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题名:
Experimental study of Talbot imaging moiré-based lithography alignment method
作者: Zhu, Jiangping1,2,3; Hu, Song1; Zhou, Pei1,3; Yu, Junsheng2
刊名: Optics and Lasers in Engineering
出版日期: 2014
卷号: 58, 页码:54-59
学科分类: Diffraction gratings - Electrical engineering - Magnetic materials
DOI: 10.1016/j.optlaseng.2014.01.028
通讯作者: Zhu, J. (zsyioe@163.com)
文章类型: 期刊论文
中文摘要: A four-quadrant gratings alignment method was presented for proximity lithography, which experimentally achieved the alignment accuracy of nanometer level. The alignment marks consist of gratings with slightly different periods, leading to different Talbot distances with the same monochromatic planar wave. The contrast of moire´ fringe varies with the gap between mask (alignment mark) and wafer (alignment mark), which will affect the phase comparison, and induce more errors as well. This paper concentrates on the optimization of parameters of alignment marks to achieve the resulting moire´ fringes with an optimum contrast. By simulation and experiment, we investigate effects of the gap on the contrast, based on which, the design principle of alignment marks is concluded, and it is helpful to the practicability with our proposed alignment method. © 2014 Elsevier Ltd.
英文摘要: A four-quadrant gratings alignment method was presented for proximity lithography, which experimentally achieved the alignment accuracy of nanometer level. The alignment marks consist of gratings with slightly different periods, leading to different Talbot distances with the same monochromatic planar wave. The contrast of moire´ fringe varies with the gap between mask (alignment mark) and wafer (alignment mark), which will affect the phase comparison, and induce more errors as well. This paper concentrates on the optimization of parameters of alignment marks to achieve the resulting moire´ fringes with an optimum contrast. By simulation and experiment, we investigate effects of the gap on the contrast, based on which, the design principle of alignment marks is concluded, and it is helpful to the practicability with our proposed alignment method. © 2014 Elsevier Ltd.
收录类别: SCI ; Ei
项目资助者: Program for the National Science Foundation of China [61204115]
语种: 英语
WOS记录号: WOS:000334818300008
ISSN号: 01438166
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7300
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. Chinese Academy of Sciences, Institution of Optics and Electronics, PO Box 350, Shuangliu, Chengdu 610209, China
2. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China
3. University of Chinese Academy of Sciences, Beijing 100039, China

Recommended Citation:
Zhu, Jiangping,Hu, Song,Zhou, Pei,et al. Experimental study of Talbot imaging moiré-based lithography alignment method[J]. Optics and Lasers in Engineering,2014,58:54-59.
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