| Experimental study of Talbot imaging moiré-based lithography alignment method | |
| Zhu, Jiangping1,2,3; Hu, Song1; Zhou, Pei1,3; Yu, Junsheng2; Zhu, J. (zsyioe@163.com) | |
| Source Publication | Optics and Lasers in Engineering
 |
| Volume | 58Pages:54-59 |
| 2014 | |
| Language | 英语 |
| ISSN | 01438166 |
| DOI | 10.1016/j.optlaseng.2014.01.028 |
| Indexed By | SCI ; Ei |
| WOS ID | WOS:000334818300008 |
| Subtype | 期刊论文 |
| Abstract | A four-quadrant gratings alignment method was presented for proximity lithography, which experimentally achieved the alignment accuracy of nanometer level. The alignment marks consist of gratings with slightly different periods, leading to different Talbot distances with the same monochromatic planar wave. The contrast of moire´ fringe varies with the gap between mask (alignment mark) and wafer (alignment mark), which will affect the phase comparison, and induce more errors as well. This paper concentrates on the optimization of parameters of alignment marks to achieve the resulting moire´ fringes with an optimum contrast. By simulation and experiment, we investigate effects of the gap on the contrast, based on which, the design principle of alignment marks is concluded, and it is helpful to the practicability with our proposed alignment method. © 2014 Elsevier Ltd.; A four-quadrant gratings alignment method was presented for proximity lithography, which experimentally achieved the alignment accuracy of nanometer level. The alignment marks consist of gratings with slightly different periods, leading to different Talbot distances with the same monochromatic planar wave. The contrast of moire´ fringe varies with the gap between mask (alignment mark) and wafer (alignment mark), which will affect the phase comparison, and induce more errors as well. This paper concentrates on the optimization of parameters of alignment marks to achieve the resulting moire´ fringes with an optimum contrast. By simulation and experiment, we investigate effects of the gap on the contrast, based on which, the design principle of alignment marks is concluded, and it is helpful to the practicability with our proposed alignment method. © 2014 Elsevier Ltd. |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7300 |
| Collection | 微电子装备总体研究室（四室） |
| Corresponding Author | Zhu, J. (zsyioe@163.com) |
| Affiliation | 1. Chinese Academy of Sciences, Institution of Optics and Electronics, PO Box 350, Shuangliu, Chengdu 610209, China 2. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China 3. University of Chinese Academy of Sciences, Beijing 100039, China |
| Recommended Citation GB/T 7714 | Zhu, Jiangping,Hu, Song,Zhou, Pei,et al. Experimental study of Talbot imaging moiré-based lithography alignment method[J]. Optics and Lasers in Engineering,2014,58:54-59. |
| APA | Zhu, Jiangping,Hu, Song,Zhou, Pei,Yu, Junsheng,&Zhu, J. .(2014).Experimental study of Talbot imaging moiré-based lithography alignment method.Optics and Lasers in Engineering,58,54-59. |
| MLA | Zhu, Jiangping,et al."Experimental study of Talbot imaging moiré-based lithography alignment method".Optics and Lasers in Engineering 58(2014):54-59. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2014-2055.pdf（4376KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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