题名: Nanochannel fabrication by imprinting-induced cracks
作者: Xia, Liangping 1,2 ; Zhang, Man 2 ; Yang, Zheng 1 ; Cui, Hongliang 1 ; Yin, Shaoyun 1 ; Hu, Song Du, Chunlei 刊名: Applied Physics Letters
出版日期: 2014
卷号: 104, 期号: 7, 页码: 073104 学科分类: Anodic oxidation - Curing - Photoresists
DOI: 10.1063/1.4866155
通讯作者: Du, C. (cldu@cigit.ac.cn)
文章类型: 期刊论文
中文摘要: A simple and low-cost process of imprinting-induced cracks is proposed to fabricate controllable nanochannel structures with high depth-to-width ratio, in ultraviolet (UV) curable photoresist. The nanochannels are formed by the cracks of UV-curable photoresist due to its volume reduction as a result of solidification, with imprinting induced predesigned crack patterns. The proposed process is demonstrated with a nanochannel structure consisting of a periodically distributed hexagonal 30 nm-width and 100 nm-depth channels, which is fabricated by anodic aluminum oxide template imprinting induced cracks on a thiolene UV-curable photoresist. A finite element analysis provided theoretical foundation for the process, shedding lights on the parameters influencing the process. © 2014 AIP Publishing LLC. 英文摘要: A simple and low-cost process of imprinting-induced cracks is proposed to fabricate controllable nanochannel structures with high depth-to-width ratio, in ultraviolet (UV) curable photoresist. The nanochannels are formed by the cracks of UV-curable photoresist due to its volume reduction as a result of solidification, with imprinting induced predesigned crack patterns. The proposed process is demonstrated with a nanochannel structure consisting of a periodically distributed hexagonal 30 nm-width and 100 nm-depth channels, which is fabricated by anodic aluminum oxide template imprinting induced cracks on a thiolene UV-curable photoresist. A finite element analysis provided theoretical foundation for the process, shedding lights on the parameters influencing the process. © 2014 AIP Publishing LLC. 收录类别: SCI
; Ei
项目资助者: National Natural Science Foundation of China [11174281, 61275061]
; Graduate Student Innovation Foundation of Institute of Optics and Electronics, Chinese Academy of Sciences
; West Light Foundation of Chinese Academy of Sciences
; Application development project of Chongqing [cstc2013yykfC00007]
; Fundamental and advanced research projects of Chongqing [cstc2013jcyjC00001]
语种: 英语
WOS记录号: WOS:000332038500056
ISSN号: 00036951
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内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7295
Appears in Collections: 微电子装备总体研究室（四室）_期刊论文
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作者单位: 1. Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, China
Recommended Citation:
Xia, Liangping,Zhang, Man,Yang, Zheng,et al. Nanochannel fabrication by imprinting-induced cracks[J]. Applied Physics Letters,2014,104(7):073104.
