IOE OpenIR  > 应用光学研究室(二室)
Error analysis for aspheric surface testing system
Feng, Jie1,2; Deng, Chao1; Xing, Tingwen1
Volume8911
Pages89110V
2013
Language英语
ISSN0277786X
DOI10.1117/12.2034884
Indexed ByEi
Subtype会议论文
AbstractComputer-generated holograms (CGHs) are commonly used in optical interferometry for producing reference wavefronts with desired shapes. Uncertainties from the computer generated hologram (CGH) manufacturing processes produce errors in the finished hologram and the generated reference wavefront. CGH errors compromise the accuracy of the interferometric measurements. Although errors in the CGHs may be introduced during either the design or the fabrication process, fabrication uncertainties are mostly responsible for the degradation of the quality of CGHs. To specify and verify detection accuracy of aspheric surface testing system, alignment errors and fabrication errors of the CGHs will be analyzed. Methods are discussed for measuring the fabrication errors in the CGH substrate, duty cycle, etching depth, and effect of surface roughness. An example analysis of the wavefront errors from fabrication nonuniformities for a phase CGH is given. © 2013 SPIE.; Computer-generated holograms (CGHs) are commonly used in optical interferometry for producing reference wavefronts with desired shapes. Uncertainties from the computer generated hologram (CGH) manufacturing processes produce errors in the finished hologram and the generated reference wavefront. CGH errors compromise the accuracy of the interferometric measurements. Although errors in the CGHs may be introduced during either the design or the fabrication process, fabrication uncertainties are mostly responsible for the degradation of the quality of CGHs. To specify and verify detection accuracy of aspheric surface testing system, alignment errors and fabrication errors of the CGHs will be analyzed. Methods are discussed for measuring the fabrication errors in the CGH substrate, duty cycle, etching depth, and effect of surface roughness. An example analysis of the wavefront errors from fabrication nonuniformities for a phase CGH is given. © 2013 SPIE.
Conference NameProceedings of SPIE: International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications
Conference Date2013
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Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7479
Collection应用光学研究室(二室)
Affiliation1. Laboratory of Applied Optics, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100049, China
Recommended Citation
GB/T 7714
Feng, Jie,Deng, Chao,Xing, Tingwen. Error analysis for aspheric surface testing system[C],2013:89110V.
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