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题名:
A modified alignment method based on four-quadrant-grating moiré for proximity lithography
作者: Di, Chengliang1,2; Zhu, Jiangping1,2,3; Yan, Wei1; Hu, Song1
刊名: Optik
出版日期: 2014
卷号: 125, 期号:17, 页码:4868-4872
学科分类: Image processing - Rapid thermal annealing
DOI: 10.1016/j.ijleo.2014.04.039
通讯作者: Zhu, J. (chengliangdi@163.com)
文章类型: 期刊论文
中文摘要: In this paper, we demonstrate a modified coarse-fine alignment scheme designed for proximity lithography. Both wafer alignment mark and mask alignment mark consists of linear grating arrays and "+" bar. Coarse alignment and fine alignment could work together to achieve the perfect alignment. Thereinto, coarse alignment, measured from two superposed "+" bars, guarantees the misalignment across wafer and mask within the measurement range of fine alignment, which is based on moire´ fringes formed by the superposition of linear grating arrays. Then we conduct the experiments using a nanometer actuator to drive the wafer alignment mark meanwhile keeping the mask alignment mark motionless, which validates the feasibility and rationality of our designed scheme. © 2014 Elsevier GmbH.
英文摘要: In this paper, we demonstrate a modified coarse-fine alignment scheme designed for proximity lithography. Both wafer alignment mark and mask alignment mark consists of linear grating arrays and "+" bar. Coarse alignment and fine alignment could work together to achieve the perfect alignment. Thereinto, coarse alignment, measured from two superposed "+" bars, guarantees the misalignment across wafer and mask within the measurement range of fine alignment, which is based on moire´ fringes formed by the superposition of linear grating arrays. Then we conduct the experiments using a nanometer actuator to drive the wafer alignment mark meanwhile keeping the mask alignment mark motionless, which validates the feasibility and rationality of our designed scheme. © 2014 Elsevier GmbH.
收录类别: SCI ; Ei
项目资助者: Program for the National Science Foundation of China [61274108, 61204114, 61076100]
语种: 英语
WOS记录号: WOS:000341897100061
ISSN号: 00304026
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7302
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100039, China
3. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China

Recommended Citation:
Di, Chengliang,Zhu, Jiangping,Yan, Wei,et al. A modified alignment method based on four-quadrant-grating moiré for proximity lithography[J]. Optik,2014,125(17):4868-4872.
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