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Spectrum-Integral Talbot Effect for UV Photolithography with Extended DOF
Liu, Junbo1,2; Zhou, Shaolin3; Hu, Song4; Gao, Hongtao4; He, Yu4; Cheng, Yiguang1,2
Source PublicationIEEE Photonics Technology Letters
Volume27Issue:20Pages:2201-2204
2015
Language英语
ISSN1041-1135
DOI10.1109/LPT.2015.2456184
Indexed BySCI ; Ei
WOS IDWOS:000361685200024
Subtype期刊论文
AbstractA route of spectrum-integral Talbot lithography (SITL) with extended depth-of-focus (DOF) for microfabrication of periodic structures was explored under broadband incoherent illumination in this letter. The transmitted diffraction fields by different spectral components integrate together to generate the successive periodicity since certain distance along the direction of propagation. The mechanism of DOF extension was derived and numerically elucidated using the spectrum of a practical ultraviolet source. Experiments of proximity lithography in term of the numeric results were performed to record the intensity distributions within the DOF area. Finally, the results reveal the validity of SITL and its potentials in high-fidelity lithography of periodic micropatterns with almost unlimited DOF and thus enhanced resolution. © 2015 IEEE.; A route of spectrum-integral Talbot lithography (SITL) with extended depth-of-focus (DOF) for microfabrication of periodic structures was explored under broadband incoherent illumination in this letter. The transmitted diffraction fields by different spectral components integrate together to generate the successive periodicity since certain distance along the direction of propagation. The mechanism of DOF extension was derived and numerically elucidated using the spectrum of a practical ultraviolet source. Experiments of proximity lithography in term of the numeric results were performed to record the intensity distributions within the DOF area. Finally, the results reveal the validity of SITL and its potentials in high-fidelity lithography of periodic micropatterns with almost unlimited DOF and thus enhanced resolution. © 2015 IEEE.
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Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7326
Collection微电子装备总体研究室(四室)
Affiliation1. University of Chinese, Academy of Sciences, Beijing, China
2. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
3. School of Electronic and Information Engineering, South China University of Technology, Guangzhou, China
4. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
Recommended Citation
GB/T 7714
Liu, Junbo,Zhou, Shaolin,Hu, Song,et al. Spectrum-Integral Talbot Effect for UV Photolithography with Extended DOF[J]. IEEE Photonics Technology Letters,2015,27(20):2201-2204.
APA Liu, Junbo,Zhou, Shaolin,Hu, Song,Gao, Hongtao,He, Yu,&Cheng, Yiguang.(2015).Spectrum-Integral Talbot Effect for UV Photolithography with Extended DOF.IEEE Photonics Technology Letters,27(20),2201-2204.
MLA Liu, Junbo,et al."Spectrum-Integral Talbot Effect for UV Photolithography with Extended DOF".IEEE Photonics Technology Letters 27.20(2015):2201-2204.
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