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Nanochannel fabrication by imprinting-induced cracks
Xia, Liangping1,2; Zhang, Man2; Yang, Zheng1; Cui, Hongliang1; Yin, Shaoyun1; Hu, Song; Du, Chunlei; Du, C. (cldu@cigit.ac.cn)
Source PublicationApplied Physics Letters
Volume104Issue:7Pages:073104
2014
Language英语
ISSN00036951
DOI10.1063/1.4866155
Indexed BySCI ; Ei
WOS IDWOS:000332038500056
Subtype期刊论文
AbstractA simple and low-cost process of imprinting-induced cracks is proposed to fabricate controllable nanochannel structures with high depth-to-width ratio, in ultraviolet (UV) curable photoresist. The nanochannels are formed by the cracks of UV-curable photoresist due to its volume reduction as a result of solidification, with imprinting induced predesigned crack patterns. The proposed process is demonstrated with a nanochannel structure consisting of a periodically distributed hexagonal 30 nm-width and 100 nm-depth channels, which is fabricated by anodic aluminum oxide template imprinting induced cracks on a thiolene UV-curable photoresist. A finite element analysis provided theoretical foundation for the process, shedding lights on the parameters influencing the process. © 2014 AIP Publishing LLC.; A simple and low-cost process of imprinting-induced cracks is proposed to fabricate controllable nanochannel structures with high depth-to-width ratio, in ultraviolet (UV) curable photoresist. The nanochannels are formed by the cracks of UV-curable photoresist due to its volume reduction as a result of solidification, with imprinting induced predesigned crack patterns. The proposed process is demonstrated with a nanochannel structure consisting of a periodically distributed hexagonal 30 nm-width and 100 nm-depth channels, which is fabricated by anodic aluminum oxide template imprinting induced cracks on a thiolene UV-curable photoresist. A finite element analysis provided theoretical foundation for the process, shedding lights on the parameters influencing the process. © 2014 AIP Publishing LLC.
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7295
Collection微电子装备总体研究室(四室)
Corresponding AuthorDu, C. (cldu@cigit.ac.cn)
Affiliation1. Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, China
2. Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu 610209, China
Recommended Citation
GB/T 7714
Xia, Liangping,Zhang, Man,Yang, Zheng,et al. Nanochannel fabrication by imprinting-induced cracks[J]. Applied Physics Letters,2014,104(7):073104.
APA Xia, Liangping.,Zhang, Man.,Yang, Zheng.,Cui, Hongliang.,Yin, Shaoyun.,...&Du, C. .(2014).Nanochannel fabrication by imprinting-induced cracks.Applied Physics Letters,104(7),073104.
MLA Xia, Liangping,et al."Nanochannel fabrication by imprinting-induced cracks".Applied Physics Letters 104.7(2014):073104.
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