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A 3D numerical study of pinhole diffraction in Visible-light point diffraction interferometry
Tingwen Xing; Jiajun Xun; Fuchao Xu
Volume8321
Pages83211O-1-
2011
Language英语
Indexed ByEi
Subtype会议论文
AbstractThe projection objectives,used in modern projection lithography, such as deep-ultraviolet lithography (DUVL), or extreme-ultraviolet lithography (EUVL), desire very high-quality optics. It has placed stringent requirements on the accuracy of the interferometers used for optical metrology. Point diffraction interferometry, which generates a spherical reference wave front by pinhole diffraction, has been developed to meet this need. In order to estimate the measurement accuracy, several scalar wave diffraction methods have been used when the diameter of the pinhole is much larger than the wavelength. However, while the diameter keeps decreasing, ultimately to the order of the wavelength, it is obviously not appropriate to calculate in the same way. So, a three-dimensional (3-D) electromagnetic field simulation, based on Finite Element Method (FEM), is set up to study the propagation of the visible- light, 632.8 nm wavelength, through sub- 1000nm diameter pinholes in a chromium membrane. Deviations have been calculated to predict the accuracy, between perfect sphere and the wave front, diffracted by a series of pinholes with different diameters.; The projection objectives,used in modern projection lithography, such as deep-ultraviolet lithography (DUVL), or extreme-ultraviolet lithography (EUVL), desire very high-quality optics. It has placed stringent requirements on the accuracy of the interferometers used for optical metrology. Point diffraction interferometry, which generates a spherical reference wave front by pinhole diffraction, has been developed to meet this need. In order to estimate the measurement accuracy, several scalar wave diffraction methods have been used when the diameter of the pinhole is much larger than the wavelength. However, while the diameter keeps decreasing, ultimately to the order of the wavelength, it is obviously not appropriate to calculate in the same way. So, a three-dimensional (3-D) electromagnetic field simulation, based on Finite Element Method (FEM), is set up to study the propagation of the visible- light, 632.8 nm wavelength, through sub- 1000nm diameter pinholes in a chromium membrane. Deviations have been calculated to predict the accuracy, between perfect sphere and the wave front, diffracted by a series of pinholes with different diameters.
Conference NameProc. of SPIE
Conference Date2011
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7450
Collection应用光学研究室(二室)
Corresponding AuthorTingwen Xing
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Tingwen Xing,Jiajun Xun,Fuchao Xu. A 3D numerical study of pinhole diffraction in Visible-light point diffraction interferometry[C],2011:83211O-1-.
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