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Moire-based focusing and leveling scheme for optical projection lithography
Yan Wei; Yang Yong; Chen Wangfu; Hu Song; Zhou Shaolin; Yan W (Yan Wei)
Source PublicationApplied Optics
Volume49Issue:31
2010
Language英语
Subtype期刊论文
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7233
Collection微电子装备总体研究室(四室)
Corresponding AuthorYan W (Yan Wei)
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Yan Wei,Yang Yong,Chen Wangfu,et al. Moire-based focusing and leveling scheme for optical projection lithography[J]. Applied Optics,2010,49(31).
APA Yan Wei,Yang Yong,Chen Wangfu,Hu Song,Zhou Shaolin,&Yan W .(2010).Moire-based focusing and leveling scheme for optical projection lithography.Applied Optics,49(31).
MLA Yan Wei,et al."Moire-based focusing and leveling scheme for optical projection lithography".Applied Optics 49.31(2010).
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