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题名:
Gap-optimized Moiré phase imaging alignment for proximity lithography
作者: Zhu, Jiangping1; Hu, Song2; You, Zhisheng1; Su, Xianyu3
刊名: Optical Engineering
出版日期: 2015
卷号: 54, 期号:1, 页码:17105
学科分类: Lithography - Optimization
DOI: 10.1117/1.OE.54.1.017105
通讯作者: You, Zhisheng
文章类型: 期刊论文
中文摘要: The proposed four-quadrant Moiré alignment scheme to detect the misalignment between mask and wafer for proximity lithography can achieve the alignment accuracy with nanometer level. When implementing the scheme, however, the distribution of Moiré fringes associated with the mask-wafer gap indeed goes against the alignment, making the gap optimization highly urgent. The optimization model is established, and numerical simulation as well as experimental verification is also provided. Furthermore, an alignment accuracy of ∼3 nm with the illumination wavelength of 632.8 nm is experimentally attained. Simultaneously, the design mechanism of alignment marks for improving the availability of the alignment scheme is discussed. © Society of Photo-Optical Instrumentation Engineers.
英文摘要: The proposed four-quadrant Moiré alignment scheme to detect the misalignment between mask and wafer for proximity lithography can achieve the alignment accuracy with nanometer level. When implementing the scheme, however, the distribution of Moiré fringes associated with the mask-wafer gap indeed goes against the alignment, making the gap optimization highly urgent. The optimization model is established, and numerical simulation as well as experimental verification is also provided. Furthermore, an alignment accuracy of ∼3 nm with the illumination wavelength of 632.8 nm is experimentally attained. Simultaneously, the design mechanism of alignment marks for improving the availability of the alignment scheme is discussed. © Society of Photo-Optical Instrumentation Engineers.
收录类别: SCI ; Ei
项目资助者: National Major Instrument Special Fund [2013YQ490879-01] ; National Natural Science Foundation of China [61177010]
语种: 英语
WOS记录号: WOS:000349442900047
ISSN号: 0091-3286
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7328
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. Sichuan University, School of Computer Science and Technology, Chengdu, China
2. Chinese Academy of Sciences, State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chengdu, China
3. Sichuan University, School of Electronics and Information, Chengdu, China

Recommended Citation:
Zhu, Jiangping,Hu, Song,You, Zhisheng,et al. Gap-optimized Moiré phase imaging alignment for proximity lithography[J]. Optical Engineering,2015,54(1):17105.
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