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A moiré-based four-channel focusing and leveling scheme for projection lithography
Di, Chengliang1,2; Yan, Wei1; Hu, Song1; Li, Yanli1; Yin, Didi2; Tang, Yan1; Tong, Junmin; Di, C. (chengliangdi@163.com)
Source PublicationIEEE Photonics Journal
Volume6Issue:4Pages:6842663
2014
Language英语
ISSN19430655
DOI10.1109/JPHOT.2014.2332559
Indexed BySCI ; Ei
WOS IDWOS:000342912700017
Subtype期刊论文
AbstractFocusing and leveling are two imperative processes to adjust the wafer onto the ideal focal plane of projection lithography tools. Based on moire´ fringes formed by particularly designed dual-grating marks, the four-channel focusing and leveling scheme is proposed and demonstrated. These relationships between the tilted amount of wafer, the vertical defocusing amount, and the phase distributions of moire´ fringes are deduced. A single-channel experimental setup is constructed to verify the performances of proposed method. Results indicate that the tilted amount and the vertical defocusing amount can be precisely detected with accuracy at 10-4 rad and several nanometers level, respectively, and therefore meet the demand of the high-demanding focusing and leveling processes. © 2014 IEEE.; Focusing and leveling are two imperative processes to adjust the wafer onto the ideal focal plane of projection lithography tools. Based on moire´ fringes formed by particularly designed dual-grating marks, the four-channel focusing and leveling scheme is proposed and demonstrated. These relationships between the tilted amount of wafer, the vertical defocusing amount, and the phase distributions of moire´ fringes are deduced. A single-channel experimental setup is constructed to verify the performances of proposed method. Results indicate that the tilted amount and the vertical defocusing amount can be precisely detected with accuracy at 10-4 rad and several nanometers level, respectively, and therefore meet the demand of the high-demanding focusing and leveling processes. © 2014 IEEE.
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Cited Times:3[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7296
Collection微电子装备总体研究室(四室)
Corresponding AuthorDi, C. (chengliangdi@163.com)
Affiliation1. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100049, China
3. Xuchang Vocational and Technical College, Xuchang 461000, China
Recommended Citation
GB/T 7714
Di, Chengliang,Yan, Wei,Hu, Song,et al. A moiré-based four-channel focusing and leveling scheme for projection lithography[J]. IEEE Photonics Journal,2014,6(4):6842663.
APA Di, Chengliang.,Yan, Wei.,Hu, Song.,Li, Yanli.,Yin, Didi.,...&Di, C. .(2014).A moiré-based four-channel focusing and leveling scheme for projection lithography.IEEE Photonics Journal,6(4),6842663.
MLA Di, Chengliang,et al."A moiré-based four-channel focusing and leveling scheme for projection lithography".IEEE Photonics Journal 6.4(2014):6842663.
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