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A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment
Li, Lanlan1,2; Hu, Song1; Zhao, Lixin1; Ma, Ping1; Li, Jinlong1,2; Zhong, Lingna1,2; Li, L. (lilanlan1022@qq.com)
Source PublicationOptik
Volume124Issue:24Pages:6861-6865
2013
Language英语
ISSN00304026
DOI10.1016/j.ijleo.2013.07.003
Indexed BySCI ; Ei
WOS IDWOS:000327685700081
Subtype期刊论文
AbstractQuality of exposures in step and scan lithographic equipment (scanner) highly depends on the synchronization of wafer and reticle stage. In order to increase the synchronization between the two stages, a method of increasing the correlation through reducing the phase difference between the tracking errors of the two stages is presented. Theoretical analysis with respect to application of increasing the correlation coefficients is performed. Validation of this process is verified through simulation and the results indicate that the moving average (MA) and moving standard deviation (MSD) of the synchronization error can be reduced effectively through our method. © 2013 Elsevier GmbH. All rights reserved.; Quality of exposures in step and scan lithographic equipment (scanner) highly depends on the synchronization of wafer and reticle stage. In order to increase the synchronization between the two stages, a method of increasing the correlation through reducing the phase difference between the tracking errors of the two stages is presented. Theoretical analysis with respect to application of increasing the correlation coefficients is performed. Validation of this process is verified through simulation and the results indicate that the moving average (MA) and moving standard deviation (MSD) of the synchronization error can be reduced effectively through our method. © 2013 Elsevier GmbH. All rights reserved.
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Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7280
Collection微电子装备总体研究室(四室)
Corresponding AuthorLi, L. (lilanlan1022@qq.com)
Affiliation1. Institute Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100039, China
Recommended Citation
GB/T 7714
Li, Lanlan,Hu, Song,Zhao, Lixin,et al. A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment[J]. Optik,2013,124(24):6861-6865.
APA Li, Lanlan.,Hu, Song.,Zhao, Lixin.,Ma, Ping.,Li, Jinlong.,...&Li, L. .(2013).A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment.Optik,124(24),6861-6865.
MLA Li, Lanlan,et al."A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment".Optik 124.24(2013):6861-6865.
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