| A modified alignment method based on four-quadrant-grating moiré for proximity lithography | |
| Di, Chengliang1,2; Zhu, Jiangping1,2,3; Yan, Wei1; Hu, Song1; Zhu, J. (chengliangdi@163.com) | |
| Source Publication | Optik
 |
| Volume | 125Issue:17Pages:4868-4872 |
| 2014 | |
| Language | 英语 |
| ISSN | 00304026 |
| DOI | 10.1016/j.ijleo.2014.04.039 |
| Indexed By | SCI ; Ei |
| WOS ID | WOS:000341897100061 |
| Subtype | 期刊论文 |
| Abstract | In this paper, we demonstrate a modified coarse-fine alignment scheme designed for proximity lithography. Both wafer alignment mark and mask alignment mark consists of linear grating arrays and "+" bar. Coarse alignment and fine alignment could work together to achieve the perfect alignment. Thereinto, coarse alignment, measured from two superposed "+" bars, guarantees the misalignment across wafer and mask within the measurement range of fine alignment, which is based on moire´ fringes formed by the superposition of linear grating arrays. Then we conduct the experiments using a nanometer actuator to drive the wafer alignment mark meanwhile keeping the mask alignment mark motionless, which validates the feasibility and rationality of our designed scheme. © 2014 Elsevier GmbH.; In this paper, we demonstrate a modified coarse-fine alignment scheme designed for proximity lithography. Both wafer alignment mark and mask alignment mark consists of linear grating arrays and "+" bar. Coarse alignment and fine alignment could work together to achieve the perfect alignment. Thereinto, coarse alignment, measured from two superposed "+" bars, guarantees the misalignment across wafer and mask within the measurement range of fine alignment, which is based on moire´ fringes formed by the superposition of linear grating arrays. Then we conduct the experiments using a nanometer actuator to drive the wafer alignment mark meanwhile keeping the mask alignment mark motionless, which validates the feasibility and rationality of our designed scheme. © 2014 Elsevier GmbH. |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7302 |
| Collection | 微电子装备总体研究室（四室） |
| Corresponding Author | Zhu, J. (chengliangdi@163.com) |
| Affiliation | 1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 2. University of Chinese Academy of Sciences, Beijing 100039, China 3. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China |
| Recommended Citation GB/T 7714 | Di, Chengliang,Zhu, Jiangping,Yan, Wei,et al. A modified alignment method based on four-quadrant-grating moiré for proximity lithography[J]. Optik,2014,125(17):4868-4872. |
| APA | Di, Chengliang,Zhu, Jiangping,Yan, Wei,Hu, Song,&Zhu, J. .(2014).A modified alignment method based on four-quadrant-grating moiré for proximity lithography.Optik,125(17),4868-4872. |
| MLA | Di, Chengliang,et al."A modified alignment method based on four-quadrant-grating moiré for proximity lithography".Optik 125.17(2014):4868-4872. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2014-2077.pdf（1642KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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