| Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform | |
| Xu Feng; Song Hu; Zhou Shaolin; Xu F (Xu Feng) | |
| Source Publication | OPTICAL ENGINEERING
 |
| Volume | 50Issue:8Pages:088001 |
| 2011 | |
| Language | 英语 |
| Subtype | 期刊论文 |
| Abstract | A simple but effective phase analysis method for the fringe pattern that occurs in two superposed grating marks applied in the previously designed dual-grating-based alignment scheme for lithography is proposed. First, the fringe pattern is processed and analyzed using a frequency domain method based on two-dimensional (2D) Fourier transform, and the 2D notch filter is appropriately designed to select the useful spectrum to obtain the target phase information. Further, phase difference of two sets of fringes is computed to acquire the alignment offset. Numerical simulation and experiment are both performed to verify this method. Finally, certain analysis about the error of phase difference extraction in the fringe pattern and precision of alignment are also presented. The results indicate that the background and noise of the fringe pattern can be efficiently filtered and target phase information can be extracted with high accuracy through this method. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.3609007]; A simple but effective phase analysis method for the fringe pattern that occurs in two superposed grating marks applied in the previously designed dual-grating-based alignment scheme for lithography is proposed. First, the fringe pattern is processed and analyzed using a frequency domain method based on two-dimensional (2D) Fourier transform, and the 2D notch filter is appropriately designed to select the useful spectrum to obtain the target phase information. Further, phase difference of two sets of fringes is computed to acquire the alignment offset. Numerical simulation and experiment are both performed to verify this method. Finally, certain analysis about the error of phase difference extraction in the fringe pattern and precision of alignment are also presented. The results indicate that the background and noise of the fringe pattern can be efficiently filtered and target phase information can be extracted with high accuracy through this method. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.3609007] |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7244 |
| Collection | 微电子装备总体研究室（四室） |
| Corresponding Author | Xu F (Xu Feng) |
| Affiliation | 中国科学院光电技术研究所 |
| Recommended Citation GB/T 7714 | Xu Feng,Song Hu,Zhou Shaolin,et al. Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform[J]. OPTICAL ENGINEERING,2011,50(8):088001. |
| APA | Xu Feng,Song Hu,Zhou Shaolin,&Xu F .(2011).Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform.OPTICAL ENGINEERING,50(8),088001. |
| MLA | Xu Feng,et al."Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform".OPTICAL ENGINEERING 50.8(2011):088001. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2011-04-001.pdf（556KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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