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Influence of illumination mode to lithographic imaging
Liu, Yong1,2; Xing, Tingwen1; Yang, Xiong1; Liu, Y. (liuyong-2009@qq.com)
Volume8420
Pages84201C
2012
Language英语
ISSN0277786X
DOI10.1117/12.956499
Indexed ByEi
Subtype会议论文
AbstractAs resolution of lithography becomes narrower, the illumination mode affects imaging more significantly. Correct illumination mode can improve resolution. Element theorems of lithographic imaging have been presented. Polarized imaging and partially coherent imaging have been derived and simulated. The reason why illumination mode affects imaging is analyzed. The image contrast and depth of focus (DOF) under different polarizations and coherent factors are compared. The result shows that imaging performance can be improved by selecting correct mode of illumination. © 2012 SPIE.; As resolution of lithography becomes narrower, the illumination mode affects imaging more significantly. Correct illumination mode can improve resolution. Element theorems of lithographic imaging have been presented. Polarized imaging and partially coherent imaging have been derived and simulated. The reason why illumination mode affects imaging is analyzed. The image contrast and depth of focus (DOF) under different polarizations and coherent factors are compared. The result shows that imaging performance can be improved by selecting correct mode of illumination. © 2012 SPIE.
Conference NameProceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing
Conference Date2012
Citation statistics
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7464
Collection应用光学研究室(二室)
Corresponding AuthorLiu, Y. (liuyong-2009@qq.com)
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Engineering, Chengdu 610209, China
2. Graduate University, Chinese Academy of Sciences, Beijing 100049, China
Recommended Citation
GB/T 7714
Liu, Yong,Xing, Tingwen,Yang, Xiong,et al. Influence of illumination mode to lithographic imaging[C],2012:84201C.
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