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题名:
Error analysis for aspheric surface testing system
作者: Feng, Jie1,2; Deng, Chao1; Xing, Tingwen1
出版日期: 2013
会议名称: Proceedings of SPIE: International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications
会议日期: 2013
学科分类: Alignment - Aspherics - Computer generated holography - Fabrication - Holograms - Instruments - Interferometry - Lithography - Surface roughness - Wavefronts
DOI: 10.1117/12.2034884
中文摘要: Computer-generated holograms (CGHs) are commonly used in optical interferometry for producing reference wavefronts with desired shapes. Uncertainties from the computer generated hologram (CGH) manufacturing processes produce errors in the finished hologram and the generated reference wavefront. CGH errors compromise the accuracy of the interferometric measurements. Although errors in the CGHs may be introduced during either the design or the fabrication process, fabrication uncertainties are mostly responsible for the degradation of the quality of CGHs. To specify and verify detection accuracy of aspheric surface testing system, alignment errors and fabrication errors of the CGHs will be analyzed. Methods are discussed for measuring the fabrication errors in the CGH substrate, duty cycle, etching depth, and effect of surface roughness. An example analysis of the wavefront errors from fabrication nonuniformities for a phase CGH is given. © 2013 SPIE.
英文摘要: Computer-generated holograms (CGHs) are commonly used in optical interferometry for producing reference wavefronts with desired shapes. Uncertainties from the computer generated hologram (CGH) manufacturing processes produce errors in the finished hologram and the generated reference wavefront. CGH errors compromise the accuracy of the interferometric measurements. Although errors in the CGHs may be introduced during either the design or the fabrication process, fabrication uncertainties are mostly responsible for the degradation of the quality of CGHs. To specify and verify detection accuracy of aspheric surface testing system, alignment errors and fabrication errors of the CGHs will be analyzed. Methods are discussed for measuring the fabrication errors in the CGH substrate, duty cycle, etching depth, and effect of surface roughness. An example analysis of the wavefront errors from fabrication nonuniformities for a phase CGH is given. © 2013 SPIE.
收录类别: Ei
语种: 英语
卷号: 8911
ISSN号: 0277786X
文章类型: 会议论文
页码: 89110V
Citation statistics:
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7479
Appears in Collections:应用光学研究室(二室)_会议论文

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作者单位: 1. Laboratory of Applied Optics, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100049, China

Recommended Citation:
Feng, Jie,Deng, Chao,Xing, Tingwen. Error analysis for aspheric surface testing system[C]. 见:Proceedings of SPIE: International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications. 2013.
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