中国科学院光电技术研究所机构知识库
Advanced  
IOE OpenIR  > 微电子装备总体研究室(四室)  > 期刊论文
题名:
Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform
作者: Xu Feng; Song Hu; Zhou Shaolin
刊名: OPTICAL ENGINEERING
出版日期: 2011
卷号: 50, 期号:8, 页码:088001
通讯作者: Xu F (Xu Feng)
文章类型: 期刊论文
中文摘要: A simple but effective phase analysis method for the fringe pattern that occurs in two superposed grating marks applied in the previously designed dual-grating-based alignment scheme for lithography is proposed. First, the fringe pattern is processed and analyzed using a frequency domain method based on two-dimensional (2D) Fourier transform, and the 2D notch filter is appropriately designed to select the useful spectrum to obtain the target phase information. Further, phase difference of two sets of fringes is computed to acquire the alignment offset. Numerical simulation and experiment are both performed to verify this method. Finally, certain analysis about the error of phase difference extraction in the fringe pattern and precision of alignment are also presented. The results indicate that the background and noise of the fringe pattern can be efficiently filtered and target phase information can be extracted with high accuracy through this method. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.3609007]
英文摘要: A simple but effective phase analysis method for the fringe pattern that occurs in two superposed grating marks applied in the previously designed dual-grating-based alignment scheme for lithography is proposed. First, the fringe pattern is processed and analyzed using a frequency domain method based on two-dimensional (2D) Fourier transform, and the 2D notch filter is appropriately designed to select the useful spectrum to obtain the target phase information. Further, phase difference of two sets of fringes is computed to acquire the alignment offset. Numerical simulation and experiment are both performed to verify this method. Finally, certain analysis about the error of phase difference extraction in the fringe pattern and precision of alignment are also presented. The results indicate that the background and noise of the fringe pattern can be efficiently filtered and target phase information can be extracted with high accuracy through this method. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.3609007]
语种: 英语
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7244
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

Files in This Item:
File Name/ File Size Content Type Version Access License
2011-04-001.pdf(556KB)期刊论文作者接受稿开放获取View 联系获取全文

作者单位: 中国科学院光电技术研究所

Recommended Citation:
Xu Feng,Song Hu,Zhou Shaolin. Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform[J]. OPTICAL ENGINEERING,2011,50(8):088001.
Service
Recommend this item
Sava as my favorate item
Show this item's statistics
Export Endnote File
Google Scholar
Similar articles in Google Scholar
[Xu Feng]'s Articles
[Song Hu]'s Articles
[Zhou Shaolin]'s Articles
CSDL cross search
Similar articles in CSDL Cross Search
[Xu Feng]‘s Articles
[Song Hu]‘s Articles
[Zhou Shaolin]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
Add to CiteULike Add to Connotea Add to Del.icio.us Add to Digg Add to Reddit
文件名: 2011-04-001.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Copyright © 2007-2016  中国科学院光电技术研究所 - Feedback
Powered by CSpace