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题名:
Moiré fringe alignment using composite circular-line gratings for proximity lithography
作者: Xu, Feng1,2; Zhou, Shaolin3; Hu, Song4; Jiang, Wenbo5; Luo, Liang1,2; Chu, Hongyu1,2
刊名: Optics Express
出版日期: 2015
卷号: 23, 期号:16, 页码:20905-20915
学科分类: Optical constants - Optics
DOI: 10.1364/OE.23.020905
文章类型: 期刊论文
中文摘要: We explore the feasibility of a controllable and easy-toimplement moiré-based composite circular-line gratings imaging scheme for optical alignment in proximity lithography. One circular grating and four line gratings located on both the mask alignment mark and wafer alignment mark are used to realize the coarse alignment and fine alignment respectively. The fundamental derivation of coarse alignment employing circular gratings and fine alignment employing line gratings are given. Any displacement of misalignment that occurs at the surface of two overlapped gratings can be sensed and determined through subsequent fringe phase analysis without the influence of the gap between the mask and the wafer or wafer process. The design and manufacture process of the alignment marks are presented. The experimental results validate and demonstrate the feasibility of the proposed approach. © 2015 Optical Society of America.
英文摘要: We explore the feasibility of a controllable and easy-toimplement moiré-based composite circular-line gratings imaging scheme for optical alignment in proximity lithography. One circular grating and four line gratings located on both the mask alignment mark and wafer alignment mark are used to realize the coarse alignment and fine alignment respectively. The fundamental derivation of coarse alignment employing circular gratings and fine alignment employing line gratings are given. Any displacement of misalignment that occurs at the surface of two overlapped gratings can be sensed and determined through subsequent fringe phase analysis without the influence of the gap between the mask and the wafer or wafer process. The design and manufacture process of the alignment marks are presented. The experimental results validate and demonstrate the feasibility of the proposed approach. © 2015 Optical Society of America.
收录类别: SCI ; Ei
项目资助者: National Natural Science Foundation of China [61307063, 61405060] ; Doctor Foundation of Southwest University of Science and Technology of China [12zx7127] ; Open Foundation of Robot Technology Used for Special Environment Key Laboratory of Sichuan Province
语种: 英语
WOS记录号: WOS:000361036400067
ISSN号: 1094-4086
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7330
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. Faculty Information and Engineering, Southwest University of Science and Technology Mianyang, Sichuan, China
2. Robot Technology Used for Special Environment Key Laboratory of Sichuan Province, Mianyang, Sichuan, China
3. School of Electronics and Information, South China University of Technology, Guangzhou, China
4. Institute Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
5. School of Electronics Engineering and Electronic Information, Xihua University, Chengdu, China

Recommended Citation:
Xu, Feng,Zhou, Shaolin,Hu, Song,et al. Moiré fringe alignment using composite circular-line gratings for proximity lithography[J]. Optics Express,2015,23(16):20905-20915.
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