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题名:
Study on the homogeneity of fused silica blanks for lithography objective
作者: Liao Zhiyuan; Xing Tingwen; Zhu Hongwei
出版日期: 2010
会议名称: Proceedings of the SPIE - The International Society for Optical Engineering
会议日期: 2010
通讯作者: Liao Zhiyuan
中文摘要: With the development of the lithography technologies to create smaller features with higher NA, lower k1 values and shorter wavelengths, homogeneity specifications for fused silica blanks continue to tighten. Fused silica and calcium fluoride are the only material for the DUV lithography objective. One of the difficult problems for the lithography is how to deal with the capability of the optical material. The inhomogeneity will influence the quality of lithography objective and is an important specification. In order to obtain relative homogeneity specifications for each fused silica blanks of the overall lithography objective, we can iterate the lenses of the lithography objective in turn, one piece lens at a time, which the iterated one has the same spherical gradient index, we can obtain the RMS wavefront errors of all fields after every iterativeness. When all iterativeness is implemented, we can find the difference between design and results of iterativeness. The degradation of the RMS wavefront errors is larger; the lens iterated is more sensitive for index. According to the RMS wavefront errors of iterative results, we can make a conclusion that homogeneity specification for fused silica blanks of the lithography lens is extraordinarily different, not all lens need the same homogeneity specifications. It is known, higher homogeneity, more expensive. So we can choose the different homogeneity grade fused silica blanks.
英文摘要: With the development of the lithography technologies to create smaller features with higher NA, lower k1 values and shorter wavelengths, homogeneity specifications for fused silica blanks continue to tighten. Fused silica and calcium fluoride are the only material for the DUV lithography objective. One of the difficult problems for the lithography is how to deal with the capability of the optical material. The inhomogeneity will influence the quality of lithography objective and is an important specification. In order to obtain relative homogeneity specifications for each fused silica blanks of the overall lithography objective, we can iterate the lenses of the lithography objective in turn, one piece lens at a time, which the iterated one has the same spherical gradient index, we can obtain the RMS wavefront errors of all fields after every iterativeness. When all iterativeness is implemented, we can find the difference between design and results of iterativeness. The degradation of the RMS wavefront errors is larger; the lens iterated is more sensitive for index. According to the RMS wavefront errors of iterative results, we can make a conclusion that homogeneity specification for fused silica blanks of the lithography lens is extraordinarily different, not all lens need the same homogeneity specifications. It is known, higher homogeneity, more expensive. So we can choose the different homogeneity grade fused silica blanks.
收录类别: Ei ; ISTP
语种: 英语
卷号: 7656
文章类型: 会议论文
页码: 76564F (6 pp.)
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7449
Appears in Collections:应用光学研究室(二室)_会议论文

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作者单位: 中国科学院光电技术研究所

Recommended Citation:
Liao Zhiyuan,Xing Tingwen,Zhu Hongwei. Study on the homogeneity of fused silica blanks for lithography objective[C]. 见:Proceedings of the SPIE - The International Society for Optical Engineering. 2010.
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