题名: | Analysis of the diffraction wave from pinhole in point diffraction interferometer |
作者: | Wang, Ruilin1,2; Zhang, Lixia1,2; Xing, Tingwen1
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出版日期: | 2012
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会议名称: | Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
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会议日期: | 2012
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DOI: | 10.1117/12.970627
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通讯作者: | Wang, R.
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中文摘要: | Pinhole is a key component of the point diffraction interferometer (PDI), therefore the production precision of pinhole will affect the detection accuracy of interferometer seriously. While the incident light wave is visible(λ=632.8nm) and material is Cr, Root mean square(RMS) of far-field diffraction wave-front errors can be counted by analysis of impacts of the hole diameter, ovality and material thickness to diffraction wave. The simulation results show that we can get data of far-field from near-field data which are calculated by FDTD algorithm, and the data of far-field based on vector diffraction theory are different from that based on scalar diffraction theory. Wave-front quality of far-field diffraction wave does not vary with the hole diameter monotonicly. RMS of diffraction wave-front errors will be 10 -7λ while the pinhole diameter is submicron. RMS of diffraction wave-front errors change little with material thickness. The pinhole shows waveguide characteristics while its diameter is less than 200nm. When the incident light polarization directions are different, RMS vary with the pinhole ovality. © 2012 SPIE. |
英文摘要: | Pinhole is a key component of the point diffraction interferometer (PDI), therefore the production precision of pinhole will affect the detection accuracy of interferometer seriously. While the incident light wave is visible(λ=632.8nm) and material is Cr, Root mean square(RMS) of far-field diffraction wave-front errors can be counted by analysis of impacts of the hole diameter, ovality and material thickness to diffraction wave. The simulation results show that we can get data of far-field from near-field data which are calculated by FDTD algorithm, and the data of far-field based on vector diffraction theory are different from that based on scalar diffraction theory. Wave-front quality of far-field diffraction wave does not vary with the hole diameter monotonicly. RMS of diffraction wave-front errors will be 10 -7λ while the pinhole diameter is submicron. RMS of diffraction wave-front errors change little with material thickness. The pinhole shows waveguide characteristics while its diameter is less than 200nm. When the incident light polarization directions are different, RMS vary with the pinhole ovality. © 2012 SPIE. |
收录类别: | Ei
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语种: | 英语
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卷号: | 8417
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ISSN号: | 0277786X
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文章类型: | 会议论文
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页码: | 841721
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Citation statistics: |
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内容类型: | 会议论文
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URI标识: | http://ir.ioe.ac.cn/handle/181551/7466
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Appears in Collections: | 应用光学研究室(二室)_会议论文
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作者单位: | 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 2. Graduate School, Chinese Academy of Sciences, Beijing 100039, China
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Recommended Citation: |
Wang, Ruilin,Zhang, Lixia,Xing, Tingwen. Analysis of the diffraction wave from pinhole in point diffraction interferometer[C]. 见:Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment. 2012.
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