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Alignment method based on matched dual-grating moiré fringe for proximity lithography
Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Tang, Yan1
Source PublicationOptical Engineering
Volume51Issue:11Pages:113603
2012
Language英语
ISSN00913286
DOI10.1117/1.OE.51.11.113603
Indexed BySCI ; Ei
WOS IDWOS:000314462100029
Subtype期刊论文
AbstractThe application of dual-grating moire´ fringe is introduced in lithography alignment. Minute angular displacement between the two alignment marks will lead to the tilt of moire´ fringe, which has an influence in high-accuracy alignment. Proposed is a novel measurement method of angular displacement based on the phase of moire´ fringe. The relationship between phase of moire´ fringe and angular displacement is analyzed. Both simulation and experiment indicate that an angular displacement can be determined to achieve a linear displacement measurement with error of nanometer level. © 2012 Society of Photo-Optical Instrumentation Engineers (SPIE).; The application of dual-grating moire´ fringe is introduced in lithography alignment. Minute angular displacement between the two alignment marks will lead to the tilt of moire´ fringe, which has an influence in high-accuracy alignment. Proposed is a novel measurement method of angular displacement based on the phase of moire´ fringe. The relationship between phase of moire´ fringe and angular displacement is analyzed. Both simulation and experiment indicate that an angular displacement can be determined to achieve a linear displacement measurement with error of nanometer level. © 2012 Society of Photo-Optical Instrumentation Engineers (SPIE).
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Cited Times:11[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7259
Collection微电子装备总体研究室(四室)
Affiliation1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Electronic Science and Technology of China, School of Optoelectronic Information, Chengdu 610054, China
3. Graduate University of Chinese Academy of Sciences, Beijing 100039, China
Recommended Citation
GB/T 7714
Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Alignment method based on matched dual-grating moiré fringe for proximity lithography[J]. Optical Engineering,2012,51(11):113603.
APA Zhu, Jiangping,Hu, Song,Yu, Junsheng,&Tang, Yan.(2012).Alignment method based on matched dual-grating moiré fringe for proximity lithography.Optical Engineering,51(11),113603.
MLA Zhu, Jiangping,et al."Alignment method based on matched dual-grating moiré fringe for proximity lithography".Optical Engineering 51.11(2012):113603.
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