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题名:
Nanochannel fabrication by imprinting-induced cracks
作者: Xia, Liangping1,2; Zhang, Man2; Yang, Zheng1; Cui, Hongliang1; Yin, Shaoyun1; Hu, Song; Du, Chunlei
刊名: Applied Physics Letters
出版日期: 2014
卷号: 104, 期号:7, 页码:073104
学科分类: Anodic oxidation - Curing - Photoresists
DOI: 10.1063/1.4866155
通讯作者: Du, C. (cldu@cigit.ac.cn)
文章类型: 期刊论文
中文摘要: A simple and low-cost process of imprinting-induced cracks is proposed to fabricate controllable nanochannel structures with high depth-to-width ratio, in ultraviolet (UV) curable photoresist. The nanochannels are formed by the cracks of UV-curable photoresist due to its volume reduction as a result of solidification, with imprinting induced predesigned crack patterns. The proposed process is demonstrated with a nanochannel structure consisting of a periodically distributed hexagonal 30 nm-width and 100 nm-depth channels, which is fabricated by anodic aluminum oxide template imprinting induced cracks on a thiolene UV-curable photoresist. A finite element analysis provided theoretical foundation for the process, shedding lights on the parameters influencing the process. © 2014 AIP Publishing LLC.
英文摘要: A simple and low-cost process of imprinting-induced cracks is proposed to fabricate controllable nanochannel structures with high depth-to-width ratio, in ultraviolet (UV) curable photoresist. The nanochannels are formed by the cracks of UV-curable photoresist due to its volume reduction as a result of solidification, with imprinting induced predesigned crack patterns. The proposed process is demonstrated with a nanochannel structure consisting of a periodically distributed hexagonal 30 nm-width and 100 nm-depth channels, which is fabricated by anodic aluminum oxide template imprinting induced cracks on a thiolene UV-curable photoresist. A finite element analysis provided theoretical foundation for the process, shedding lights on the parameters influencing the process. © 2014 AIP Publishing LLC.
收录类别: SCI ; Ei
项目资助者: National Natural Science Foundation of China [11174281, 61275061] ; Graduate Student Innovation Foundation of Institute of Optics and Electronics, Chinese Academy of Sciences ; West Light Foundation of Chinese Academy of Sciences ; Application development project of Chongqing [cstc2013yykfC00007] ; Fundamental and advanced research projects of Chongqing [cstc2013jcyjC00001]
语种: 英语
WOS记录号: WOS:000332038500056
ISSN号: 00036951
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7295
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, China
2. Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu 610209, China

Recommended Citation:
Xia, Liangping,Zhang, Man,Yang, Zheng,et al. Nanochannel fabrication by imprinting-induced cracks[J]. Applied Physics Letters,2014,104(7):073104.
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