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题名:
Vector analysis of two-dimensional Ronchi grating in the metrology system
作者: Yao, Zhengpeng1,2; Xing, Tingwen1
出版日期: 2013
会议名称: Proceedings of SPIE: International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications
会议日期: 2013
学科分类: Aberrations - Diffraction - Diffraction gratings - Interferometers - Semiconductor device manufacture - Shearing - Two dimensional - Units of measurement
DOI: 10.1117/12.2034499
中文摘要: The semiconductor industry is aggressively pushed to produce smaller and smaller feature size from their existing base of lithography system, wavefront aberration should be derived by comparing ideal and real wavefronts at the wafer plane of a high resolution lithography system. In modern optical metrology, shearing interferometer is used more and more widely. We proposed a two-dimensional shearing interferometer, using two-dimensional Ronchi grating instead of a traditional one-dimensional grating, which can realize multidirectional and multidimensional shear. In order to further improve the detection accuracy of metrology system, vector diffraction theory is introduced. By comparing the vector and scalar light field, finally we can get the impact of vector light field on the performance of the shearing interferometer. This is for us to further improve the accuracy of detection system to provide rich information, which is crucial for the development of the lithography process. © 2013 SPIE.
英文摘要: The semiconductor industry is aggressively pushed to produce smaller and smaller feature size from their existing base of lithography system, wavefront aberration should be derived by comparing ideal and real wavefronts at the wafer plane of a high resolution lithography system. In modern optical metrology, shearing interferometer is used more and more widely. We proposed a two-dimensional shearing interferometer, using two-dimensional Ronchi grating instead of a traditional one-dimensional grating, which can realize multidirectional and multidimensional shear. In order to further improve the detection accuracy of metrology system, vector diffraction theory is introduced. By comparing the vector and scalar light field, finally we can get the impact of vector light field on the performance of the shearing interferometer. This is for us to further improve the accuracy of detection system to provide rich information, which is crucial for the development of the lithography process. © 2013 SPIE.
收录类别: Ei
语种: 英语
卷号: 8911
ISSN号: 0277786X
文章类型: 会议论文
页码: 89110J
Citation statistics:
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7474
Appears in Collections:应用光学研究室(二室)_会议论文

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作者单位: 1. Lab of applied optics, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100049, China

Recommended Citation:
Yao, Zhengpeng,Xing, Tingwen. Vector analysis of two-dimensional Ronchi grating in the metrology system[C]. 见:Proceedings of SPIE: International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications. 2013.
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