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题名:
Moiré-based absolute interferometry with large measurement range in wafer-mask alignment
作者: Di, Chengliang1,2; Yan, Wei2; Hu, Song2; Yin, Didi1,3; Ma, Chifei1,2
刊名: IEEE Photonics Technology Letters
出版日期: 2015
卷号: 27, 期号:4, 页码:435-438
学科分类: Alignment - Lithography - Rapid thermal annealing
DOI: 10.1109/LPT.2014.2377037
通讯作者: Yan, Wei
文章类型: 期刊论文
中文摘要: The moiré-based interferometry is demonstrated to significantly improve the measurement range in wafer-mask alignment by adopting two specifically designed four-quadrant grating marks. These relationships between the measurement range, the moiré periods and the accuracy of the moiré-based detection algorithm are deduced. By demodulating the transverse shifts of the moiré fringes with two kinds of periods, the final misalignment can be accurately determined. An experimental setup of the wafer-mask alignment is constructed to explore the feasibility and effectiveness of proposed approach. Results indicate that with the established configurations, the measurement range can be readily extended to 120 μm, which is dozens of times larger than conventional methods, and meanwhile the detection accuracy retains to be at nanometers level. © 2014 IEEE.
英文摘要: The moiré-based interferometry is demonstrated to significantly improve the measurement range in wafer-mask alignment by adopting two specifically designed four-quadrant grating marks. These relationships between the measurement range, the moiré periods and the accuracy of the moiré-based detection algorithm are deduced. By demodulating the transverse shifts of the moiré fringes with two kinds of periods, the final misalignment can be accurately determined. An experimental setup of the wafer-mask alignment is constructed to explore the feasibility and effectiveness of proposed approach. Results indicate that with the established configurations, the measurement range can be readily extended to 120 μm, which is dozens of times larger than conventional methods, and meanwhile the detection accuracy retains to be at nanometers level. © 2014 IEEE.
收录类别: SCI ; Ei
项目资助者: National Natural Science Foundation of China [61274108, 61204113]
语种: 英语
WOS记录号: WOS:000349111700012
ISSN号: 1041-1135
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7324
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. University of Chinese Academy of Sciences, Beijing, China
2. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
3. Key Laboratory of Beam Control, Chinese Academy of Sciences, Chengdu, China

Recommended Citation:
Di, Chengliang,Yan, Wei,Hu, Song,et al. Moiré-based absolute interferometry with large measurement range in wafer-mask alignment[J]. IEEE Photonics Technology Letters,2015,27(4):435-438.
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