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题名:
Alignment method based on matched dual-grating moiré fringe for proximity lithography
作者: Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Tang, Yan1
刊名: Optical Engineering
出版日期: 2012
卷号: 51, 期号:11, 页码:113603
学科分类: Engineering - Molecular physics
DOI: 10.1117/1.OE.51.11.113603
文章类型: 期刊论文
中文摘要: The application of dual-grating moire´ fringe is introduced in lithography alignment. Minute angular displacement between the two alignment marks will lead to the tilt of moire´ fringe, which has an influence in high-accuracy alignment. Proposed is a novel measurement method of angular displacement based on the phase of moire´ fringe. The relationship between phase of moire´ fringe and angular displacement is analyzed. Both simulation and experiment indicate that an angular displacement can be determined to achieve a linear displacement measurement with error of nanometer level. © 2012 Society of Photo-Optical Instrumentation Engineers (SPIE).
英文摘要: The application of dual-grating moire´ fringe is introduced in lithography alignment. Minute angular displacement between the two alignment marks will lead to the tilt of moire´ fringe, which has an influence in high-accuracy alignment. Proposed is a novel measurement method of angular displacement based on the phase of moire´ fringe. The relationship between phase of moire´ fringe and angular displacement is analyzed. Both simulation and experiment indicate that an angular displacement can be determined to achieve a linear displacement measurement with error of nanometer level. © 2012 Society of Photo-Optical Instrumentation Engineers (SPIE).
收录类别: SCI ; Ei
项目资助者: Program for the National Science Foundation of China [60976077, 61076099]
语种: 英语
WOS记录号: WOS:000314462100029
ISSN号: 00913286
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7259
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Electronic Science and Technology of China, School of Optoelectronic Information, Chengdu 610054, China
3. Graduate University of Chinese Academy of Sciences, Beijing 100039, China

Recommended Citation:
Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Alignment method based on matched dual-grating moiré fringe for proximity lithography[J]. Optical Engineering,2012,51(11):113603.
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