题名: A modified alignment method based on four-quadrant-grating moiré for proximity lithography
作者: Di, Chengliang 1,2 ; Zhu, Jiangping 1,2,3 ; Yan, Wei 1 ; Hu, Song 1
刊名: Optik
出版日期: 2014
卷号: 125, 期号: 17, 页码: 4868-4872 学科分类: Image processing - Rapid thermal annealing
DOI: 10.1016/j.ijleo.2014.04.039
通讯作者: Zhu, J. (chengliangdi@163.com)
文章类型: 期刊论文
中文摘要: In this paper, we demonstrate a modified coarse-fine alignment scheme designed for proximity lithography. Both wafer alignment mark and mask alignment mark consists of linear grating arrays and "+" bar. Coarse alignment and fine alignment could work together to achieve the perfect alignment. Thereinto, coarse alignment, measured from two superposed "+" bars, guarantees the misalignment across wafer and mask within the measurement range of fine alignment, which is based on moire´ fringes formed by the superposition of linear grating arrays. Then we conduct the experiments using a nanometer actuator to drive the wafer alignment mark meanwhile keeping the mask alignment mark motionless, which validates the feasibility and rationality of our designed scheme. © 2014 Elsevier GmbH. 英文摘要: In this paper, we demonstrate a modified coarse-fine alignment scheme designed for proximity lithography. Both wafer alignment mark and mask alignment mark consists of linear grating arrays and "+" bar. Coarse alignment and fine alignment could work together to achieve the perfect alignment. Thereinto, coarse alignment, measured from two superposed "+" bars, guarantees the misalignment across wafer and mask within the measurement range of fine alignment, which is based on moire´ fringes formed by the superposition of linear grating arrays. Then we conduct the experiments using a nanometer actuator to drive the wafer alignment mark meanwhile keeping the mask alignment mark motionless, which validates the feasibility and rationality of our designed scheme. © 2014 Elsevier GmbH. 收录类别: SCI
; Ei
项目资助者: Program for the National Science Foundation of China [61274108, 61204114, 61076100]
语种: 英语
WOS记录号: WOS:000341897100061
ISSN号: 00304026
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内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7302
Appears in Collections: 微电子装备总体研究室（四室）_期刊论文
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作者单位: 1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
Recommended Citation:
Di, Chengliang,Zhu, Jiangping,Yan, Wei,et al. A modified alignment method based on four-quadrant-grating moiré for proximity lithography[J]. Optik,2014,125(17):4868-4872.
