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Influence of tilt moiré fringe on alignment accuracy in proximity lithography
Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Tang, Yan1; Xu, Feng; He, Yu; Zhou, Shaolin; Li, Lanlan; Zhu, J. (zsyioe@163.com)
Source PublicationOptics and Lasers in Engineering
Volume51Issue:4Pages:371-381
2013
Language英语
ISSN01438166
DOI10.1016/j.optlaseng.2012.12.001
Indexed BySCI ; Ei
WOS IDWOS:000314860500006
Subtype期刊论文
AbstractA moire´ fringe alignment method based on dual gratings is proposed. This method uses the phase of moire´ fringe to measure the relative linear displacement between the mask and the wafer. In practical application, the tilt moire´ fringe can occur due to the incorrect positions of the mask alignment mark and the wafer alignment mark or one of them. In this work, the presence of tilt moire´ fringe and its influence on the alignment accuracy are thoroughly analyzed. The analysis and discussions on the relationship between the revised linear displacement and the theoretical linear displacement reveal that moire´ fringes with different tilt angles have different influences on the alignment accuracy. Experimental results are given to verify that the proposed method is accurate and feasible, which can be applied to lithography and other correlated fields. © 2012 Elsevier Ltd. All rights reserved.; A moire´ fringe alignment method based on dual gratings is proposed. This method uses the phase of moire´ fringe to measure the relative linear displacement between the mask and the wafer. In practical application, the tilt moire´ fringe can occur due to the incorrect positions of the mask alignment mark and the wafer alignment mark or one of them. In this work, the presence of tilt moire´ fringe and its influence on the alignment accuracy are thoroughly analyzed. The analysis and discussions on the relationship between the revised linear displacement and the theoretical linear displacement reveal that moire´ fringes with different tilt angles have different influences on the alignment accuracy. Experimental results are given to verify that the proposed method is accurate and feasible, which can be applied to lithography and other correlated fields. © 2012 Elsevier Ltd. All rights reserved.
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7281
Collection微电子装备总体研究室(四室)
Corresponding AuthorZhu, J. (zsyioe@163.com)
Affiliation1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China
3. Graduate University of Chinese Academy of Sciences, Beijing 100039, China
4. School of Electronic and Information, South China University of Technology, Guangzhou 510640, China
5. Information Engineering College, Southwest University of Science and Technology, Mianyang 621010, China
Recommended Citation
GB/T 7714
Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Influence of tilt moiré fringe on alignment accuracy in proximity lithography[J]. Optics and Lasers in Engineering,2013,51(4):371-381.
APA Zhu, Jiangping.,Hu, Song.,Yu, Junsheng.,Tang, Yan.,Xu, Feng.,...&Zhu, J. .(2013).Influence of tilt moiré fringe on alignment accuracy in proximity lithography.Optics and Lasers in Engineering,51(4),371-381.
MLA Zhu, Jiangping,et al."Influence of tilt moiré fringe on alignment accuracy in proximity lithography".Optics and Lasers in Engineering 51.4(2013):371-381.
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