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题名:
Four-quadrant gratings moiré fringe alignment measurement in proximity lithography
作者: Zhu, Jiangping1,2,3; Hu, Song1; Yu, JunshenG.2; Zhou, Shaolin5; Tang, Yan1; Zhong, Min4; Zhao, Lixin1; Chen, Minyong1; Li, Lanlan1,3; He, Yu1,3; Jiang, Wei1
刊名: Optics Express
出版日期: 2013
卷号: 21, 期号:3, 页码:3463-3473
学科分类: Demodulation - Image processing - Rapid thermal annealing
DOI: 10.1364/OE.21.003463
通讯作者: Zhu, J.
文章类型: 期刊论文
中文摘要: This paper aims to deal with a four-quadrant gratings alignment method benefiting from phase demodulation for proximity lithography, which combines the advantages of interferometry with image processing. Both the mask alignment mark and the wafer alignment mark consist of four sets of gratings, which bring the convenience and simplification of realization for coarse alignment and fine alignment. Four sets of moire´ fringes created by superposing the mask alignment mark and the wafer alignment mark are highly sensitive to the misalignment between them. And the misalignment can be easily determined through demodulating the phase of moire´ fringe without any external reference. Especially, the period and phase distribution of moire´ fringes are unaffected by the gap between the mask and the wafer, not excepting the wavelength of alignment illumination. Disturbance from the illumination can also be negligible, which enhances the technological adaptability. The experimental results bear out the feasibility and rationality of our designed approach. © 2013 Optical Society of America.
英文摘要: This paper aims to deal with a four-quadrant gratings alignment method benefiting from phase demodulation for proximity lithography, which combines the advantages of interferometry with image processing. Both the mask alignment mark and the wafer alignment mark consist of four sets of gratings, which bring the convenience and simplification of realization for coarse alignment and fine alignment. Four sets of moire´ fringes created by superposing the mask alignment mark and the wafer alignment mark are highly sensitive to the misalignment between them. And the misalignment can be easily determined through demodulating the phase of moire´ fringe without any external reference. Especially, the period and phase distribution of moire´ fringes are unaffected by the gap between the mask and the wafer, not excepting the wavelength of alignment illumination. Disturbance from the illumination can also be negligible, which enhances the technological adaptability. The experimental results bear out the feasibility and rationality of our designed approach. © 2013 Optical Society of America.
收录类别: SCI ; Ei
项目资助者: National Science Foundation of China [61204114]
语种: 英语
WOS记录号: WOS:000315991400094
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7286
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China
3. Graduate University, Chinese Academy of Sciences, Beijing 100039, China
4. School of Electronic and Information, Sichuan University, Chengdu 610065, China
5. School of Electronic and Information, South China University of Technology, Guangzhou 510640, China

Recommended Citation:
Zhu, Jiangping,Hu, Song,Yu, JunshenG.,et al. Four-quadrant gratings moiré fringe alignment measurement in proximity lithography[J]. Optics Express,2013,21(3):3463-3473.
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