| Influence of illumination mode to lithographic imaging | |
| Liu, Yong1,2; Xing, Tingwen1; Yang, Xiong1; Liu, Y. (liuyong-2009@qq.com) | |
| Volume | 8420 |
| Pages | 84201C |
| 2012 | |
| Language | 英语 |
| ISSN | 0277786X |
| DOI | 10.1117/12.956499 |
| Indexed By | Ei |
| Subtype | 会议论文 |
| Abstract | As resolution of lithography becomes narrower, the illumination mode affects imaging more significantly. Correct illumination mode can improve resolution. Element theorems of lithographic imaging have been presented. Polarized imaging and partially coherent imaging have been derived and simulated. The reason why illumination mode affects imaging is analyzed. The image contrast and depth of focus (DOF) under different polarizations and coherent factors are compared. The result shows that imaging performance can be improved by selecting correct mode of illumination. © 2012 SPIE.; As resolution of lithography becomes narrower, the illumination mode affects imaging more significantly. Correct illumination mode can improve resolution. Element theorems of lithographic imaging have been presented. Polarized imaging and partially coherent imaging have been derived and simulated. The reason why illumination mode affects imaging is analyzed. The image contrast and depth of focus (DOF) under different polarizations and coherent factors are compared. The result shows that imaging performance can be improved by selecting correct mode of illumination. © 2012 SPIE. |
| Conference Name | Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing |
| Conference Date | 2012 |
| Citation statistics | |
| Document Type | 会议论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7464 |
| Collection | 应用光学研究室（二室） |
| Corresponding Author | Liu, Y. (liuyong-2009@qq.com) |
| Affiliation | 1. Institute of Optics and Electronics, Chinese Academy of Engineering, Chengdu 610209, China 2. Graduate University, Chinese Academy of Sciences, Beijing 100049, China |
| Recommended Citation GB/T 7714 | Liu, Yong,Xing, Tingwen,Yang, Xiong,et al. Influence of illumination mode to lithographic imaging[C],2012:84201C. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2012-2120.pdf（275KB） | 会议论文 | 开放获取 | CC BY-NC-SA | Application Full Text | ||
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