中国科学院光电技术研究所机构知识库
Advanced  
IOE OpenIR  > 应用光学研究室(二室)  > 会议论文
题名:
Study of the impact of gas temperature and pressure on image quality of lithography objective lens
作者: Chao, Zhou1,2; Tingwen, Xing1
出版日期: 2013
会议名称: Proceedings of SPIE: International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications
会议日期: 2013
学科分类: Aberrations - Computer simulation - Image quality - Optical instrument lenses - Optical systems - Patents and inventions - Photolithography - Refractive index - Wavefronts
DOI: 10.1117/12.2034543
中文摘要: The aim of present work is to estimate the impact of gas refractive index shift on the image quality of projection lens caused by the change of environment condition. This work in the paper consists of two parts: a)when temperature rises or reduces, how gas refractive index changes and the wave front error comes up; b)when gas pressure changes. The model objective lens developed for simulation is a US patent lens whose NA >1 and wave front RMS < 5nm in all fields. This paper includes an illustration of the impact of gas refractive index shift on optical system data, wave front, and aberration. According to the analysis, wave front RMS of projection lens will increase about 10nm if the temperature changed by 0.1K or the gas pressure by 100 Pa. Comparing to origin wave front RMS of the patent lens, 5nm, the change caused by gas temperature and pressure can't be neglected. It proves the necessary of compensating or controlling the optical path change resulted from gas refractive index shift during the lithography projection lens work process. © 2013 SPIE.
英文摘要: The aim of present work is to estimate the impact of gas refractive index shift on the image quality of projection lens caused by the change of environment condition. This work in the paper consists of two parts: a)when temperature rises or reduces, how gas refractive index changes and the wave front error comes up; b)when gas pressure changes. The model objective lens developed for simulation is a US patent lens whose NA >1 and wave front RMS < 5nm in all fields. This paper includes an illustration of the impact of gas refractive index shift on optical system data, wave front, and aberration. According to the analysis, wave front RMS of projection lens will increase about 10nm if the temperature changed by 0.1K or the gas pressure by 100 Pa. Comparing to origin wave front RMS of the patent lens, 5nm, the change caused by gas temperature and pressure can't be neglected. It proves the necessary of compensating or controlling the optical path change resulted from gas refractive index shift during the lithography projection lens work process. © 2013 SPIE.
收录类别: Ei
语种: 英语
卷号: 8911
ISSN号: 0277786X
文章类型: 会议论文
页码: 89110M
Citation statistics:
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7477
Appears in Collections:应用光学研究室(二室)_会议论文

Files in This Item:
File Name/ File Size Content Type Version Access License
2013-2033.pdf(509KB)会议论文--限制开放View 联系获取全文

作者单位: 1. Lab of applied optics, Institute of Optics and Electronic, Chinese Academy of Science, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100049, China

Recommended Citation:
Chao, Zhou,Tingwen, Xing. Study of the impact of gas temperature and pressure on image quality of lithography objective lens[C]. 见:Proceedings of SPIE: International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications. 2013.
Service
Recommend this item
Sava as my favorate item
Show this item's statistics
Export Endnote File
Google Scholar
Similar articles in Google Scholar
[Chao, Zhou]'s Articles
[Tingwen, Xing]'s Articles
CSDL cross search
Similar articles in CSDL Cross Search
[Chao, Zhou]‘s Articles
[Tingwen, Xing]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
Add to CiteULike Add to Connotea Add to Del.icio.us Add to Digg Add to Reddit
文件名: 2013-2033.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Copyright © 2007-2016  中国科学院光电技术研究所 - Feedback
Powered by CSpace