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题名:
Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography
作者: Li, Jinlong1; Hu, Song1; Zhao, Lixin1
刊名: Optik
出版日期: 2014
卷号: 125, 期号:22, 页码:6775-6777
学科分类: Automation - Lithography
DOI: 10.1016/j.ijleo.2014.07.089
通讯作者: Li, Jinlong
文章类型: 期刊论文
中文摘要: The high-precision focus control technology becomes more and more important, as the effective depth of focus (DOF) shortens dramatically in advanced lithography. In conventional focus control technology, the focal plane of projection lens is assumed as an ideal plane, but in fact it is a curved surface. The difference between the ideal plane assumed and its real shape results in partial defocus of wafer exposure field, thereby affecting the exposure quality. In our current work, the real shape of projection lens focal plane is brought into consideration for the focus control, and the simulation shows that this method can effectively improve the accuracy of focus control by 26%.
英文摘要: The high-precision focus control technology becomes more and more important, as the effective depth of focus (DOF) shortens dramatically in advanced lithography. In conventional focus control technology, the focal plane of projection lens is assumed as an ideal plane, but in fact it is a curved surface. The difference between the ideal plane assumed and its real shape results in partial defocus of wafer exposure field, thereby affecting the exposure quality. In our current work, the real shape of projection lens focal plane is brought into consideration for the focus control, and the simulation shows that this method can effectively improve the accuracy of focus control by 26%.
收录类别: SCI ; Ei
项目资助者: National Natural Science Foundation of China [61274108]
语种: 英语
WOS记录号: WOS:000344976300035
ISSN号: 00304026
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7303
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Shuangliu, Chengdu
2.Sichuan, China

Recommended Citation:
Li, Jinlong,Hu, Song,Zhao, Lixin. Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography[J]. Optik,2014,125(22):6775-6777.
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