| Influence of tilt moiré fringe on alignment accuracy in proximity lithography | |
| Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Tang, Yan1; Xu, Feng; He, Yu; Zhou, Shaolin; Li, Lanlan; Zhu, J. (zsyioe@163.com) | |
| Source Publication | Optics and Lasers in Engineering
 |
| Volume | 51Issue:4Pages:371-381 |
| 2013 | |
| Language | 英语 |
| ISSN | 01438166 |
| DOI | 10.1016/j.optlaseng.2012.12.001 |
| Indexed By | SCI ; Ei |
| WOS ID | WOS:000314860500006 |
| Subtype | 期刊论文 |
| Abstract | A moire´ fringe alignment method based on dual gratings is proposed. This method uses the phase of moire´ fringe to measure the relative linear displacement between the mask and the wafer. In practical application, the tilt moire´ fringe can occur due to the incorrect positions of the mask alignment mark and the wafer alignment mark or one of them. In this work, the presence of tilt moire´ fringe and its influence on the alignment accuracy are thoroughly analyzed. The analysis and discussions on the relationship between the revised linear displacement and the theoretical linear displacement reveal that moire´ fringes with different tilt angles have different influences on the alignment accuracy. Experimental results are given to verify that the proposed method is accurate and feasible, which can be applied to lithography and other correlated fields. © 2012 Elsevier Ltd. All rights reserved.; A moire´ fringe alignment method based on dual gratings is proposed. This method uses the phase of moire´ fringe to measure the relative linear displacement between the mask and the wafer. In practical application, the tilt moire´ fringe can occur due to the incorrect positions of the mask alignment mark and the wafer alignment mark or one of them. In this work, the presence of tilt moire´ fringe and its influence on the alignment accuracy are thoroughly analyzed. The analysis and discussions on the relationship between the revised linear displacement and the theoretical linear displacement reveal that moire´ fringes with different tilt angles have different influences on the alignment accuracy. Experimental results are given to verify that the proposed method is accurate and feasible, which can be applied to lithography and other correlated fields. © 2012 Elsevier Ltd. All rights reserved. |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7281 |
| Collection | 微电子装备总体研究室（四室） |
| Corresponding Author | Zhu, J. (zsyioe@163.com) |
| Affiliation | 1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 2. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China 3. Graduate University of Chinese Academy of Sciences, Beijing 100039, China 4. School of Electronic and Information, South China University of Technology, Guangzhou 510640, China 5. Information Engineering College, Southwest University of Science and Technology, Mianyang 621010, China |
| Recommended Citation GB/T 7714 | Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Influence of tilt moiré fringe on alignment accuracy in proximity lithography[J]. Optics and Lasers in Engineering,2013,51(4):371-381. |
| APA | Zhu, Jiangping.,Hu, Song.,Yu, Junsheng.,Tang, Yan.,Xu, Feng.,...&Zhu, J. .(2013).Influence of tilt moiré fringe on alignment accuracy in proximity lithography.Optics and Lasers in Engineering,51(4),371-381. |
| MLA | Zhu, Jiangping,et al."Influence of tilt moiré fringe on alignment accuracy in proximity lithography".Optics and Lasers in Engineering 51.4(2013):371-381. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2013-2030.pdf（2655KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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