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Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography
Shaolin Zhou; Yong Yang; Lixin Zhao; Song Hu
Source PublicationOptics Letters
Volume35Issue:18Pages:3132-3134
2010
Language英语
Subtype期刊论文
AbstractWe demonstrate a tilt-modulated phase imaging method to adjust the gap inconsistency for wafer-mask leveling in proximity lithography. Two gratings with close periods are etched on the mask and used as leveling marks. At the illumination of a monochromatic planar wave, the diffracted image of one grating is projected back onto the other one beside it through reflection at the wafer surface. Any wafer-mask tilts in two orthogonal sections are directly modulated into the phase distribution of the interference field and can be directly remedied according to the frequency and angle deviation of the two sets of fringes. Finally, wafer-mask leveling can be achieved at only one spot with preserved accuracy. Computational and experimental results confirm that tilts at the magnitude of 10/sup -3/ rad can be readily resolved by this method.; We demonstrate a tilt-modulated phase imaging method to adjust the gap inconsistency for wafer-mask leveling in proximity lithography. Two gratings with close periods are etched on the mask and used as leveling marks. At the illumination of a monochromatic planar wave, the diffracted image of one grating is projected back onto the other one beside it through reflection at the wafer surface. Any wafer-mask tilts in two orthogonal sections are directly modulated into the phase distribution of the interference field and can be directly remedied according to the frequency and angle deviation of the two sets of fringes. Finally, wafer-mask leveling can be achieved at only one spot with preserved accuracy. Computational and experimental results confirm that tilts at the magnitude of 10/sup -3/ rad can be readily resolved by this method.
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7235
Collection微电子装备总体研究室(四室)
Corresponding AuthorShaolin Zhou
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Shaolin Zhou,Yong Yang,Lixin Zhao,et al. Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography[J]. Optics Letters,2010,35(18):3132-3134.
APA Shaolin Zhou,Yong Yang,Lixin Zhao,&Song Hu.(2010).Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography.Optics Letters,35(18),3132-3134.
MLA Shaolin Zhou,et al."Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography".Optics Letters 35.18(2010):3132-3134.
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