IOE OpenIR  > 微电子装备总体研究室(四室)
Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography
Di, Chengliang; Hu, Song; Yan, Wei; Li, Yanli; Li, Guang; Tong, Junmin; Di, CL (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China.
Source PublicationIEEE PHOTONICS JOURNAL
Volume6Issue:3
2014
Language英语
ISSN1943-0655
DOI10.1109/JPHOT.2014.2326676
Indexed BySCI
WOS IDWOS:000340830400010
Subtype期刊论文
AbstractFocusing of wafer plane is an essential factor to determine the ultimate feature size of the stepper such as projection lithographic system. Based on Michelson interferometeric system, this paper demonstrates an interferometric focusing scheme for projection lithography to coaxially locate the ideal focal plane of the projective objective. The collimated incident laser beam is divided into the reference arm and object arm. The latter propagates through the objective lens and then interferes with the slightly deflected reference beam that reflected back by a fixed mirror, giving rise to an interferential pattern on the CCD. Any amounts of defocusing can be directly indicated from the demodulated phase of the interferential pattern. In this manner, the focusing sensitivity at nanometer scale is experimentally attainable, which shows great superiority over traditional methods, particularly the limited focal length of current projective objective lens.; Focusing of wafer plane is an essential factor to determine the ultimate feature size of the stepper such as projection lithographic system. Based on Michelson interferometeric system, this paper demonstrates an interferometric focusing scheme for projection lithography to coaxially locate the ideal focal plane of the projective objective. The collimated incident laser beam is divided into the reference arm and object arm. The latter propagates through the objective lens and then interferes with the slightly deflected reference beam that reflected back by a fixed mirror, giving rise to an interferential pattern on the CCD. Any amounts of defocusing can be directly indicated from the demodulated phase of the interferential pattern. In this manner, the focusing sensitivity at nanometer scale is experimentally attainable, which shows great superiority over traditional methods, particularly the limited focal length of current projective objective lens.
Citation statistics
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7292
Collection微电子装备总体研究室(四室)
Corresponding AuthorDi, CL (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China.
Affiliation1.[Di, Chengliang
2.Hu, Song
3.Yan, Wei
4.Li, Yanli
5.Li, Guang] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
6.[Di, Chengliang
7.Li, Guang] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
8.[Tong, Junmin] Xuchang Vocat & Tech Coll, Xuchang 461000, Peoples R China
Recommended Citation
GB/T 7714
Di, Chengliang,Hu, Song,Yan, Wei,et al. Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography[J]. IEEE PHOTONICS JOURNAL,2014,6(3).
APA Di, Chengliang.,Hu, Song.,Yan, Wei.,Li, Yanli.,Li, Guang.,...&Di, CL .(2014).Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography.IEEE PHOTONICS JOURNAL,6(3).
MLA Di, Chengliang,et al."Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography".IEEE PHOTONICS JOURNAL 6.3(2014).
Files in This Item:
File Name/Size DocType Version Access License
2014-2031.pdf(1270KB)期刊论文作者接受稿开放获取CC BY-NC-SAView Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Di, Chengliang]'s Articles
[Hu, Song]'s Articles
[Yan, Wei]'s Articles
Baidu academic
Similar articles in Baidu academic
[Di, Chengliang]'s Articles
[Hu, Song]'s Articles
[Yan, Wei]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Di, Chengliang]'s Articles
[Hu, Song]'s Articles
[Yan, Wei]'s Articles
Terms of Use
No data!
Social Bookmark/Share
File name: 2014-2031.pdf
Format: Adobe PDF
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.