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The impact of polarization on metrology performance of the lateral shearing interferometer
Zhengpeng, Yao1,2; Tingwen, Xing1
Volume8788
Pages87882F
2013
Language英语
ISSN0277786X
DOI10.1117/12.2020253
Indexed ByEi
Subtype会议论文
AbstractThe semiconductor industry is aggressively pushed to produce smaller and smaller feature size from their existing base of lithography system, wavefront aberration should be derived by comparing ideal and real wavefronts at the wafer plane of a high resolution lithography system. We propose the IIWS (Integrated Interferometer Wavefront Sensor) system. On the base of traditional lateral shearing interferometer, two-dimensional phase-shifting shearing interferometry and vectorial optical analysis are used in this paper. By adjusting polarization state and polarization distribution, the metrology accuracy of the wavefront aberration of the system, which is significant for the modern semiconductor industry, is greatly increased. © 2013 SPIE.; The semiconductor industry is aggressively pushed to produce smaller and smaller feature size from their existing base of lithography system, wavefront aberration should be derived by comparing ideal and real wavefronts at the wafer plane of a high resolution lithography system. We propose the IIWS (Integrated Interferometer Wavefront Sensor) system. On the base of traditional lateral shearing interferometer, two-dimensional phase-shifting shearing interferometry and vectorial optical analysis are used in this paper. By adjusting polarization state and polarization distribution, the metrology accuracy of the wavefront aberration of the system, which is significant for the modern semiconductor industry, is greatly increased. © 2013 SPIE.
Conference NameProceedings of SPIE: Optical Measurement Systems for Industrial Inspection VIII
Conference Date2013
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Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7473
Collection应用光学研究室(二室)
Affiliation1. Lab of Applied Optics, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100049, China
Recommended Citation
GB/T 7714
Zhengpeng, Yao,Tingwen, Xing. The impact of polarization on metrology performance of the lateral shearing interferometer[C],2013:87882F.
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