| 题名: | Research on method of measuring pattern distortion of circularly symmetrical phase etched CGHs and eliminating the effect of pattern distortion |
| 作者: | Deng, Chao1; Feng, Jie1,2; Xing, Tingwen1
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| 出版日期: | 2012
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| 会议名称: | Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems
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| 会议日期: | 2012
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| DOI: | 10.1117/12.975793
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| 通讯作者: | Deng, C.
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| 中文摘要: | Circularly symmetrical phase etched computer-generated hologram (CGH) are widely used to test aspheric surface. In CGH fabrication errors, pattern distortion errors not only strongly affect the test precision but also can't be facilely eliminated. In order to improve the test accuracy of system, a moire´ fringes method is described for testing circularly symmetrical pattern distortion. Compared with the conventional method of using microdensitometer, the new method is more accurate and quicker for measuring the pattern distortion. Then, based on the accurate measurement of CGH pattern distortion, the impact on test accuracy that pattern distortion brings is eliminated with synthetic wavefront error map. Finally, through computer simulating, it is proved that the new method can effectively reduce the impact on test accuracy that pattern distortion brings. © 2012 SPIE. |
| 英文摘要: | Circularly symmetrical phase etched computer-generated hologram (CGH) are widely used to test aspheric surface. In CGH fabrication errors, pattern distortion errors not only strongly affect the test precision but also can't be facilely eliminated. In order to improve the test accuracy of system, a moire´ fringes method is described for testing circularly symmetrical pattern distortion. Compared with the conventional method of using microdensitometer, the new method is more accurate and quicker for measuring the pattern distortion. Then, based on the accurate measurement of CGH pattern distortion, the impact on test accuracy that pattern distortion brings is eliminated with synthetic wavefront error map. Finally, through computer simulating, it is proved that the new method can effectively reduce the impact on test accuracy that pattern distortion brings. © 2012 SPIE. |
| 收录类别: | Ei
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| 语种: | 英语
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| 卷号: | 8418
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| ISSN号: | 0277786X
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| 文章类型: | 会议论文
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| 页码: | 84180V
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| Citation statistics: |
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| 内容类型: | 会议论文
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| URI标识: | http://ir.ioe.ac.cn/handle/181551/7459
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| Appears in Collections: | 应用光学研究室（二室）_会议论文
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| 2012-2085.pdf（299KB） | 会议论文 | -- | 限制开放 | | View
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作者单位: | 1. Lab of Applied Optics, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. Graduate School of the Chinese Academy of Sciences, Beijing 100039, China
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| Recommended Citation: | |
Deng, Chao,Feng, Jie,Xing, Tingwen. Research on method of measuring pattern distortion of circularly symmetrical phase etched CGHs and eliminating the effect of pattern distortion[C]. 见:Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems. 2012.
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