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题名:
Single closed fringe pattern phase demodulation in alignment of nanolithography
作者: Xu, Feng1,2; Hu, Song1; Yang, Yong1; Li, Jinlong1,2; Li, Lanlan1,2
刊名: Optik
出版日期: 2013
卷号: 124, 期号:9, 页码:818-823
学科分类: Alignment - Demodulation - Frequency domain analysis - Information filtering - Optical variables measurement
DOI: 10.1016/j.ijleo.2012.01.032
通讯作者: Xu, F. (casxufeng@gmail.com)
文章类型: 期刊论文
中文摘要: The single closed fringe pattern that occurs in two superposed grating marks applied in the previously designed moire´ alignment scheme based on dual-grating for lithography is processed and analyzed using a frequency domain method based on two-dimensional (2-D) analytic wavelet transform (AWT) and 2-D wavelet ridge algorithm. The sign ambiguities, which always occur in the process of single closed fringe pattern analysis, are removed through the discontinuities of the angle in the 2-D wavelet ridge. Theoretical analysis regarding application of 2-D AWT and 2-D wavelet ridge to the interference fringe in alignment is performed. Verification of this process is carried out through numerical simulation and experiment. Results indicate that the background and noise in the fringes can be filtered effectively through our method, and the phase information can be obtained successfully. © 2012 Elsevier GmbH.
英文摘要: The single closed fringe pattern that occurs in two superposed grating marks applied in the previously designed moire´ alignment scheme based on dual-grating for lithography is processed and analyzed using a frequency domain method based on two-dimensional (2-D) analytic wavelet transform (AWT) and 2-D wavelet ridge algorithm. The sign ambiguities, which always occur in the process of single closed fringe pattern analysis, are removed through the discontinuities of the angle in the 2-D wavelet ridge. Theoretical analysis regarding application of 2-D AWT and 2-D wavelet ridge to the interference fringe in alignment is performed. Verification of this process is carried out through numerical simulation and experiment. Results indicate that the background and noise in the fringes can be filtered effectively through our method, and the phase information can be obtained successfully. © 2012 Elsevier GmbH.
收录类别: SCI ; Ei
项目资助者: National Natural Science Foundation of China [60976077, 60906049, 61076100] ; National High Technology Research and Development Program of China [2009AA03Z341]
语种: 英语
WOS记录号: WOS:000318056600010
ISSN号: 00304026
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7284
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. Institute Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. Graduate University of Chinese Academy of Sciences, Beijing 100039, China

Recommended Citation:
Xu, Feng,Hu, Song,Yang, Yong,et al. Single closed fringe pattern phase demodulation in alignment of nanolithography[J]. Optik,2013,124(9):818-823.
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