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题名:
The leveling of mask and wafer in proximity nanolithography using fringe pattern phase analysis
作者: Xu, Feng1,4; Zhou, Shaolin2; Hu, Song3
刊名: Optik
出版日期: 2014
卷号: 125, 期号:13, 页码:3176-3180
学科分类: Computer simulation - Leveling (machinery) - Nanolithography
DOI: 10.1016/j.ijleo.2014.01.029
通讯作者: Xu, F. (casxufeng@gmail.com)
文章类型: 期刊论文
中文摘要: The fringe pattern phase analysis method is proposed for the leveling of mask and wafer in proximity lithography. The tilt between mask and wafer in the space is reflected in the tilted fringe pattern. The method combining the 2-D Fourier transform and 2-D Hanning window is proposed for processing the tilted fringe pattern. The offset and angle of tilt are extracted through phase analysis. Computer simulation and experiment are both performed to verify this method. The results indicate that the tilt of the mask and wafer in the space can be extracted with high accuracy through this method. © 2014 Elsevier GmbH.
英文摘要: The fringe pattern phase analysis method is proposed for the leveling of mask and wafer in proximity lithography. The tilt between mask and wafer in the space is reflected in the tilted fringe pattern. The method combining the 2-D Fourier transform and 2-D Hanning window is proposed for processing the tilted fringe pattern. The offset and angle of tilt are extracted through phase analysis. Computer simulation and experiment are both performed to verify this method. The results indicate that the tilt of the mask and wafer in the space can be extracted with high accuracy through this method. © 2014 Elsevier GmbH.
收录类别: SCI ; Ei
项目资助者: National Natural Science Foundation of China [60976077] ; Doctor Foundation of Southwest University of Science and Technology of China [12zx7128]
语种: 英语
WOS记录号: WOS:000337656400042
ISSN号: 00304026
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7308
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. Faculty of Information and Engineering, Southwest University of Science and Technology, Mianyang, Sichuan 621010, China
2. School of Electronics and Information, South China University of Technology, Guangzhou 510640, China
3. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
4. Robot Technology Used for Special Environment Key Laboratory of Sichuan Province, Mianyang, Sichuan, 621010, China

Recommended Citation:
Xu, Feng,Zhou, Shaolin,Hu, Song. The leveling of mask and wafer in proximity nanolithography using fringe pattern phase analysis[J]. Optik,2014,125(13):3176-3180.
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