IOE OpenIR  > 微电子装备总体研究室(四室)
Moiré interferometry with high alignment resolution in proximity lithographic process
Zhou, Shaolin1,4; Hu, Song2; Fu, Yongqi3; Xu, Xiangmin1; Yang, Jun4
Source PublicationApplied Optics
Volume53Issue:5Pages:951-959
2014
Language英语
ISSN1559-128X
DOI10.1364/AO.53.000951
Indexed BySCI ; Ei
WOS IDWOS:000331368300022
Subtype期刊论文
AbstractMoiré interferometry is widely used as the precise metrology in many science and engineering fields. The schemes of moirés-based interferometry adopting diffraction gratings are presented in this paper for applications in a proximity lithographic system such as wafer-mask alignment, the in-plane twist angle adjustment, and tilts remediation. For the sake of adjustment of lateral offset as well as the tilt and in-plane twist angle, schemes of the (m;-m) and (m;0) moiré interferometry are explored, respectively. Fundamental derivation of the moiré interferometry and schemes for related applications are provided. Three pairs of gratings with close periods are fabricated to form the composite grating. And experiments are performed to confirm the moiré interferometry for related applications in our proximity lithographic system. Experimental results indicate that unaligned lateral offset is detectable with resolution at the nanometer level, and the tilt and in-plane twist angle between wafer and mask could be manually decreased down to the scope of 10-3and 10-4rad, respectively. © 2014 Optical Society of America.; Moiré interferometry is widely used as the precise metrology in many science and engineering fields. The schemes of moirés-based interferometry adopting diffraction gratings are presented in this paper for applications in a proximity lithographic system such as wafer-mask alignment, the in-plane twist angle adjustment, and tilts remediation. For the sake of adjustment of lateral offset as well as the tilt and in-plane twist angle, schemes of the (m;-m) and (m;0) moiré interferometry are explored, respectively. Fundamental derivation of the moiré interferometry and schemes for related applications are provided. Three pairs of gratings with close periods are fabricated to form the composite grating. And experiments are performed to confirm the moiré interferometry for related applications in our proximity lithographic system. Experimental results indicate that unaligned lateral offset is detectable with resolution at the nanometer level, and the tilt and in-plane twist angle between wafer and mask could be manually decreased down to the scope of 10-3and 10-4rad, respectively. © 2014 Optical Society of America.
Citation statistics
Cited Times:4[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7305
Collection微电子装备总体研究室(四室)
Corresponding AuthorFu, Yongqi
Affiliation1. School of Electronic and Information Engineering, South China University of Technology, Guangzhou, China
2. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
3. School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu, China
4. Department of Mechanical and Materials Engineering, Western University (The University of Western Ontario), London
5.ON, Canada
Recommended Citation
GB/T 7714
Zhou, Shaolin,Hu, Song,Fu, Yongqi,et al. Moiré interferometry with high alignment resolution in proximity lithographic process[J]. Applied Optics,2014,53(5):951-959.
APA Zhou, Shaolin,Hu, Song,Fu, Yongqi,Xu, Xiangmin,&Yang, Jun.(2014).Moiré interferometry with high alignment resolution in proximity lithographic process.Applied Optics,53(5),951-959.
MLA Zhou, Shaolin,et al."Moiré interferometry with high alignment resolution in proximity lithographic process".Applied Optics 53.5(2014):951-959.
Files in This Item:
File Name/Size DocType Version Access License
2014-2178.pdf(984KB)期刊论文作者接受稿开放获取CC BY-NC-SAView Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Zhou, Shaolin]'s Articles
[Hu, Song]'s Articles
[Fu, Yongqi]'s Articles
Baidu academic
Similar articles in Baidu academic
[Zhou, Shaolin]'s Articles
[Hu, Song]'s Articles
[Fu, Yongqi]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Zhou, Shaolin]'s Articles
[Hu, Song]'s Articles
[Fu, Yongqi]'s Articles
Terms of Use
No data!
Social Bookmark/Share
File name: 2014-2178.pdf
Format: Adobe PDF
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.