| Source optimization using simulated annealing algorithm | |
| Jiang, Haibo1,2; Xing, Tingwen1; Du, Meng1,2 | |
| Volume | 9282 |
| Pages | 928239 |
| 2014 | |
| Language | 英语 |
| ISSN | 0277786X |
| DOI | 10.1117/12.2069398 |
| Indexed By | Ei |
| Subtype | 会议论文 |
| Abstract | As lithography still pushing toward to lower k1 imaging, traditional illumination source shapes may perform marginally in resolving complex layouts, freeform source shapes are expected to achieve better image quality. Illumination optimization as one of inverse lithography techniques attempts to synthesize the input source which leads to the desired output wafer pattern by inverting the forward model from mask to wafer. This paper proposes a method to optimize illumination by using simulated annealing algorithms (SA). A synthesis of the NILS values at multi-critical mask locations over a focus range is chose as the merit function. The advantage of the SA algorithm is that it can identify optimum source solutions without any additional apriori knowledge about lithographic processes. The results show that our method can provide great improvements in both image quality and DOF. © 2014 SPIE.; As lithography still pushing toward to lower k1 imaging, traditional illumination source shapes may perform marginally in resolving complex layouts, freeform source shapes are expected to achieve better image quality. Illumination optimization as one of inverse lithography techniques attempts to synthesize the input source which leads to the desired output wafer pattern by inverting the forward model from mask to wafer. This paper proposes a method to optimize illumination by using simulated annealing algorithms (SA). A synthesis of the NILS values at multi-critical mask locations over a focus range is chose as the merit function. The advantage of the SA algorithm is that it can identify optimum source solutions without any additional apriori knowledge about lithographic processes. The results show that our method can provide great improvements in both image quality and DOF. © 2014 SPIE. |
| Conference Name | Proceedings of SPIE: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment |
| Conference Date | 2014 |
| Citation statistics | |
| Document Type | 会议论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7493 |
| Collection | 应用光学研究室（二室） |
| Affiliation | 1. Lab of Applied Optics, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China 2. Graduate School of the Chinese Academy of Sciences, Beijing, China |
| Recommended Citation GB/T 7714 | Jiang, Haibo,Xing, Tingwen,Du, Meng. Source optimization using simulated annealing algorithm[C],2014:928239. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2014-2134.pdf（429KB） | 会议论文 | 开放获取 | CC BY-NC-SA | Application Full Text | ||
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