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Single closed fringe pattern phase demodulation in alignment of nanolithography
Xu, Feng1,2; Hu, Song1; Yang, Yong1; Li, Jinlong1,2; Li, Lanlan1,2; Xu, F. (casxufeng@gmail.com)
Source PublicationOptik
Volume124Issue:9Pages:818-823
2013
Language英语
ISSN00304026
DOI10.1016/j.ijleo.2012.01.032
Indexed BySCI ; Ei
WOS IDWOS:000318056600010
Subtype期刊论文
AbstractThe single closed fringe pattern that occurs in two superposed grating marks applied in the previously designed moire´ alignment scheme based on dual-grating for lithography is processed and analyzed using a frequency domain method based on two-dimensional (2-D) analytic wavelet transform (AWT) and 2-D wavelet ridge algorithm. The sign ambiguities, which always occur in the process of single closed fringe pattern analysis, are removed through the discontinuities of the angle in the 2-D wavelet ridge. Theoretical analysis regarding application of 2-D AWT and 2-D wavelet ridge to the interference fringe in alignment is performed. Verification of this process is carried out through numerical simulation and experiment. Results indicate that the background and noise in the fringes can be filtered effectively through our method, and the phase information can be obtained successfully. © 2012 Elsevier GmbH.; The single closed fringe pattern that occurs in two superposed grating marks applied in the previously designed moire´ alignment scheme based on dual-grating for lithography is processed and analyzed using a frequency domain method based on two-dimensional (2-D) analytic wavelet transform (AWT) and 2-D wavelet ridge algorithm. The sign ambiguities, which always occur in the process of single closed fringe pattern analysis, are removed through the discontinuities of the angle in the 2-D wavelet ridge. Theoretical analysis regarding application of 2-D AWT and 2-D wavelet ridge to the interference fringe in alignment is performed. Verification of this process is carried out through numerical simulation and experiment. Results indicate that the background and noise in the fringes can be filtered effectively through our method, and the phase information can be obtained successfully. © 2012 Elsevier GmbH.
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7284
Collection微电子装备总体研究室(四室)
Corresponding AuthorXu, F. (casxufeng@gmail.com)
Affiliation1. Institute Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. Graduate University of Chinese Academy of Sciences, Beijing 100039, China
Recommended Citation
GB/T 7714
Xu, Feng,Hu, Song,Yang, Yong,et al. Single closed fringe pattern phase demodulation in alignment of nanolithography[J]. Optik,2013,124(9):818-823.
APA Xu, Feng,Hu, Song,Yang, Yong,Li, Jinlong,Li, Lanlan,&Xu, F. .(2013).Single closed fringe pattern phase demodulation in alignment of nanolithography.Optik,124(9),818-823.
MLA Xu, Feng,et al."Single closed fringe pattern phase demodulation in alignment of nanolithography".Optik 124.9(2013):818-823.
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