中国科学院光电技术研究所机构知识库
Advanced  
IOE OpenIR  > 应用光学研究室(二室)  > 会议论文
题名:
The machining precision analysis of the ion beam figuring system
作者: Yun Li; Tingwen Xing; Xin Jia; Jiajun Xu
出版日期: 2011
会议名称: Proc. of SPIE
会议日期: 2011
通讯作者: Yun Li
中文摘要: The ion beam figuring machine is a kind of high precise machining facility for optical components. In the field of optical fabrication, the machining precision is always an important capability for the machining facility. The basic structures and working principles of the ion beam figuring system are primarily introduced. And then, various errors which may reduce the final machining precision have been analyzed through theories analysis and computer simulations. The errors include: the approximate error from the discrete compute model to the actual continuum machining model; the system error and random error of the high precision 3-axis motion stage which drives the ion source; the system error and random error of the material removal rate of the ion source. A set of potential error parameters has been given for each part of the ion beam figuring system. By using this set of parameters, it is possible to reach the nano-level machining. The precision analysis in the paper will be a reference for ion beam figuring.
英文摘要: The ion beam figuring machine is a kind of high precise machining facility for optical components. In the field of optical fabrication, the machining precision is always an important capability for the machining facility. The basic structures and working principles of the ion beam figuring system are primarily introduced. And then, various errors which may reduce the final machining precision have been analyzed through theories analysis and computer simulations. The errors include: the approximate error from the discrete compute model to the actual continuum machining model; the system error and random error of the high precision 3-axis motion stage which drives the ion source; the system error and random error of the material removal rate of the ion source. A set of potential error parameters has been given for each part of the ion beam figuring system. By using this set of parameters, it is possible to reach the nano-level machining. The precision analysis in the paper will be a reference for ion beam figuring.
收录类别: Ei
语种: 英语
卷号: 8321
文章类型: 会议论文
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7453
Appears in Collections:应用光学研究室(二室)_会议论文

Files in This Item:
File Name/ File Size Content Type Version Access License
2011-02-004.pdf(737KB)会议论文--限制开放View 联系获取全文

作者单位: 中国科学院光电技术研究所

Recommended Citation:
Yun Li,Tingwen Xing,Xin Jia,et al. The machining precision analysis of the ion beam figuring system[C]. 见:Proc. of SPIE. 2011.
Service
Recommend this item
Sava as my favorate item
Show this item's statistics
Export Endnote File
Google Scholar
Similar articles in Google Scholar
[Yun Li]'s Articles
[Tingwen Xing]'s Articles
[Xin Jia]'s Articles
CSDL cross search
Similar articles in CSDL Cross Search
[Yun Li]‘s Articles
[Tingwen Xing]‘s Articles
[Xin Jia]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
Add to CiteULike Add to Connotea Add to Del.icio.us Add to Digg Add to Reddit
文件名: 2011-02-004.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Copyright © 2007-2016  中国科学院光电技术研究所 - Feedback
Powered by CSpace