| Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene | |
| Zhang, Man; Cao, Axiu; Shi, Lifang; Deng, Qiling; Hu, Song; Hu, Song (husong@ioe.ac.cn) | |
| Source Publication | Optik
 |
| Volume | 126Issue:23Pages:4123-4126 |
| 2015 | |
| Language | 英语 |
| ISSN | 0030-4026 |
| DOI | 10.1016/j.ijleo.2015.08.030 |
| Indexed By | SCI ; Ei |
| WOS ID | WOS:000365373400125 |
| Subtype | 期刊论文 |
| Abstract | Soft-nanoimprint lithography is a high-throughput and cost-effective lithographic technique with high resolution and low pressure, of which the crucial component is the mold. We demonstrate a method to fabricate hybrid soft-nanoimprint mold in benign ambient based on UV-curable thiol-ene polymer. Because of the special photopolymerization mechanism via "click chemistry", thiol-ene can be cured completely at ambient conditions without inhabitation from oxygen or moisture. The mold can be fabricated in air not in vacuum or a nitrogen atmosphere to simplify the fabrication process and lower the cost. Based on this method, we fabricated a soft-nanoimprint hybrid mold in benign ambient, which is composed of rigid thiol-ene features with sub-60 nm resolution on an elastic poly(dimethylsiloxane) (PDMS) substrate. © 2015 Elsevier GmbH. All rights reserved.; Soft-nanoimprint lithography is a high-throughput and cost-effective lithographic technique with high resolution and low pressure, of which the crucial component is the mold. We demonstrate a method to fabricate hybrid soft-nanoimprint mold in benign ambient based on UV-curable thiol-ene polymer. Because of the special photopolymerization mechanism via "click chemistry", thiol-ene can be cured completely at ambient conditions without inhabitation from oxygen or moisture. The mold can be fabricated in air not in vacuum or a nitrogen atmosphere to simplify the fabrication process and lower the cost. Based on this method, we fabricated a soft-nanoimprint hybrid mold in benign ambient, which is composed of rigid thiol-ene features with sub-60 nm resolution on an elastic poly(dimethylsiloxane) (PDMS) substrate. © 2015 Elsevier GmbH. All rights reserved. |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7334 |
| Collection | 微电子装备总体研究室（四室） |
| Corresponding Author | Hu, Song (husong@ioe.ac.cn) |
| Affiliation | Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China |
| Recommended Citation GB/T 7714 | Zhang, Man,Cao, Axiu,Shi, Lifang,et al. Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene[J]. Optik,2015,126(23):4123-4126. |
| APA | Zhang, Man,Cao, Axiu,Shi, Lifang,Deng, Qiling,Hu, Song,&Hu, Song .(2015).Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene.Optik,126(23),4123-4126. |
| MLA | Zhang, Man,et al."Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene".Optik 126.23(2015):4123-4126. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2015-2127.pdf（862KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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