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基于叠栅条纹相位解析的纳米检焦方法
冯金花; 胡松; 李艳丽; 何渝
Source Publication光学学报
Volume35Issue:2Pages:202-207
2015
Language中文
DOI10.3788/AOS201535.0212005
Indexed ByEi
Subtype期刊论文
Abstract随着光刻机分辨力节点的提高,纳米级的高精度检焦技术变得愈发重要。针对投影光刻的特点,介绍了一种基于叠栅条纹相位解析的纳米检焦方法。此方法基于三角法测量原理,通过光弹调制器和横向剪切板的光学调制、平行平板的相位调整,硅片位移的变化会引起调制光强发生正余弦变化。根据光强的正余弦变化,求出焦面位移量。经实验与数据分析,该方法具有纳米级的检焦精度,且具有实时性强、非接触等特点,能满足100 nm投影光刻中焦面检测的需要。
Keyword测量 纳米检焦 相位解析 光弹调制 横向剪切板
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7342
Collection微电子装备总体研究室(四室)
Corresponding Author冯金花
Affiliation中国科学院光电技术研究所微细加工光学技术国家重点实验室
Recommended Citation
GB/T 7714
冯金花,胡松,李艳丽,等. 基于叠栅条纹相位解析的纳米检焦方法[J]. 光学学报,2015,35(2):202-207.
APA 冯金花,胡松,李艳丽,&何渝.(2015).基于叠栅条纹相位解析的纳米检焦方法.光学学报,35(2),202-207.
MLA 冯金花,et al."基于叠栅条纹相位解析的纳米检焦方法".光学学报 35.2(2015):202-207.
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