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Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene
Zhang, Man; Cao, Axiu; Shi, Lifang; Deng, Qiling; Hu, Song; Hu, Song (husong@ioe.ac.cn)
Source PublicationOptik
Volume126Issue:23Pages:4123-4126
2015
Language英语
ISSN0030-4026
DOI10.1016/j.ijleo.2015.08.030
Indexed BySCI ; Ei
WOS IDWOS:000365373400125
Subtype期刊论文
AbstractSoft-nanoimprint lithography is a high-throughput and cost-effective lithographic technique with high resolution and low pressure, of which the crucial component is the mold. We demonstrate a method to fabricate hybrid soft-nanoimprint mold in benign ambient based on UV-curable thiol-ene polymer. Because of the special photopolymerization mechanism via "click chemistry", thiol-ene can be cured completely at ambient conditions without inhabitation from oxygen or moisture. The mold can be fabricated in air not in vacuum or a nitrogen atmosphere to simplify the fabrication process and lower the cost. Based on this method, we fabricated a soft-nanoimprint hybrid mold in benign ambient, which is composed of rigid thiol-ene features with sub-60 nm resolution on an elastic poly(dimethylsiloxane) (PDMS) substrate. © 2015 Elsevier GmbH. All rights reserved.; Soft-nanoimprint lithography is a high-throughput and cost-effective lithographic technique with high resolution and low pressure, of which the crucial component is the mold. We demonstrate a method to fabricate hybrid soft-nanoimprint mold in benign ambient based on UV-curable thiol-ene polymer. Because of the special photopolymerization mechanism via "click chemistry", thiol-ene can be cured completely at ambient conditions without inhabitation from oxygen or moisture. The mold can be fabricated in air not in vacuum or a nitrogen atmosphere to simplify the fabrication process and lower the cost. Based on this method, we fabricated a soft-nanoimprint hybrid mold in benign ambient, which is composed of rigid thiol-ene features with sub-60 nm resolution on an elastic poly(dimethylsiloxane) (PDMS) substrate. © 2015 Elsevier GmbH. All rights reserved.
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Cited Times:3[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7334
Collection微电子装备总体研究室(四室)
Corresponding AuthorHu, Song (husong@ioe.ac.cn)
Affiliation Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
Recommended Citation
GB/T 7714
Zhang, Man,Cao, Axiu,Shi, Lifang,et al. Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene[J]. Optik,2015,126(23):4123-4126.
APA Zhang, Man,Cao, Axiu,Shi, Lifang,Deng, Qiling,Hu, Song,&Hu, Song .(2015).Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene.Optik,126(23),4123-4126.
MLA Zhang, Man,et al."Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene".Optik 126.23(2015):4123-4126.
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