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Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography
Li, Jinlong1; Hu, Song1; Zhao, Lixin1
Source PublicationOptik
Volume125Issue:22Pages:6775-6777
2014
Language英语
ISSN00304026
DOI10.1016/j.ijleo.2014.07.089
Indexed BySCI ; Ei
WOS IDWOS:000344976300035
Subtype期刊论文
AbstractThe high-precision focus control technology becomes more and more important, as the effective depth of focus (DOF) shortens dramatically in advanced lithography. In conventional focus control technology, the focal plane of projection lens is assumed as an ideal plane, but in fact it is a curved surface. The difference between the ideal plane assumed and its real shape results in partial defocus of wafer exposure field, thereby affecting the exposure quality. In our current work, the real shape of projection lens focal plane is brought into consideration for the focus control, and the simulation shows that this method can effectively improve the accuracy of focus control by 26%.; The high-precision focus control technology becomes more and more important, as the effective depth of focus (DOF) shortens dramatically in advanced lithography. In conventional focus control technology, the focal plane of projection lens is assumed as an ideal plane, but in fact it is a curved surface. The difference between the ideal plane assumed and its real shape results in partial defocus of wafer exposure field, thereby affecting the exposure quality. In our current work, the real shape of projection lens focal plane is brought into consideration for the focus control, and the simulation shows that this method can effectively improve the accuracy of focus control by 26%.
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Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7303
Collection微电子装备总体研究室(四室)
Corresponding AuthorLi, Jinlong
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Shuangliu, Chengdu
2.Sichuan, China
Recommended Citation
GB/T 7714
Li, Jinlong,Hu, Song,Zhao, Lixin. Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography[J]. Optik,2014,125(22):6775-6777.
APA Li, Jinlong,Hu, Song,&Zhao, Lixin.(2014).Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography.Optik,125(22),6775-6777.
MLA Li, Jinlong,et al."Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography".Optik 125.22(2014):6775-6777.
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