中国科学院光电技术研究所机构知识库
Advanced  
IOE OpenIR  > 应用光学研究室(二室)  > 会议论文
题名:
A 3D numerical study of pinhole diffraction in Visible-light point diffraction interferometry
作者: Tingwen Xing; Jiajun Xun; Fuchao Xu
出版日期: 2011
会议名称: Proc. of SPIE
会议日期: 2011
通讯作者: Tingwen Xing
中文摘要: The projection objectives,used in modern projection lithography, such as deep-ultraviolet lithography (DUVL), or extreme-ultraviolet lithography (EUVL), desire very high-quality optics. It has placed stringent requirements on the accuracy of the interferometers used for optical metrology. Point diffraction interferometry, which generates a spherical reference wave front by pinhole diffraction, has been developed to meet this need. In order to estimate the measurement accuracy, several scalar wave diffraction methods have been used when the diameter of the pinhole is much larger than the wavelength. However, while the diameter keeps decreasing, ultimately to the order of the wavelength, it is obviously not appropriate to calculate in the same way. So, a three-dimensional (3-D) electromagnetic field simulation, based on Finite Element Method (FEM), is set up to study the propagation of the visible- light, 632.8 nm wavelength, through sub- 1000nm diameter pinholes in a chromium membrane. Deviations have been calculated to predict the accuracy, between perfect sphere and the wave front, diffracted by a series of pinholes with different diameters.
英文摘要: The projection objectives,used in modern projection lithography, such as deep-ultraviolet lithography (DUVL), or extreme-ultraviolet lithography (EUVL), desire very high-quality optics. It has placed stringent requirements on the accuracy of the interferometers used for optical metrology. Point diffraction interferometry, which generates a spherical reference wave front by pinhole diffraction, has been developed to meet this need. In order to estimate the measurement accuracy, several scalar wave diffraction methods have been used when the diameter of the pinhole is much larger than the wavelength. However, while the diameter keeps decreasing, ultimately to the order of the wavelength, it is obviously not appropriate to calculate in the same way. So, a three-dimensional (3-D) electromagnetic field simulation, based on Finite Element Method (FEM), is set up to study the propagation of the visible- light, 632.8 nm wavelength, through sub- 1000nm diameter pinholes in a chromium membrane. Deviations have been calculated to predict the accuracy, between perfect sphere and the wave front, diffracted by a series of pinholes with different diameters.
收录类别: Ei
语种: 英语
卷号: 8321
文章类型: 会议论文
页码: 83211O-1-
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7450
Appears in Collections:应用光学研究室(二室)_会议论文

Files in This Item:
File Name/ File Size Content Type Version Access License
2011-02-001.pdf(1328KB)会议论文--限制开放View 联系获取全文

作者单位: 中国科学院光电技术研究所

Recommended Citation:
Tingwen Xing,Jiajun Xun,Fuchao Xu. A 3D numerical study of pinhole diffraction in Visible-light point diffraction interferometry[C]. 见:Proc. of SPIE. 2011.
Service
Recommend this item
Sava as my favorate item
Show this item's statistics
Export Endnote File
Google Scholar
Similar articles in Google Scholar
[Tingwen Xing]'s Articles
[Jiajun Xun]'s Articles
[Fuchao Xu]'s Articles
CSDL cross search
Similar articles in CSDL Cross Search
[Tingwen Xing]‘s Articles
[Jiajun Xun]‘s Articles
[Fuchao Xu]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
Add to CiteULike Add to Connotea Add to Del.icio.us Add to Digg Add to Reddit
文件名: 2011-02-001.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Copyright © 2007-2016  中国科学院光电技术研究所 - Feedback
Powered by CSpace