| 题名: | Influence of illumination mode to lithographic imaging |
| 作者: | Liu, Yong1,2; Xing, Tingwen1; Yang, Xiong1
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| 出版日期: | 2012
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| 会议名称: | Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing
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| 会议日期: | 2012
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| DOI: | 10.1117/12.956499
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| 通讯作者: | Liu, Y. (liuyong-2009@qq.com)
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| 中文摘要: | As resolution of lithography becomes narrower, the illumination mode affects imaging more significantly. Correct illumination mode can improve resolution. Element theorems of lithographic imaging have been presented. Polarized imaging and partially coherent imaging have been derived and simulated. The reason why illumination mode affects imaging is analyzed. The image contrast and depth of focus (DOF) under different polarizations and coherent factors are compared. The result shows that imaging performance can be improved by selecting correct mode of illumination. © 2012 SPIE. |
| 英文摘要: | As resolution of lithography becomes narrower, the illumination mode affects imaging more significantly. Correct illumination mode can improve resolution. Element theorems of lithographic imaging have been presented. Polarized imaging and partially coherent imaging have been derived and simulated. The reason why illumination mode affects imaging is analyzed. The image contrast and depth of focus (DOF) under different polarizations and coherent factors are compared. The result shows that imaging performance can be improved by selecting correct mode of illumination. © 2012 SPIE. |
| 收录类别: | Ei
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| 语种: | 英语
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| 卷号: | 8420
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| ISSN号: | 0277786X
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| 文章类型: | 会议论文
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| 页码: | 84201C
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| Citation statistics: |
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| 内容类型: | 会议论文
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| URI标识: | http://ir.ioe.ac.cn/handle/181551/7464
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| Appears in Collections: | 应用光学研究室（二室）_会议论文
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| 2012-2120.pdf（275KB） | 会议论文 | -- | 限制开放 | | View
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作者单位: | 1. Institute of Optics and Electronics, Chinese Academy of Engineering, Chengdu 610209, China
2. Graduate University, Chinese Academy of Sciences, Beijing 100049, China
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| Recommended Citation: | |
Liu, Yong,Xing, Tingwen,Yang, Xiong. Influence of illumination mode to lithographic imaging[C]. 见:Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing. 2012.
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