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题名:
The impact of polarization on metrology performance of the lateral shearing interferometer
作者: Zhengpeng, Yao1,2; Tingwen, Xing1
出版日期: 2013
会议名称: Proceedings of SPIE: Optical Measurement Systems for Industrial Inspection VIII
会议日期: 2013
学科分类: Aberrations - Interferometers - Optical data processing - Optical testing - Optical variables measurement - Phase shift - Polarization - Semiconductor device manufacture - Shearing - Units of measurement - Wavefronts
DOI: 10.1117/12.2020253
中文摘要: The semiconductor industry is aggressively pushed to produce smaller and smaller feature size from their existing base of lithography system, wavefront aberration should be derived by comparing ideal and real wavefronts at the wafer plane of a high resolution lithography system. We propose the IIWS (Integrated Interferometer Wavefront Sensor) system. On the base of traditional lateral shearing interferometer, two-dimensional phase-shifting shearing interferometry and vectorial optical analysis are used in this paper. By adjusting polarization state and polarization distribution, the metrology accuracy of the wavefront aberration of the system, which is significant for the modern semiconductor industry, is greatly increased. © 2013 SPIE.
英文摘要: The semiconductor industry is aggressively pushed to produce smaller and smaller feature size from their existing base of lithography system, wavefront aberration should be derived by comparing ideal and real wavefronts at the wafer plane of a high resolution lithography system. We propose the IIWS (Integrated Interferometer Wavefront Sensor) system. On the base of traditional lateral shearing interferometer, two-dimensional phase-shifting shearing interferometry and vectorial optical analysis are used in this paper. By adjusting polarization state and polarization distribution, the metrology accuracy of the wavefront aberration of the system, which is significant for the modern semiconductor industry, is greatly increased. © 2013 SPIE.
收录类别: Ei
语种: 英语
卷号: 8788
ISSN号: 0277786X
文章类型: 会议论文
页码: 87882F
Citation statistics:
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7473
Appears in Collections:应用光学研究室(二室)_会议论文

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作者单位: 1. Lab of Applied Optics, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100049, China

Recommended Citation:
Zhengpeng, Yao,Tingwen, Xing. The impact of polarization on metrology performance of the lateral shearing interferometer[C]. 见:Proceedings of SPIE: Optical Measurement Systems for Industrial Inspection VIII. 2013.
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