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Influence of Collimation on Alignment Accuracy in Proximity Lithography
Wang, Nan; Jiang, Wei; Zhu, Jiangping; Tang, Yan; Yan, Wei; Tong, Junmin; Hu, Song; Wang, N (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China.
Source PublicationIEEE PHOTONICS JOURNAL
Volume6Issue:4
2014
Language英语
ISSN1943-0655
DOI10.1109/JPHOT.2014.2345878
Indexed BySCI
WOS IDWOS:000342912700013
Subtype期刊论文
AbstractThe alignment method based on moire imaging has been wildly used for its high accuracy of physical measurement, which utilized the phase of moire fringe to measure the relative linear displacement between the mask and the wafer. However, this method is only theoretically accurate due to the affection of certain parameters, such as the optical beam collimation. In this paper, the influence of collimation on the alignment accuracy is thoroughly analyzed. The theoretical analyses and simulation results indicate that the alignment accuracy, which was observed just behind the test grating, is sensitive to the divergence or convergence angle of incident light. On this basis, the method for the error correction is proposed and confirmed.; The alignment method based on moire imaging has been wildly used for its high accuracy of physical measurement, which utilized the phase of moire fringe to measure the relative linear displacement between the mask and the wafer. However, this method is only theoretically accurate due to the affection of certain parameters, such as the optical beam collimation. In this paper, the influence of collimation on the alignment accuracy is thoroughly analyzed. The theoretical analyses and simulation results indicate that the alignment accuracy, which was observed just behind the test grating, is sensitive to the divergence or convergence angle of incident light. On this basis, the method for the error correction is proposed and confirmed.
Citation statistics
Cited Times:5[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7291
Collection微电子装备总体研究室(四室)
Corresponding AuthorWang, N (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China.
Affiliation1.[Wang, Nan
2.Jiang, Wei
3.Tang, Yan
4.Yan, Wei
5.Hu, Song] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
6.[Wang, Nan] Univ Chinese Acad Sci, Beijing 100039, Peoples R China
7.[Zhu, Jiangping] Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China
8.[Tong, Junmin] Xuchang Vocat & Tech Coll, Xuchang 461000, Peoples R China
Recommended Citation
GB/T 7714
Wang, Nan,Jiang, Wei,Zhu, Jiangping,et al. Influence of Collimation on Alignment Accuracy in Proximity Lithography[J]. IEEE PHOTONICS JOURNAL,2014,6(4).
APA Wang, Nan.,Jiang, Wei.,Zhu, Jiangping.,Tang, Yan.,Yan, Wei.,...&Wang, N .(2014).Influence of Collimation on Alignment Accuracy in Proximity Lithography.IEEE PHOTONICS JOURNAL,6(4).
MLA Wang, Nan,et al."Influence of Collimation on Alignment Accuracy in Proximity Lithography".IEEE PHOTONICS JOURNAL 6.4(2014).
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