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Moiré fringe alignment using composite circular-line gratings for proximity lithography
Xu, Feng1,2; Zhou, Shaolin3; Hu, Song4; Jiang, Wenbo5; Luo, Liang1,2; Chu, Hongyu1,2
Source PublicationOptics Express
Volume23Issue:16Pages:20905-20915
2015
Language英语
ISSN1094-4086
DOI10.1364/OE.23.020905
Indexed BySCI ; Ei
WOS IDWOS:000361036400067
Subtype期刊论文
AbstractWe explore the feasibility of a controllable and easy-toimplement moiré-based composite circular-line gratings imaging scheme for optical alignment in proximity lithography. One circular grating and four line gratings located on both the mask alignment mark and wafer alignment mark are used to realize the coarse alignment and fine alignment respectively. The fundamental derivation of coarse alignment employing circular gratings and fine alignment employing line gratings are given. Any displacement of misalignment that occurs at the surface of two overlapped gratings can be sensed and determined through subsequent fringe phase analysis without the influence of the gap between the mask and the wafer or wafer process. The design and manufacture process of the alignment marks are presented. The experimental results validate and demonstrate the feasibility of the proposed approach. © 2015 Optical Society of America.; We explore the feasibility of a controllable and easy-toimplement moiré-based composite circular-line gratings imaging scheme for optical alignment in proximity lithography. One circular grating and four line gratings located on both the mask alignment mark and wafer alignment mark are used to realize the coarse alignment and fine alignment respectively. The fundamental derivation of coarse alignment employing circular gratings and fine alignment employing line gratings are given. Any displacement of misalignment that occurs at the surface of two overlapped gratings can be sensed and determined through subsequent fringe phase analysis without the influence of the gap between the mask and the wafer or wafer process. The design and manufacture process of the alignment marks are presented. The experimental results validate and demonstrate the feasibility of the proposed approach. © 2015 Optical Society of America.
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Cited Times:6[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7330
Collection微电子装备总体研究室(四室)
Affiliation1. Faculty Information and Engineering, Southwest University of Science and Technology Mianyang, Sichuan, China
2. Robot Technology Used for Special Environment Key Laboratory of Sichuan Province, Mianyang, Sichuan, China
3. School of Electronics and Information, South China University of Technology, Guangzhou, China
4. Institute Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
5. School of Electronics Engineering and Electronic Information, Xihua University, Chengdu, China
Recommended Citation
GB/T 7714
Xu, Feng,Zhou, Shaolin,Hu, Song,et al. Moiré fringe alignment using composite circular-line gratings for proximity lithography[J]. Optics Express,2015,23(16):20905-20915.
APA Xu, Feng,Zhou, Shaolin,Hu, Song,Jiang, Wenbo,Luo, Liang,&Chu, Hongyu.(2015).Moiré fringe alignment using composite circular-line gratings for proximity lithography.Optics Express,23(16),20905-20915.
MLA Xu, Feng,et al."Moiré fringe alignment using composite circular-line gratings for proximity lithography".Optics Express 23.16(2015):20905-20915.
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