IOE OpenIR  > 应用光学研究室(二室)
Vector analysis of two-dimensional Ronchi grating in the metrology system
Yao, Zhengpeng1,2; Xing, Tingwen1
Volume8911
Pages89110J
2013
Language英语
ISSN0277786X
DOI10.1117/12.2034499
Indexed ByEi
Subtype会议论文
AbstractThe semiconductor industry is aggressively pushed to produce smaller and smaller feature size from their existing base of lithography system, wavefront aberration should be derived by comparing ideal and real wavefronts at the wafer plane of a high resolution lithography system. In modern optical metrology, shearing interferometer is used more and more widely. We proposed a two-dimensional shearing interferometer, using two-dimensional Ronchi grating instead of a traditional one-dimensional grating, which can realize multidirectional and multidimensional shear. In order to further improve the detection accuracy of metrology system, vector diffraction theory is introduced. By comparing the vector and scalar light field, finally we can get the impact of vector light field on the performance of the shearing interferometer. This is for us to further improve the accuracy of detection system to provide rich information, which is crucial for the development of the lithography process. © 2013 SPIE.; The semiconductor industry is aggressively pushed to produce smaller and smaller feature size from their existing base of lithography system, wavefront aberration should be derived by comparing ideal and real wavefronts at the wafer plane of a high resolution lithography system. In modern optical metrology, shearing interferometer is used more and more widely. We proposed a two-dimensional shearing interferometer, using two-dimensional Ronchi grating instead of a traditional one-dimensional grating, which can realize multidirectional and multidimensional shear. In order to further improve the detection accuracy of metrology system, vector diffraction theory is introduced. By comparing the vector and scalar light field, finally we can get the impact of vector light field on the performance of the shearing interferometer. This is for us to further improve the accuracy of detection system to provide rich information, which is crucial for the development of the lithography process. © 2013 SPIE.
Conference NameProceedings of SPIE: International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications
Conference Date2013
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Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7474
Collection应用光学研究室(二室)
Affiliation1. Lab of applied optics, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100049, China
Recommended Citation
GB/T 7714
Yao, Zhengpeng,Xing, Tingwen. Vector analysis of two-dimensional Ronchi grating in the metrology system[C],2013:89110J.
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