IOE OpenIR  > 应用光学研究室(二室)
Source optimization using simulated annealing algorithm
Jiang, Haibo1,2; Xing, Tingwen1; Du, Meng1,2
Volume9282
Pages928239
2014
Language英语
ISSN0277786X
DOI10.1117/12.2069398
Indexed ByEi
Subtype会议论文
AbstractAs lithography still pushing toward to lower k1 imaging, traditional illumination source shapes may perform marginally in resolving complex layouts, freeform source shapes are expected to achieve better image quality. Illumination optimization as one of inverse lithography techniques attempts to synthesize the input source which leads to the desired output wafer pattern by inverting the forward model from mask to wafer. This paper proposes a method to optimize illumination by using simulated annealing algorithms (SA). A synthesis of the NILS values at multi-critical mask locations over a focus range is chose as the merit function. The advantage of the SA algorithm is that it can identify optimum source solutions without any additional apriori knowledge about lithographic processes. The results show that our method can provide great improvements in both image quality and DOF. © 2014 SPIE.; As lithography still pushing toward to lower k1 imaging, traditional illumination source shapes may perform marginally in resolving complex layouts, freeform source shapes are expected to achieve better image quality. Illumination optimization as one of inverse lithography techniques attempts to synthesize the input source which leads to the desired output wafer pattern by inverting the forward model from mask to wafer. This paper proposes a method to optimize illumination by using simulated annealing algorithms (SA). A synthesis of the NILS values at multi-critical mask locations over a focus range is chose as the merit function. The advantage of the SA algorithm is that it can identify optimum source solutions without any additional apriori knowledge about lithographic processes. The results show that our method can provide great improvements in both image quality and DOF. © 2014 SPIE.
Conference NameProceedings of SPIE: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Conference Date2014
Citation statistics
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7493
Collection应用光学研究室(二室)
Affiliation1. Lab of Applied Optics, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
2. Graduate School of the Chinese Academy of Sciences, Beijing, China
Recommended Citation
GB/T 7714
Jiang, Haibo,Xing, Tingwen,Du, Meng. Source optimization using simulated annealing algorithm[C],2014:928239.
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