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题名:
Adjustment strategy for inclination moiré fringes in lithography by spatial frequency decomposition
作者: Zhu, Jiangping1; Hu, Song2; Su, Xianyu1; You, Zhisheng1
刊名: IEEE Photonics Technology Letters
出版日期: 2015
卷号: 27, 期号:4
学科分类: Alignment
DOI: 10.1109/LPT.2014.2370072
通讯作者: You, Zhisheng
文章类型: 期刊论文
中文摘要: The recently proposed four-quadrant grating Moiré fringe alignment scheme was demonstrated to have the potential of achieving nanometer alignment for proximity lithography. The mask-wafer misalignment was accurately detected by comparing the phase between two sets of Moiré fringes averaged along with the fringe direction, making the inclination adjustment of Moiré fringes highly imperative. The inclination closely related with the included angle between mask (alignment mark) and wafer (alignment mark) largely influences the alignment accuracy. To solve this issue, we present an adjustment strategy based on the spatial frequency decomposition of two sets of differential Moiré fringes, by which the included angle can be accurately adjusted with an accuracy of better than 10-5rad. The subsequent discussion indicates that the position of imaging system can be responsible for the inclination but actually it would not affect the mask-wafer alignment, so that our proposed adjustment strategy can be operated simply and feasibly, which is validated by the theoretical analysis and experimental results. © 2014 IEEE.
英文摘要: The recently proposed four-quadrant grating Moiré fringe alignment scheme was demonstrated to have the potential of achieving nanometer alignment for proximity lithography. The mask-wafer misalignment was accurately detected by comparing the phase between two sets of Moiré fringes averaged along with the fringe direction, making the inclination adjustment of Moiré fringes highly imperative. The inclination closely related with the included angle between mask (alignment mark) and wafer (alignment mark) largely influences the alignment accuracy. To solve this issue, we present an adjustment strategy based on the spatial frequency decomposition of two sets of differential Moiré fringes, by which the included angle can be accurately adjusted with an accuracy of better than 10-5rad. The subsequent discussion indicates that the position of imaging system can be responsible for the inclination but actually it would not affect the mask-wafer alignment, so that our proposed adjustment strategy can be operated simply and feasibly, which is validated by the theoretical analysis and experimental results. © 2014 IEEE.
收录类别: SCI ; Ei
项目资助者: National Natural Science Foundation of China [61177010, 61405060] ; Special Fund for Development of National Major Research Instruments and Facilities [2013YQ490879-01]
语种: 英语
WOS记录号: WOS:000349111700002
ISSN号: 1041-1135
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7325
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. School of Computer Science and Technology, Sichuan University, Chengdu, China
2. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China

Recommended Citation:
Zhu, Jiangping,Hu, Song,Su, Xianyu,et al. Adjustment strategy for inclination moiré fringes in lithography by spatial frequency decomposition[J]. IEEE Photonics Technology Letters,2015,27(4).
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