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Simulation of surface deformation for the lithographic object lens by Zernike polynomials
Zhu, Hongwei1; Xing, Tingwen1; Chen, Zexiang2; Zhu, H.
Volume8417
Pages84172C
2012
Language英语
ISSN0277786X
DOI10.1117/12.975794
Indexed ByEi
Subtype会议论文
AbstractSurface deformation is the crucial factor for the imaging performance of the lithographic object lens in the manufacturing process. Simulation of surface deformation can predict the degradation of the wavefront error caused by surface deformation, find the lens which is most sensitive to the surface deformation even in the design phase. We develop a method to simulate the surface deformation by Zernike polynomials in this paper. In fact, the surface deformation generated in the manufacturing process is random. However, it does not mean that they have no rules at all. We analysize the Zernike coefficients distribution of the interferential data, and build a model to simulate the surface deformation. The model can generate random-surface-deformation according to the input RMS/PV bound in the form of INT file type, which can be added to the lens surface directly in the optical design program CODEV. The results show that the surface deformation generated by our model can simulate the interferential data very well. © 2012 SPIE.; Surface deformation is the crucial factor for the imaging performance of the lithographic object lens in the manufacturing process. Simulation of surface deformation can predict the degradation of the wavefront error caused by surface deformation, find the lens which is most sensitive to the surface deformation even in the design phase. We develop a method to simulate the surface deformation by Zernike polynomials in this paper. In fact, the surface deformation generated in the manufacturing process is random. However, it does not mean that they have no rules at all. We analysize the Zernike coefficients distribution of the interferential data, and build a model to simulate the surface deformation. The model can generate random-surface-deformation according to the input RMS/PV bound in the form of INT file type, which can be added to the lens surface directly in the optical design program CODEV. The results show that the surface deformation generated by our model can simulate the interferential data very well. © 2012 SPIE.
Conference NameProceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Conference Date2012
Citation statistics
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7469
Collection应用光学研究室(二室)
Corresponding AuthorZhu, H.
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Electronic Science and Technology of China, China
Recommended Citation
GB/T 7714
Zhu, Hongwei,Xing, Tingwen,Chen, Zexiang,et al. Simulation of surface deformation for the lithographic object lens by Zernike polynomials[C],2012:84172C.
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