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题名:
Moire-based focusing and leveling scheme for optical projection lithography
作者: Yan Wei; Yang Yong; Chen Wangfu; Hu Song; Zhou Shaolin
刊名: Applied Optics
出版日期: 2010
卷号: 49, 期号:31
通讯作者: Yan W (Yan Wei)
文章类型: 期刊论文
语种: 英语
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7233
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 中国科学院光电技术研究所

Recommended Citation:
Yan Wei,Yang Yong,Chen Wangfu,et al. Moire-based focusing and leveling scheme for optical projection lithography[J]. Applied Optics,2010,49(31).
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