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题名:
A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment
作者: Li, Lanlan1,2; Hu, Song1; Zhao, Lixin1; Ma, Ping1; Li, Jinlong1,2; Zhong, Lingna1,2
刊名: Optik
出版日期: 2013
卷号: 124, 期号:24, 页码:6861-6865
学科分类: Optical instruments - Scanning
DOI: 10.1016/j.ijleo.2013.07.003
通讯作者: Li, L. (lilanlan1022@qq.com)
文章类型: 期刊论文
中文摘要: Quality of exposures in step and scan lithographic equipment (scanner) highly depends on the synchronization of wafer and reticle stage. In order to increase the synchronization between the two stages, a method of increasing the correlation through reducing the phase difference between the tracking errors of the two stages is presented. Theoretical analysis with respect to application of increasing the correlation coefficients is performed. Validation of this process is verified through simulation and the results indicate that the moving average (MA) and moving standard deviation (MSD) of the synchronization error can be reduced effectively through our method. © 2013 Elsevier GmbH. All rights reserved.
英文摘要: Quality of exposures in step and scan lithographic equipment (scanner) highly depends on the synchronization of wafer and reticle stage. In order to increase the synchronization between the two stages, a method of increasing the correlation through reducing the phase difference between the tracking errors of the two stages is presented. Theoretical analysis with respect to application of increasing the correlation coefficients is performed. Validation of this process is verified through simulation and the results indicate that the moving average (MA) and moving standard deviation (MSD) of the synchronization error can be reduced effectively through our method. © 2013 Elsevier GmbH. All rights reserved.
收录类别: SCI ; Ei
项目资助者: National Natural Science Foundation of China [61076100] ; National High Technology Research and Development Program of China [2009AA03Z341]
语种: 英语
WOS记录号: WOS:000327685700081
ISSN号: 00304026
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7280
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. Institute Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100039, China

Recommended Citation:
Li, Lanlan,Hu, Song,Zhao, Lixin,et al. A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment[J]. Optik,2013,124(24):6861-6865.
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