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题名:
Influence of tilt moiré fringe on alignment accuracy in proximity lithography
作者: Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Tang, Yan1; Xu, Feng; He, Yu; Zhou, Shaolin; Li, Lanlan
刊名: Optics and Lasers in Engineering
出版日期: 2013
卷号: 51, 期号:4, 页码:371-381
学科分类: Electrical engineering - Magnetic materials
DOI: 10.1016/j.optlaseng.2012.12.001
通讯作者: Zhu, J. (zsyioe@163.com)
文章类型: 期刊论文
中文摘要: A moire´ fringe alignment method based on dual gratings is proposed. This method uses the phase of moire´ fringe to measure the relative linear displacement between the mask and the wafer. In practical application, the tilt moire´ fringe can occur due to the incorrect positions of the mask alignment mark and the wafer alignment mark or one of them. In this work, the presence of tilt moire´ fringe and its influence on the alignment accuracy are thoroughly analyzed. The analysis and discussions on the relationship between the revised linear displacement and the theoretical linear displacement reveal that moire´ fringes with different tilt angles have different influences on the alignment accuracy. Experimental results are given to verify that the proposed method is accurate and feasible, which can be applied to lithography and other correlated fields. © 2012 Elsevier Ltd. All rights reserved.
英文摘要: A moire´ fringe alignment method based on dual gratings is proposed. This method uses the phase of moire´ fringe to measure the relative linear displacement between the mask and the wafer. In practical application, the tilt moire´ fringe can occur due to the incorrect positions of the mask alignment mark and the wafer alignment mark or one of them. In this work, the presence of tilt moire´ fringe and its influence on the alignment accuracy are thoroughly analyzed. The analysis and discussions on the relationship between the revised linear displacement and the theoretical linear displacement reveal that moire´ fringes with different tilt angles have different influences on the alignment accuracy. Experimental results are given to verify that the proposed method is accurate and feasible, which can be applied to lithography and other correlated fields. © 2012 Elsevier Ltd. All rights reserved.
收录类别: SCI ; Ei
项目资助者: National Science Foundation of China [60976077, 61076099]
语种: 英语
WOS记录号: WOS:000314860500006
ISSN号: 01438166
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7281
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China
3. Graduate University of Chinese Academy of Sciences, Beijing 100039, China
4. School of Electronic and Information, South China University of Technology, Guangzhou 510640, China
5. Information Engineering College, Southwest University of Science and Technology, Mianyang 621010, China

Recommended Citation:
Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Influence of tilt moiré fringe on alignment accuracy in proximity lithography[J]. Optics and Lasers in Engineering,2013,51(4):371-381.
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