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Experimental study of Talbot imaging moiré-based lithography alignment method
Zhu, Jiangping1,2,3; Hu, Song1; Zhou, Pei1,3; Yu, Junsheng2; Zhu, J. (zsyioe@163.com)
Source PublicationOptics and Lasers in Engineering
Volume58Pages:54-59
2014
Language英语
ISSN01438166
DOI10.1016/j.optlaseng.2014.01.028
Indexed BySCI ; Ei
WOS IDWOS:000334818300008
Subtype期刊论文
AbstractA four-quadrant gratings alignment method was presented for proximity lithography, which experimentally achieved the alignment accuracy of nanometer level. The alignment marks consist of gratings with slightly different periods, leading to different Talbot distances with the same monochromatic planar wave. The contrast of moire´ fringe varies with the gap between mask (alignment mark) and wafer (alignment mark), which will affect the phase comparison, and induce more errors as well. This paper concentrates on the optimization of parameters of alignment marks to achieve the resulting moire´ fringes with an optimum contrast. By simulation and experiment, we investigate effects of the gap on the contrast, based on which, the design principle of alignment marks is concluded, and it is helpful to the practicability with our proposed alignment method. © 2014 Elsevier Ltd.; A four-quadrant gratings alignment method was presented for proximity lithography, which experimentally achieved the alignment accuracy of nanometer level. The alignment marks consist of gratings with slightly different periods, leading to different Talbot distances with the same monochromatic planar wave. The contrast of moire´ fringe varies with the gap between mask (alignment mark) and wafer (alignment mark), which will affect the phase comparison, and induce more errors as well. This paper concentrates on the optimization of parameters of alignment marks to achieve the resulting moire´ fringes with an optimum contrast. By simulation and experiment, we investigate effects of the gap on the contrast, based on which, the design principle of alignment marks is concluded, and it is helpful to the practicability with our proposed alignment method. © 2014 Elsevier Ltd.
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7300
Collection微电子装备总体研究室(四室)
Corresponding AuthorZhu, J. (zsyioe@163.com)
Affiliation1. Chinese Academy of Sciences, Institution of Optics and Electronics, PO Box 350, Shuangliu, Chengdu 610209, China
2. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China
3. University of Chinese Academy of Sciences, Beijing 100039, China
Recommended Citation
GB/T 7714
Zhu, Jiangping,Hu, Song,Zhou, Pei,et al. Experimental study of Talbot imaging moiré-based lithography alignment method[J]. Optics and Lasers in Engineering,2014,58:54-59.
APA Zhu, Jiangping,Hu, Song,Zhou, Pei,Yu, Junsheng,&Zhu, J. .(2014).Experimental study of Talbot imaging moiré-based lithography alignment method.Optics and Lasers in Engineering,58,54-59.
MLA Zhu, Jiangping,et al."Experimental study of Talbot imaging moiré-based lithography alignment method".Optics and Lasers in Engineering 58(2014):54-59.
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