| Nanochannel fabrication by imprinting-induced cracks | |
| Xia, Liangping1,2; Zhang, Man2; Yang, Zheng1; Cui, Hongliang1; Yin, Shaoyun1; Hu, Song; Du, Chunlei; Du, C. (cldu@cigit.ac.cn) | |
| Source Publication | Applied Physics Letters
 |
| Volume | 104Issue:7Pages:073104 |
| 2014 | |
| Language | 英语 |
| ISSN | 00036951 |
| DOI | 10.1063/1.4866155 |
| Indexed By | SCI ; Ei |
| WOS ID | WOS:000332038500056 |
| Subtype | 期刊论文 |
| Abstract | A simple and low-cost process of imprinting-induced cracks is proposed to fabricate controllable nanochannel structures with high depth-to-width ratio, in ultraviolet (UV) curable photoresist. The nanochannels are formed by the cracks of UV-curable photoresist due to its volume reduction as a result of solidification, with imprinting induced predesigned crack patterns. The proposed process is demonstrated with a nanochannel structure consisting of a periodically distributed hexagonal 30 nm-width and 100 nm-depth channels, which is fabricated by anodic aluminum oxide template imprinting induced cracks on a thiolene UV-curable photoresist. A finite element analysis provided theoretical foundation for the process, shedding lights on the parameters influencing the process. © 2014 AIP Publishing LLC.; A simple and low-cost process of imprinting-induced cracks is proposed to fabricate controllable nanochannel structures with high depth-to-width ratio, in ultraviolet (UV) curable photoresist. The nanochannels are formed by the cracks of UV-curable photoresist due to its volume reduction as a result of solidification, with imprinting induced predesigned crack patterns. The proposed process is demonstrated with a nanochannel structure consisting of a periodically distributed hexagonal 30 nm-width and 100 nm-depth channels, which is fabricated by anodic aluminum oxide template imprinting induced cracks on a thiolene UV-curable photoresist. A finite element analysis provided theoretical foundation for the process, shedding lights on the parameters influencing the process. © 2014 AIP Publishing LLC. |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7295 |
| Collection | 微电子装备总体研究室（四室） |
| Corresponding Author | Du, C. (cldu@cigit.ac.cn) |
| Affiliation | 1. Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, China 2. Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu 610209, China |
| Recommended Citation GB/T 7714 | Xia, Liangping,Zhang, Man,Yang, Zheng,et al. Nanochannel fabrication by imprinting-induced cracks[J]. Applied Physics Letters,2014,104(7):073104. |
| APA | Xia, Liangping.,Zhang, Man.,Yang, Zheng.,Cui, Hongliang.,Yin, Shaoyun.,...&Du, C. .(2014).Nanochannel fabrication by imprinting-induced cracks.Applied Physics Letters,104(7),073104. |
| MLA | Xia, Liangping,et al."Nanochannel fabrication by imprinting-induced cracks".Applied Physics Letters 104.7(2014):073104. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2014-2015.pdf（1444KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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