498
Collection应用光学研究室(二室)
Corresponding AuthorLiu, Zhixiang
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
2. University of Electronic Science and Technology of China, Chengdu, China
3. University of Chinese Academy of Sciences, Beijing, China
Recommended Citation
GB/T 7714
Liu, Zhixiang,Xing, Tingwen,Jiang, Yadong,et al. Two-dimension lateral shearing interferometry for microscope objective wavefront metrology[C],2014:92721B.
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