National Natural Science Foundation of China [61204114, 6274108, 61376110, 61405060]
; Science and Technology Planning Project of Guangdong Province [2014A010104005]
; Fundamental Research Funds for the Central Universities of South China University of Technology [2015 ZZ030]
; State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu, China [skelpme2015-5-28]
1. University of Chinese, Academy of Sciences, Beijing, China 2. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China 3. School of Electronic and Information Engineering, South China University of Technology, Guangzhou, China 4. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
Recommended Citation:
Liu, Junbo,Zhou, Shaolin,Hu, Song,et al. Spectrum-Integral Talbot Effect for UV Photolithography with Extended DOF[J]. IEEE Photonics Technology Letters,2015,27(20):2201-2204.
