IOE OpenIR  > 微电子装备总体研究室(四室)
A modified alignment method based on four-quadrant-grating moiré for proximity lithography
Di, Chengliang1,2; Zhu, Jiangping1,2,3; Yan, Wei1; Hu, Song1; Zhu, J. (chengliangdi@163.com)
Source PublicationOptik
Volume125Issue:17Pages:4868-4872
2014
Language英语
ISSN00304026
DOI10.1016/j.ijleo.2014.04.039
Indexed BySCI ; Ei
WOS IDWOS:000341897100061
Subtype期刊论文
AbstractIn this paper, we demonstrate a modified coarse-fine alignment scheme designed for proximity lithography. Both wafer alignment mark and mask alignment mark consists of linear grating arrays and "+" bar. Coarse alignment and fine alignment could work together to achieve the perfect alignment. Thereinto, coarse alignment, measured from two superposed "+" bars, guarantees the misalignment across wafer and mask within the measurement range of fine alignment, which is based on moire´ fringes formed by the superposition of linear grating arrays. Then we conduct the experiments using a nanometer actuator to drive the wafer alignment mark meanwhile keeping the mask alignment mark motionless, which validates the feasibility and rationality of our designed scheme. © 2014 Elsevier GmbH.; In this paper, we demonstrate a modified coarse-fine alignment scheme designed for proximity lithography. Both wafer alignment mark and mask alignment mark consists of linear grating arrays and "+" bar. Coarse alignment and fine alignment could work together to achieve the perfect alignment. Thereinto, coarse alignment, measured from two superposed "+" bars, guarantees the misalignment across wafer and mask within the measurement range of fine alignment, which is based on moire´ fringes formed by the superposition of linear grating arrays. Then we conduct the experiments using a nanometer actuator to drive the wafer alignment mark meanwhile keeping the mask alignment mark motionless, which validates the feasibility and rationality of our designed scheme. © 2014 Elsevier GmbH.
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7302
Collection微电子装备总体研究室(四室)
Corresponding AuthorZhu, J. (chengliangdi@163.com)
Affiliation1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100039, China
3. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China
Recommended Citation
GB/T 7714
Di, Chengliang,Zhu, Jiangping,Yan, Wei,et al. A modified alignment method based on four-quadrant-grating moiré for proximity lithography[J]. Optik,2014,125(17):4868-4872.
APA Di, Chengliang,Zhu, Jiangping,Yan, Wei,Hu, Song,&Zhu, J. .(2014).A modified alignment method based on four-quadrant-grating moiré for proximity lithography.Optik,125(17),4868-4872.
MLA Di, Chengliang,et al."A modified alignment method based on four-quadrant-grating moiré for proximity lithography".Optik 125.17(2014):4868-4872.
Files in This Item:
File Name/Size DocType Version Access License
2014-2077.pdf(1642KB)期刊论文作者接受稿开放获取CC BY-NC-SAView Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Di, Chengliang]'s Articles
[Zhu, Jiangping]'s Articles
[Yan, Wei]'s Articles
Baidu academic
Similar articles in Baidu academic
[Di, Chengliang]'s Articles
[Zhu, Jiangping]'s Articles
[Yan, Wei]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Di, Chengliang]'s Articles
[Zhu, Jiangping]'s Articles
[Yan, Wei]'s Articles
Terms of Use
No data!
Social Bookmark/Share
File name: 2014-2077.pdf
Format: Adobe PDF
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.