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题名:
A moiré-based four-channel focusing and leveling scheme for projection lithography
作者: Di, Chengliang1,2; Yan, Wei1; Hu, Song1; Li, Yanli1; Yin, Didi2; Tang, Yan1; Tong, Junmin
刊名: IEEE Photonics Journal
出版日期: 2014
卷号: 6, 期号:4, 页码:6842663
学科分类: Lithography - Photolithography
DOI: 10.1109/JPHOT.2014.2332559
通讯作者: Di, C. (chengliangdi@163.com)
文章类型: 期刊论文
中文摘要: Focusing and leveling are two imperative processes to adjust the wafer onto the ideal focal plane of projection lithography tools. Based on moire´ fringes formed by particularly designed dual-grating marks, the four-channel focusing and leveling scheme is proposed and demonstrated. These relationships between the tilted amount of wafer, the vertical defocusing amount, and the phase distributions of moire´ fringes are deduced. A single-channel experimental setup is constructed to verify the performances of proposed method. Results indicate that the tilted amount and the vertical defocusing amount can be precisely detected with accuracy at 10-4 rad and several nanometers level, respectively, and therefore meet the demand of the high-demanding focusing and leveling processes. © 2014 IEEE.
英文摘要: Focusing and leveling are two imperative processes to adjust the wafer onto the ideal focal plane of projection lithography tools. Based on moire´ fringes formed by particularly designed dual-grating marks, the four-channel focusing and leveling scheme is proposed and demonstrated. These relationships between the tilted amount of wafer, the vertical defocusing amount, and the phase distributions of moire´ fringes are deduced. A single-channel experimental setup is constructed to verify the performances of proposed method. Results indicate that the tilted amount and the vertical defocusing amount can be precisely detected with accuracy at 10-4 rad and several nanometers level, respectively, and therefore meet the demand of the high-demanding focusing and leveling processes. © 2014 IEEE.
收录类别: SCI ; Ei
项目资助者: National Natural Science Foundation of China [61274108, 61204114, 61376110]
语种: 英语
WOS记录号: WOS:000342912700017
ISSN号: 19430655
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7296
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100049, China
3. Xuchang Vocational and Technical College, Xuchang 461000, China

Recommended Citation:
Di, Chengliang,Yan, Wei,Hu, Song,et al. A moiré-based four-channel focusing and leveling scheme for projection lithography[J]. IEEE Photonics Journal,2014,6(4):6842663.
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