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题名:
Influence of Collimation on Alignment Accuracy in Proximity Lithography
作者: Wang, Nan; Jiang, Wei; Zhu, Jiangping; Tang, Yan; Yan, Wei; Tong, Junmin; Hu, Song
刊名: IEEE PHOTONICS JOURNAL
出版日期: 2014
卷号: 6, 期号:4
学科分类: Collimation; moire fringe; lithography alignment
DOI: 10.1109/JPHOT.2014.2345878
通讯作者: Wang, N (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China.
文章类型: 期刊论文
中文摘要: The alignment method based on moire imaging has been wildly used for its high accuracy of physical measurement, which utilized the phase of moire fringe to measure the relative linear displacement between the mask and the wafer. However, this method is only theoretically accurate due to the affection of certain parameters, such as the optical beam collimation. In this paper, the influence of collimation on the alignment accuracy is thoroughly analyzed. The theoretical analyses and simulation results indicate that the alignment accuracy, which was observed just behind the test grating, is sensitive to the divergence or convergence angle of incident light. On this basis, the method for the error correction is proposed and confirmed.
英文摘要: The alignment method based on moire imaging has been wildly used for its high accuracy of physical measurement, which utilized the phase of moire fringe to measure the relative linear displacement between the mask and the wafer. However, this method is only theoretically accurate due to the affection of certain parameters, such as the optical beam collimation. In this paper, the influence of collimation on the alignment accuracy is thoroughly analyzed. The theoretical analyses and simulation results indicate that the alignment accuracy, which was observed just behind the test grating, is sensitive to the divergence or convergence angle of incident light. On this basis, the method for the error correction is proposed and confirmed.
收录类别: SCI
项目资助者: National Natural Science Foundation of China [61274108, 61274114]
语种: 英语
WOS记录号: WOS:000342912700013
ISSN号: 1943-0655
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7291
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1.[Wang, Nan
2.Jiang, Wei
3.Tang, Yan
4.Yan, Wei
5.Hu, Song] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
6.[Wang, Nan] Univ Chinese Acad Sci, Beijing 100039, Peoples R China
7.[Zhu, Jiangping] Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China
8.[Tong, Junmin] Xuchang Vocat & Tech Coll, Xuchang 461000, Peoples R China

Recommended Citation:
Wang, Nan,Jiang, Wei,Zhu, Jiangping,et al. Influence of Collimation on Alignment Accuracy in Proximity Lithography[J]. IEEE PHOTONICS JOURNAL,2014,6(4).
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