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Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform
Xu Feng; Song Hu; Zhou Shaolin; Xu F (Xu Feng)
Source PublicationOPTICAL ENGINEERING
Volume50Issue:8Pages:088001
2011
Language英语
Subtype期刊论文
AbstractA simple but effective phase analysis method for the fringe pattern that occurs in two superposed grating marks applied in the previously designed dual-grating-based alignment scheme for lithography is proposed. First, the fringe pattern is processed and analyzed using a frequency domain method based on two-dimensional (2D) Fourier transform, and the 2D notch filter is appropriately designed to select the useful spectrum to obtain the target phase information. Further, phase difference of two sets of fringes is computed to acquire the alignment offset. Numerical simulation and experiment are both performed to verify this method. Finally, certain analysis about the error of phase difference extraction in the fringe pattern and precision of alignment are also presented. The results indicate that the background and noise of the fringe pattern can be efficiently filtered and target phase information can be extracted with high accuracy through this method. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.3609007]; A simple but effective phase analysis method for the fringe pattern that occurs in two superposed grating marks applied in the previously designed dual-grating-based alignment scheme for lithography is proposed. First, the fringe pattern is processed and analyzed using a frequency domain method based on two-dimensional (2D) Fourier transform, and the 2D notch filter is appropriately designed to select the useful spectrum to obtain the target phase information. Further, phase difference of two sets of fringes is computed to acquire the alignment offset. Numerical simulation and experiment are both performed to verify this method. Finally, certain analysis about the error of phase difference extraction in the fringe pattern and precision of alignment are also presented. The results indicate that the background and noise of the fringe pattern can be efficiently filtered and target phase information can be extracted with high accuracy through this method. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.3609007]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7244
Collection微电子装备总体研究室(四室)
Corresponding AuthorXu F (Xu Feng)
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Xu Feng,Song Hu,Zhou Shaolin,et al. Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform[J]. OPTICAL ENGINEERING,2011,50(8):088001.
APA Xu Feng,Song Hu,Zhou Shaolin,&Xu F .(2011).Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform.OPTICAL ENGINEERING,50(8),088001.
MLA Xu Feng,et al."Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform".OPTICAL ENGINEERING 50.8(2011):088001.
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