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基于光闸叠栅条纹的纳米检焦方法
严伟; 李艳丽; 陈铭勇; 王建
Source Publication光学学报
Volume31Issue:8Pages:28-32
2011
Language中文
Subtype期刊论文
Abstract针对投影光刻机短波长、大数值孔径、短焦深的特点,讨论了一种基于光闸叠栅条纹的纳米检焦方法。该方法采用三角测量的基本原理,利用双光栅光闸叠栅条纹的光强调制机理,并结合像横向剪切器和光弹调制的光学特性,建立了单个光栅周期内焦面位移量和输出光能量线性关系。其具有非接触、强实时性和高稳健性的特点,经理论分析和模拟测试,达到纳米量级的检测精度,可以满足投影光刻高精度、实时、非接触焦面测量的要求。
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7246
Collection微电子装备总体研究室(四室)
Corresponding Author严伟
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
严伟,李艳丽,陈铭勇,等. 基于光闸叠栅条纹的纳米检焦方法[J]. 光学学报,2011,31(8):28-32.
APA 严伟,李艳丽,陈铭勇,&王建.(2011).基于光闸叠栅条纹的纳米检焦方法.光学学报,31(8),28-32.
MLA 严伟,et al."基于光闸叠栅条纹的纳米检焦方法".光学学报 31.8(2011):28-32.
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